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KR-102963695-B1 - HANDLING SYSTEM FOR MICROLITHOGRAPHIC PHOTOMASKS, INSPECTION SYSTEM AND PROCESSING SYSTEM HAVING A HANDLING SYSTEM

KR102963695B1KR 102963695 B1KR102963695 B1KR 102963695B1KR-102963695-B1

Abstract

The present invention relates to a handling system for a microlithographic photomask (17) having an articulated arm robot (26) and an alignment device (30). The alignment device (30) is designed to rotate the photomask held by the alignment device (30) around a vertical axis (51) during a first movement process and to flip the photomask around a horizontal axis (52) during a second movement process. The present invention also relates to an inspection system having a handling system and a processing system having a handling system.

Inventors

  • 이른스테터, 요한

Assignees

  • 칼 짜이스 에스엠티 게엠베하

Dates

Publication Date
20260512
Application Date
20240827
Priority Date
20230828

Claims (18)

  1. As a handling system for a microlithographic photomask (17), The handling system has an articulated arm robot (26) and an alignment device (30), wherein the alignment device (30) is designed to rotate the photomask (17) held by the alignment device (30) around a vertical axis (51) during a first movement process and to flip the photomask around a horizontal axis (52) during a second movement process, and the handling system, A handling system further comprising a sensor mechanism (43) for capturing alignment of the above photomask (17).
  2. In claim 1, The above-mentioned articulated arm robot (26) comprises a robot base (34), a first articulated arm (27) attached to the robot base (34) via a first rotational joint (31), a second articulated arm (28) attached to the first articulated arm (27) via a second rotational joint (32), and a third articulated arm (29) attached to the second articulated arm (28) via a third rotational joint (33), forming a handling system.
  3. In claim 1 or claim 2, A handling system comprising a first rotational drive unit (36) for rotating the photomask (17) around the vertical axis (51), wherein the first rotational drive unit (36) has exactly one degree of freedom.
  4. In claim 3, The first rotary drive unit (36) above is a handling system having an axial range of 40 mm or less.
  5. In claim 3, The first rotary drive unit (36) above is a handling system equipped with vacuum-tight encapsulation.
  6. In claim 1 or claim 2, A handling system comprising a second rotational drive unit (38) for rotating the photomask (17) around the horizontal axis (52), wherein the second rotational drive unit (38) has exactly one degree of freedom.
  7. In claim 1 or claim 2, The above alignment device (30) is a handling system comprising a holding mechanism (39, 40) designed to hold the photomask (17) independently of alignment with respect to gravity.
  8. In claim 7, A handling system in which the holding mechanism (39, 40) includes a frame bracket (39), and the maximum distance between the photomask (17) held by the holding mechanism (39, 40) and the frame bracket (39) is less than 6 mm.
  9. In claim 8, A handling system in which the holding mechanism (39, 40) includes a gripping element (40), and the gripping element (40) protrudes 3 mm or less on the side facing opposite to the frame bracket (39) beyond the photomask (17) held by the holding mechanism (39, 40).
  10. In claim 7, The above vertical axis (51) is a handling system that intersects at the center with the photomask (17) held in the above holding mechanism (39, 40).
  11. In claim 7, The above horizontal axis (52) is a handling system located on a plane spanned by a photomask (17) held in the above-mentioned holding mechanism (39, 40).
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  13. In claim 1 or claim 2, The above alignment device (30) is a handling system designed such that the support structure (42, 45) can be displaced from the lateral direction downward below the photomask (17) in each of the eight possible alignments of the photomask (17).
  14. As an inspection system for a microlithographic photomask (17), An inspection system comprising a process chamber (18) and a handling system (21) for performing an inspection of a photomask (17), wherein the handling system (21) is designed to transfer the photomask (17) to the process chamber (18) or to an antechamber (25) of the process chamber (18), and wherein the handling system is designed according to claim 1 or claim 2.
  15. As a processing system for a microlithographic photomask (17), A processing system comprising a process chamber (47) and a handling system (21) for performing a processing step on a photomask (17), wherein the handling system (21) is designed to transfer the photomask (17) to the process chamber (47) or to a pre-chamber (48) of the process chamber (47), and wherein the handling system is designed according to claim 1 or claim 2.
  16. In claim 4, The first rotary drive unit (36) above is a handling system equipped with vacuum-sealed encapsulation.
  17. In claim 3, A handling system comprising a second rotational drive unit (38) for rotating the photomask (17) around the horizontal axis (52), wherein the second rotational drive unit (38) has exactly one degree of freedom.
  18. delete

