KR-102964395-B1 - Stage with a repulsive force reduction structure

KR102964395B1KR 102964395 B1KR102964395 B1KR 102964395B1KR-102964395-B1

Abstract

A stage according to an embodiment of the present invention is a stage having a repulsion force reduction structure, comprising: a mover for transporting a workpiece in a first direction; a parallel plate located below the mover and having an LM guide installed on its upper surface; a standing plate installed vertically on each side of the parallel plate; a horizontal frame that rests on the ground and supports the parallel plate; a vibration damping platform installed between the parallel plate and the horizontal frame to dampen vibration; a first magnet array installed in a longitudinal hole formed in the parallel plate to provide transport thrust to the mover; a first damping block on which the first magnet array is mounted and an elastic member that dampens the repulsion force according to the movement of the mover is coupled; and a horizontal post on which the first damping block is mounted and which is separated from the horizontal frame and rests on the ground.

Inventors

조규중
김민지

Assignees

이노로보틱스 주식회사

Dates

Publication Date: 20260513
Application Date: 20241219

Claims (10)

As a stage having a repulsion reduction structure, A mover that transports a workpiece in a first direction; A parallel plate located at the bottom of the above-mentioned mover and having an LM guide installed on its upper surface; Upright plates installed vertically on each side of the above parallel plates; A horizontal frame that rests on the ground and supports the parallel platen; A vibration damping platform installed between the parallel plate and the horizontal frame to dampen vibrations; A first magnet array installed in a longitudinal hole formed in the parallel platen above to provide a transfer thrust to the mover; A first damping block having the first magnet array mounted on its upper portion and an elastic member coupled thereto that dampens the repulsive force according to the movement of the mover; and It includes a horizontal post on which the above-mentioned first damping block is mounted and which is separated from the above-mentioned horizontal frame and settled on the ground, The above first damping block is a first parallel block on which the above first magnet array is mounted; A stage characterized by including a first protruding block attached to both sides of the first parallel block.
In paragraph 1, A stage characterized in that the horizontal frame includes a support frame protruding to be mounted on the vibration isolation platform.
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In paragraph 1, A first attachment piece attached to the first protruding block above; A first torsion member connected to the first attachment piece above; A first connecting piece connected to the other end of the first twisting member; A “L”-shaped first fixing member attached to the upper surface of the horizontal post; and A stage characterized by including a first elastic member connected between the first connecting piece and the first fixing member.
In paragraph 1, A stage characterized by further including vertical posts installed vertically on each side of the horizontal post.
In paragraph 5, A stage characterized by further including an upper plate attached to the upper surface of an upright plate installed on both sides of the parallel plate, installed across both sides of the upright plate, and having a longitudinal block insertion groove.
In paragraph 6, A stage characterized in that the upper platen includes a block insertion hole drilled in a first direction.
In Paragraph 7, It includes a second damping block installed on the upper platen, The above second damping block comprises a second parallel block installed in a block insertion groove; and A stage characterized by including a second protruding block inserted into the block insertion hole.
In paragraph 8, A processing head installed on the upper platen; and A stage characterized by further including a second magnet array attached longitudinally to the second parallel block to provide thrust to the processing head.
In Paragraph 9, A second attachment piece attached to the second protruding block above; A second twisting member connected to the second attachment piece above; A second connecting piece connected to the other end of the second twisting member; A “L”-shaped second fixing member attached to the upper surface of the vertical post; and A stage characterized by including a second elastic member connected between the second connecting piece and the second fixing member to attenuate the repulsive force of a processing head moving in a second direction.

Description

Stage with a repulsive force reduction structure The present invention relates to a stage having a repulsion force reduction structure, and more specifically, to a stage required for a TGV Laser Application in a glass substrate manufacturing process and a stage having a high-precision repulsion force reduction structure with minimized error applied in the field of semiconductor device manufacturing. High-precision stages used in the manufacture of semiconductor devices require very precise position control without error. Due to the miniaturization or superposition of design rules for semiconductor devices, or the requirements for stacking, stages used in manufacturing are required to be high-precision. Korean Registered Patent No. 10-1644175 (Title of Invention: Linear Motor Stage) comprises: a base; a magnetic track that moves on the base; a mover that moves on one side of the magnetic track by an electromagnetic force formed between the mover and the magnetic track; and a pair of first and second repulsion force compensators disposed on each side of the magnetic track and attenuating the repulsion force acting on the base by the movement of the mover. At this time, the first repulsion force compensator is provided in a movable state on the base and includes a first eddy current damper disposed on one side of the magnetic track and a first elastic member connecting the first eddy current damper to the base, and the second repulsion force compensator is provided in a movable state on the base and includes a second eddy current damper disposed on the other side of the magnetic track and a second elastic member connecting the second eddy current damper to the base. However, according to Korean registered patent No. 10-1644175, while it is possible to reduce the repulsive force for linear movement of a linear motor in a single plane, it is not possible to simultaneously implement a structure that reduces the repulsive force due to the movement of the mover on which the workpiece is placed as well as the movement of the gantry-type machining machine above the mover. FIG. 1 is a perspective view of a stage according to an embodiment of the present invention. FIG. 2 is a cross-sectional view of a stage according to an embodiment of the present invention. FIG. 3 is a detailed structural diagram of the repulsive force reduction of a mover according to an embodiment of the present invention. FIG. 4 is a detailed structural diagram of the repulsion force reduction of a processing head according to an embodiment of the present invention. Specific structural or functional descriptions regarding embodiments according to the concept of the present invention disclosed herein are provided merely for the purpose of explaining embodiments according to the concept of the present invention, and embodiments according to the concept of the present invention may be implemented in various forms and are not limited to the embodiments described herein. Terms such as "first" or "second" may be used to describe various components, but said components should not be limited by said terms. For the sole purpose of distinguishing one component from another, for example, without departing from the scope of rights according to the concept of the present invention, the first component may be named the second component and similarly the second component may be named the first component. When it is stated that one component is "connected" or "connected" to another component, it should be understood that while it may be directly connected or connected to that other component, there may also be other components in between. Conversely, when it is stated that one component is "directly connected" or "directly connected" to another component, it should be understood that there are no other components in between. Other expressions describing the relationships between components, such as "between" and "exactly between," or "adjacent to" and "directly adjacent to," should be interpreted in the same way. The terms used herein are used merely to describe specific embodiments and are not intended to limit the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this specification, terms such as "comprising" or "having" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described herein, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof. Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings attached to this specification. FIG. 1 is a perspective view of a stage according to an embodiment of the present invention. FIG. 2 is a cross-sectional view of a stage according to an embodiment of the present invention. FIG. 3 is a detailed structural diagram of the repu