KR-102963843-B1 - MEASUREMENT DEVICE AND IN-LINE VAPOR DEPOSITION APPARATUS

KR102963843B1KR 102963843 B1KR102963843 B1KR 102963843B1KR-102963843-B1

Abstract

[Project] To provide a technology that suppresses the meandering of mother glass being transported in a vacuum environment. [Solution] A measuring device used in an inline type deposition apparatus, wherein the deposition apparatus comprises a chamber forming a conveying space maintained under vacuum, a conveying means for conveying a conveying object within the chamber, and a guide means for regulating the position of the conveying object in the width direction with respect to the conveying direction of the conveying means, and the measuring device comprises a conveying means to be conveyed by the conveying means, and a detection means installed on the conveying means and detecting the position in the width direction of the guide means while the conveying means is being conveyed by the conveying means within the chamber under vacuum conditions.

Inventors

토에 유야

Assignees

캐논 톡키 가부시키가이샤

Dates

Publication Date: 20260511
Application Date: 20220610
Priority Date: 20210622

Claims (11)

As a measuring device used in an inline deposition apparatus, The above deposition device is, A chamber forming a return space maintained under vacuum, and A conveying means for conveying a return object within the above chamber, and A guide means for regulating the position of the conveyed object in the width direction relative to the conveying direction of the conveying means is provided, and The above guide means includes at least one pair of side rollers located on both sides of the above conveying means, and The above measuring device is, While being transported by the above-mentioned transport means and being transported by the above-mentioned transport means within the above-mentioned chamber under a vacuum environment, the detection means comprises a laser distance measuring device that measures the distance of each of the pair of side rollers over time. The above detection means determines whether the measuring device is meandering based on the time difference of the distance output values to the pair of side rollers obtained by the laser distance measuring instrument. A measuring device characterized by
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In paragraph 1, The above laser distance measuring device detects the distance between itself and an object located to the side at predetermined time intervals or continuously, and A measuring device characterized in that the above detection means detects the position of the above guide means when the distance between the object and the device becomes a minimum value.
In paragraph 1, The above laser distance measuring device detects the distance between the object located to the side at predetermined time intervals or continuously, and A measuring device characterized in that the above detection means selectively stores or transmits to the outside a value representing a minimum value among the output values.
In paragraph 1, A measuring device characterized by having a calibration means for calibrating the output value of the above-described laser distance measuring device.
In paragraph 1, A measuring device characterized in that the above detection means further detects the position of the measuring device relative to the deposition device in the above return direction.
In paragraph 1, A measuring device characterized by further comprising a transmitting means for transmitting information regarding the position of the guide means detected by the detection means to an external device.
A chamber forming a return space maintained under vacuum, and A conveying means for conveying a measuring device described in any one of claims 1 or 3 to 7 within the chamber, and A guide means for regulating the position of the measuring device in the width direction with respect to the conveying direction of the above conveying means, An inline deposition apparatus equipped with
In paragraph 8, An inline deposition apparatus characterized by further having a receiving means for receiving information regarding the position in the width direction of the guide means.
In Paragraph 9, An inline deposition apparatus characterized by further having an adjustment means capable of adjusting the position in the width direction of the above guide means.
In Paragraph 10, An inline deposition apparatus characterized in that the above adjustment means adjusts the position of the guide means based on information regarding the position of the guide means received by the above receiving means.

Description

Measurement Device and In-Line Vapor Deposition Apparatus The present invention relates to a measuring device for adjusting the position of a conveying device and an inline deposition device. In the manufacture of organic EL displays, an organic material is deposited on a substrate on which a TFT (thin-film transistor) is formed. Vacuum deposition is the mainstream method for depositing the organic material, and a method is used in which the deposition material is deposited upward from the bottom of the substrate with the side on which the TFT is formed facing downward. Multiple panel areas may be arranged on the substrate on which the TFT is formed, and this can be called a mother glass. Recently, as the size of the mother glass is increasing, an inline deposition method in which the substrate is moved while depositing is being considered, as opposed to the conventional deposition method in which the glass substrate is stationary (Patent Document 1). FIG. 1 is a schematic diagram showing an example of a production line according to the present embodiment. FIG. 2 is a drawing showing an example of a substrate being transported by a transport device according to the present embodiment. Figure 3 is a diagram of the measurement carrier configuration. Figure 4 is a block diagram of the instrumentation carrier. Figure 5 is a cross-sectional view of a measuring carrier. Figure 6 is a diagram showing the measurement principle of a measuring carrier. Figure 7 is a diagram showing the method for calculating the distance between side rollers. Figure 8 is a flowchart showing an example of a process performed by a coordination system. Figure 9 is a diagram showing a calibration method for a measurement carrier. Embodiments are described in detail below with reference to the attached drawings. Furthermore, the following embodiments are not intended to limit the invention covered by the claims. Although multiple features are described in the embodiments, not all of these multiple features are essential to the invention, and multiple features may be combined at will. Furthermore, in the attached drawings, the same reference number is assigned to identical or equivalent components, and redundant descriptions are omitted. <First Embodiment> Referring to FIG. 1, an example of a production line according to the present embodiment will be described. In the production line shown in FIG. 1, a glass substrate (7) (hereinafter abbreviated as substrate (7)) is fed from the substrate input section (11). The glass substrate (7) is fed into the substrate input section (11) such that its lower surface becomes the film-forming surface at the time of feeding. The glass substrate (7) fed into the substrate input section (11) is depressurized by a vacuum pump not shown connected to the substrate input section (11) until it becomes below a predetermined pressure. In this embodiment, the substrate input section (11) performs depressurization treatment until it becomes 5.0 × 10⁻⁴ Pa or less. Therefore, since the volume of the chamber of the substrate input section (11) is small so that the time required for evacuation is short, the glass substrate is not rotated in the substrate input section (11) in this embodiment. For this reason, the glass substrate (7) is fed into the substrate input section (11) with its film-forming surface as its lower surface. In this embodiment, the glass substrate (7) is a substrate size called the 6th generation, specifically an alkali-free glass of 1850mm × 1500mm × 0.5t. The glass substrate (7) is mounted on a mask (8), and the size of the mask (8) is 2050mm × 1700mm × 50mm. In the case of an organic EL display, a TFT circuit is formed on the glass substrate (7). In the case of an organic EL light, an electrode is formed. When exhaust is performed by a vacuum pump not shown in the substrate input section (11) until the pressure becomes below a predetermined level, the glass substrate (7) is transported to a vacuum transport robot (24) installed in the substrate transport section (12). Specifically, a plate-shaped valve called a gate valve located between the substrate input section (11) and the substrate transport section (12) is opened, and the transport is performed by the vacuum transport robot (24) receiving the glass substrate (7) in the substrate input section (11). At this time, the pressure inside the substrate transport section (12) is 1.0 × 10⁻⁴ Pa or lower than that in the substrate input section (11). The vacuum transport robot (24) that has received the glass substrate (7) draws the glass substrate (7) into the substrate transport section (12). After the glass substrate (7) is drawn into the substrate transport unit (12) and reaches a predetermined position, a plate-shaped valve that can be opened and closed is closed between the substrate input unit (11) and the substrate transport unit (12). In the substrate transport unit (12), a buffer unit for stocking the glass substrate (7) or a pretreatment