Description

Handling system for microlithographic photomasks, inspection system and processing system having a handling system The present invention relates to a handling system for a microlithographic photomask. The present invention also relates to a processing system having a handling system and an inspection system having a handling system. Photomasks are used in microlithographic projection exposure devices, which are used to produce integrated circuits, particularly those with small structures. A photomask illuminated by very short wavelength deep ultraviolet or extreme ultraviolet radiation (DUV or EUV radiation) is imaged onto a lithography object to transfer the mask structure to the lithography object. To ensure the high quality of the image generated on a lithography object, the photomask must be faithful to its size and free from adverse effects caused by contamination. For this reason, photomasks may be inspected and, if necessary, post-processed, cleaned, or calibrated before initial use or within the scope of service measures. In this context, various inspection and processing systems are used to transport photomasks for the purpose of performing the necessary steps. The steps of the inspection and processing systems are performed regularly under vacuum. For example, contamination can be caused by outgassing from components surrounding the photomask; this leads to the deposition of contaminants on the surface of the photomask. This is a particular problem in areas of the photomask where structures for subsequent chips are arranged. The risk of contamination may also arise, for example, from foreign substances originating from contact points on the mask. Since these are often composed of plastic, they have a relatively high rate of outgassing. Plastic particles can decompose under the influence of UV light to form carbon, which can lead to a decrease in the reflectivity of the photomask and optical components. Before the above photomask is introduced into the inspection system/processing system, it is necessary to verify that the photomask is correctly aligned. To this end, the photomask is rotated around the vertical axis and/or flipped around the horizontal axis according to its initial state. Only then is the movement process used to introduce the photomask into the inspection system or processing system followed. It is known that 6-axis robots with all necessary degrees of freedom of movement are used in movement processes including the translation and alignment of photomasks. However, the available space for 6-axis robots is insufficient because the spatial conditions around inspection and processing systems are often cramped. In particular, there are cases where it is impossible to stack photomasks under cramped spatial conditions because the installation height of the components carrying the photomasks is too high. Complex systems are also known in which different system components are used for different parts of the movement process. For example, a first system component may be responsible for translational movement in a horizontal plane, a second system component may be responsible for rotation around a vertical axis, and a third system component may be responsible for flipping the photomask around a horizontal axis. The present invention is based on the objective of providing a handling system, an inspection system, and a processing system that avoid these disadvantages. The above objective is achieved by the features of the independent claim. Advantageous embodiments are specified in the dependent claim. A handling system according to the present invention for a microlithographic photomask includes an articulated arm robot and an alignment device. The alignment device is designed to rotate the photomask held by the alignment device about a vertical axis during a first movement process and to flip the photomask about a horizontal axis during a second movement process. Specifying the first movement process and the second movement process does not involve any limitations regarding the temporal order of the movement processes. The present invention recognizes that complexity can be reduced compared to known systems. With respect to the types of joints required in the handling system according to the present invention, it is easier to design the joints to avoid gas release when photomasks are handled under vacuum. The articulated arm robot may include a robot base, a first articulated arm attached to the robot base through a first rotary joint, a second articulated arm attached to the first articulated arm through a second rotary joint, and a third articulated arm attached to the second articulated arm through a third rotary joint. A rotary joint refers to a joint that provides rotation around exactly one axis. This limitation to a single degree of freedom of movement allows for simple encapsulation of the joint; this is advantageous in terms of avoiding gas release. One or more rotary joints may ha