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KR-102964034-B1 - Substrate processing apparatus

KR102964034B1KR 102964034 B1KR102964034 B1KR 102964034B1KR-102964034-B1

Abstract

The present invention relates to a substrate processing device, and more specifically, to a substrate processing device capable of adjusting the distance between a substrate and an upper shower head or between a substrate and a lower shower head, and further capable of tilting the substrate relative to the upper shower head or tilting the lower shower head relative to the substrate.

Inventors

  • 장경호
  • 강민욱
  • 윤병호
  • 홍준호
  • 김규범

Assignees

  • 주식회사 테스

Dates

Publication Date
20260512
Application Date
20231218

Claims (11)

  1. A chamber providing a processing space for a substrate; An upper shower head provided at the upper part inside the chamber; A substrate support member provided inside the chamber to support the substrate; A lower showerhead assembly comprising a driving bar extending downward and supplied with process gas toward the lower surface of the substrate, provided on the inner side of the substrate support member; A second lifting/lowering plate connected to the lower end of the above substrate support; A driving unit that raises and lowers the lower shower head assembly to adjust the gap between the substrate and the lower shower head assembly, and tilts the lower shower head relative to the substrate; A lifting/lowering unit that raises and lowers the substrate support and the lower shower head to adjust the gap between the substrate and the upper shower head; and A tilting unit that tilts the substrate support and the lower shower head to tilt the substrate relative to the upper shower head; The above driving unit includes a first lifting/lowering plate connected to the driving bar, and a plurality of first lifting/lowering driving units configured between the second lifting/lowering plate and the first lifting/lowering plate to move the first lifting/lowering plate relative to the second lifting/lowering plate and drive individually. The above drive bar is positioned to penetrate the above second lifting/lowering plate, and The above lifting unit raises and lowers the second lifting plate to adjust the gap between the substrate and the upper shower head, and A substrate processing device characterized by the above tilting unit tilting the second lifting/lowering plate to tilt the substrate relative to the upper shower head.
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  4. In paragraph 1, When the lower shower head assembly is raised or lowered, the plurality of first lifting/lowering drive units are driven together, and A substrate processing device characterized by the plurality of first lifting and lowering drive units being driven individually when the lower shower head assembly is tilted.
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  6. In paragraph 1, The above lifting and lowering unit is The lower part of the substrate support and the second lifting/lowering plate connected to the drive bar, and A substrate processing device characterized by having a second lifting/lowering drive unit for lifting and lowering the second lifting/lowering plate.
  7. In paragraph 6, A substrate processing device characterized in that the second lifting/lowering plate and the first lifting/lowering plate are connected to each other by a plurality of first lifting/lowering drive units.
  8. In paragraph 6, The above-mentioned second lifting/lowering drive unit is further provided with a vertical connecting bar to which the second lifting/lowering drive unit is connected, and A substrate processing device characterized in that the second lifting/lowering plate moves up and down along the vertical connecting bar.
  9. In paragraph 1, The above tilting unit is A tilting plate connected to the lower end of the substrate support and the drive bar of the lower shower head assembly, and A substrate processing device characterized by having a tilting drive unit for tilting the above-mentioned tilting plate.
  10. In Paragraph 9, Further comprising a vertical connecting bar to which the above tilting plate is connected, A second lifting/lowering plate connected to the lower end of the substrate support is connected to the vertical connecting bar so as to be able to move up and down along the vertical connecting bar, and A substrate processing device characterized in that the drive bar of the lower shower head assembly is connected to a first lifting/lowering plate, and the second lifting/lowering plate and the first lifting/lowering plate are connected to each other by a plurality of first lifting/lowering drive units.
  11. In Paragraph 9, Further comprising a tilting housing connected to the lower part of the chamber, A substrate processing device characterized in that the tilting drive unit and the tilting plate are connected to the tilting housing.

Description

Substrate processing apparatus The present invention relates to a substrate processing device, and more specifically, to a substrate processing device capable of adjusting the distance between a substrate and an upper shower head or between a substrate and a lower shower head, and further capable of tilting the substrate relative to the upper shower head or tilting the lower shower head relative to the substrate. A general substrate processing device deposits a thin film of a predetermined thickness on one side of a substrate, for example, on the upper surface of the substrate. In this case, when the thin film is deposited in an overlapping manner on the upper surface of the substrate, the substrate can be bowed by the stress of the thin film. When the substrate bows in this manner, it becomes difficult to position the substrate correctly during subsequent various substrate processing steps. In particular, as the precision of substrate processing steps increases day by day, this bowing phenomenon reduces the precision of the processing steps. Therefore, to prevent the aforementioned bowing phenomenon of the substrate, a thin film of a predetermined thickness is deposited on the lower surface of the substrate to prevent the bowing phenomenon. A substrate processing device according to such prior art is equipped with an upper shower head that supplies purge gas, etc. to the upper part of the substrate, and furthermore, is equipped with a lower shower head that supplies process gas to the lower part of the substrate. Meanwhile, in the case of a device that supplies process gas toward the lower surface of a substrate, such as the substrate processing device described above, the distance between the substrate and the upper shower head and the distance between the substrate and the lower shower head are important. This is because, when plasma is used during the process on the substrate, it is necessary to adjust the gap between the substrate and the upper shower head so that plasma is not generated between the substrate and the upper shower head. In addition, when supplying process gas toward the lower surface of a substrate, the gap between the substrate and the lower shower head also becomes important. Furthermore, due to various factors, the substrate and the upper shower head, and the substrate and the lower shower head, may not be arranged parallel to each other, so it may be necessary to align them parallel. On the other hand, during the process on the substrate, it may be necessary to intentionally arrange the substrate and the upper shower head, and the substrate and the lower shower head, so that they are not parallel. In this case, it is necessary to tilt the substrate relative to the upper shower head or tilt the lower shower head relative to the substrate. FIG. 1 is a side cross-sectional view of a substrate processing apparatus according to one embodiment of the present invention, FIG. 2 is a side view illustrating the case where the lower shower head assembly is raised by the driving unit, FIG. 3 is a side view illustrating a state in which the lower shower head assembly is tilted in one direction relative to the substrate by a driving unit. FIG. 4 is a side view showing the state in which both the substrate support and the lower shower head assembly are raised by the lifting/lowering unit. FIG. 5 is a side view showing the state in which the substrate support and the lower shower head assembly are tilted by the tilting unit. FIG. 6 is a perspective view of the second tilting drive unit of the substrate processing device, FIG. 7 is a cross-sectional view along the line 'VII-VII' of FIG. 6, FIG. 8 is a plan view of the first tilting plate. Hereinafter, the structure of a substrate processing apparatus according to an embodiment of the present invention will be examined in detail with reference to the drawings. FIG. 1 is a side cross-sectional view of a substrate processing device (1000) according to one embodiment of the present invention. Referring to FIG. 1, the substrate processing device (1000) may include a chamber (300) that provides a processing space (310) in which a processing process is performed on a substrate, an upper shower head (200) that is provided on the upper inner side of the chamber (300) and supplies purge gas, a substrate support member (400) that is provided on the lower inner side of the chamber (300) and supports the substrate (S), and a lower shower head assembly (420) that is provided on the inner side of the substrate support member (400) and supplies process gas toward the lower surface of the substrate (S). Specifically, the chamber (300) can provide a processing space (310) inside which various components required for processing the substrate (S), etc., are accommodated. One side of the chamber (300) may be provided with an opening (not shown) through which the substrate (S) is loaded into or unloaded from the processing space (310), and the opening may be provided wit