KR-102964945-B1 - COATING DEVICE

Abstract

In a coating device for applying a coating liquid (P) to the surface of a substrate by moving a coating nozzle (10) relative to the substrate (W) over the substrate (W) and applying the coating liquid (P) from a slit-shaped discharge port (12) within a coating liquid receiving portion (11) of the coating nozzle, a shutter member (13) that rotates within the coating liquid receiving portion to open and close the coating liquid receiving portion and the slit-shaped discharge port, and a gas supply adjustment means (32) that adjusts the pressure applied to the coating liquid within the coating liquid receiving portion, and while maintaining the pressure applied to the coating liquid within the coating liquid receiving portion at a constant pressure by the gas supply adjustment means, the shutter member is rotated to open and close the coating liquid receiving portion and the slit-shaped discharge port.

Inventors

• 니시오 쓰토무

Assignees

• 쥬가이로 고교 가부시키가이샤

Dates

Publication Date

20260513

Application Date

20210621

Priority Date

20200907

Claims (5)

1. In a coating device for a coating nozzle, a coating liquid is supplied from a coating liquid supply device through a coating liquid supply pipe into a coating liquid receiving portion, and at the same time, a slit-shaped discharge port at the tip of the coating nozzle that discharges the coating liquid within the coating liquid receiving portion is positioned above a substrate, and the coating device and the coating nozzle are moved relative to each other to apply the coating liquid within the coating liquid receiving portion to the surface of the substrate through the slit-shaped discharge port, wherein a shutter member is installed to rotate within the coating liquid receiving portion to open and close the coating liquid receiving portion and the slit-shaped discharge port, and a pressure regulating means is installed to adjust the pressure applied to the coating liquid within the coating liquid receiving portion, and while maintaining the pressure applied to the coating liquid within the coating liquid receiving portion at a constant pressure by the pressure regulating means, the shutter member is rotated to open and close the coating liquid receiving portion and the slit-shaped discharge port, and as the pressure regulating means, gas is supplied into the coating liquid receiving portion while the coating liquid is supplied into the coating liquid receiving portion, and within the coating liquid receiving portion A coating device characterized by the use of a gas supply adjustment means that adjusts the pressure applied to the coating liquid to a constant pressure.
2. In the description of claim 1, A coating device characterized by using a guide notch portion extending longer than the slit-shaped discharge port along the axial direction on the outer periphery of a rod-shaped frame rotating within a coating liquid receiving portion as the above-mentioned shutter member, rotating the shutter member to guide the guide notch portion to the position of the slit-shaped discharge port to connect the coating liquid receiving portion and the slit-shaped discharge port, and coating the coating liquid within the coating liquid receiving portion onto the surface of a coated object through the guide notch portion to the slit-shaped discharge port.
3. In the description of claim 1 or claim 2, A coating device characterized by opening and closing the shutter member at an appropriate timing according to the shape of the guide notch portion of the shutter member and being able to apply in various shapes.
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Description

Coating Device The present invention relates to a coating device that supplies a coating liquid from a coating supply device through a coating supply pipe into a coating liquid receiving portion of a coating nozzle, and simultaneously places a slit-shaped discharge port at the tip of the coating nozzle, which discharges the coating liquid within the coating liquid receiving portion, on a substrate to be coated, and moves the substrate to be coated and the coating nozzle relative to each other to apply the coating liquid within the coating liquid receiving portion to the surface of the substrate through the slit-shaped discharge port. In particular, the invention is characterized by the fact that when applying the coating liquid to the surface of the substrate through the slit-shaped discharge port installed at the tip of the coating nozzle by moving the substrate to be coated and the coating liquid is applied to the surface of the substrate with a uniform thickness so as not to result in an uneven thickness of the coating liquid on the surface of the substrate. Conventionally, a coating solution is applied to the surface of a coated object using a coating device. As such a coating device, as shown in Patent Document 1, a coating solution is supplied from a coating solution supply device to a coating nozzle through a coating solution supply pipe, and at the same time, a slit-shaped discharge opening at the tip of the coating nozzle is positioned facing the coated object, and the coating nozzle is placed over the coated object. The coating solution is supplied from the coating solution supply device to the coating nozzle through the coating solution supply pipe at a predetermined pressure, and the coating solution is discharged from the slit-shaped discharge opening onto the surface of the coated object, while the coating nozzle is moved over the coated object in the coating direction to apply the coating solution to the surface of the coated object. Here, when the coating liquid is supplied from the coating liquid supply device to the coating nozzle at a predetermined pressure as described above and discharged onto the surface of the substrate through a slit-shaped discharge port, when the coating liquid is supplied from the coating liquid supply device to the coating liquid receiving part through the coating liquid supply pipe, pipe pressure loss occurs, making it impossible to rapidly discharge a predetermined amount of coating liquid onto the surface of the substrate through the slit-shaped discharge port. Furthermore, the film thickness of the coating liquid applied to the surface of the substrate gradually increases from the start of application, requiring a predetermined amount of time until the film thickness of the coating liquid applied to the surface of the substrate becomes constant. At the same time, when stopping the application of the coating liquid to the surface of the substrate, even if the pressure applied to the coating liquid supplied from the coating liquid supply device to the coating nozzle is reduced to prevent the coating liquid from being discharged from the coating nozzle, time is required until the coating liquid is no longer discharged from the coating nozzle, and the film thickness of the coating liquid applied to the surface of the substrate gradually decreases. Consequently, the coating liquid cannot be applied to the surface of the substrate with a uniform thickness at the start and stop of application. There wasn't. In addition, in the above-mentioned coating device, in order to apply the coating liquid to the surface of the substrate with a uniform thickness, it is necessary to finely adjust the speed at which the coating nozzle moves in the coating direction over the substrate at the start of coating and before stopping coating, making it very difficult to apply the coating liquid to the surface of the substrate with a uniform thickness. In addition, conventionally, as shown in Patent Document 2, a shutter member is installed below a slit-shaped discharge opening at the tip of a coating nozzle, which is moved by a cylinder to open and close the slit-shaped discharge opening, and the slit-shaped discharge opening is closed by this shutter member to prevent volatile solvents in the coating liquid from volatilizing. Here, in a case where the shutter member is moved horizontally by a cylinder under the slit-shaped discharge port and the slit-shaped discharge port is closed, when the coating liquid is supplied to the coating nozzle at a predetermined pressure and the coating liquid is discharged from the slit-shaped discharge port onto the surface of the coated object, a large pressure from the coating liquid is applied to the shutter member installed under the slit-shaped discharge port, causing the plate-shaped shutter member or the cylinder rod to be pushed and bent by the coating liquid, and the coating liquid from the coating nozzle leaks between the slit-shaped discharge