Search

KR-102965194-B1 - fluid dispenser and spin coater including the same

KR102965194B1KR 102965194 B1KR102965194 B1KR 102965194B1KR-102965194-B1

Abstract

The technical concept of the present invention provides a fluid dispenser and a spin coater including the same, which further enhance the hydrophobicity of the substrate in RRC operation and improve the removal effect of organic particles, bubbles, etc. remaining on the substrate. The fluid dispenser comprises: a nozzle arm including a nozzle block configured to have a nozzle coupled to its lower surface, a pipe block having intermediate pipes arranged therein, and a support block configured to support the pipe block; a transfer device including a transfer body and a transfer rail; and a nozzle part configured to discharge the PR composition and a thinner toward the substrate; wherein the nozzle part comprises a central nozzle coupled to the center of the lower surface of the nozzle block and configured to discharge the thinner toward the substrate, at least one first nozzle coupled to the lower surface of the nozzle block in a first direction with the central nozzle and configured to discharge the PR composition toward the substrate, and at least one second nozzle coupled to the lower surface of the nozzle block in a second direction with the central nozzle and configured to discharge the thinner toward the substrate.

Inventors

  • 손영준

Assignees

  • 세메스 주식회사

Dates

Publication Date
20260513
Application Date
20220420

Claims (10)

  1. A nozzle arm comprising: a nozzle block configured to have a nozzle coupled to its lower surface; a pipe block coupled to the side of the nozzle block and having intermediate pipes arranged therein for transporting a photoresist (PR) composition and a thinner to the nozzle; and a support block configured to support the lower surface of the pipe block; A transfer device comprising: a transfer body connected to the side of the support block and configured to move the nozzle arm up and down in a direction toward the lower surface of the support block; and a transfer rail coupled to the transfer body and configured to move the transfer body left and right in a direction perpendicular to the direction toward the lower surface of the support block and the direction toward the side of the transfer body connected to the support block; and A nozzle part coupled to the lower surface of the nozzle block and configured to discharge the PR composition and thinner toward a substrate; comprising, The above nozzle part is, A central nozzle coupled at the center of the lower surface of the above nozzle block and configured to discharge a thinner toward the substrate, A plurality of first nozzles configured to be coupled to the central nozzle on the lower surface of the nozzle block in a first direction and to discharge a PR composition toward a substrate, and It includes at least one second nozzle that is coupled to the central nozzle on the lower surface of the nozzle block in a second direction and configured to discharge a thinner toward the substrate, A fluid dispenser characterized in that the plurality of first nozzles discharge different PR compositions, the diluent discharged from the center nozzle and the diluent discharged from the second nozzle form a convergence point, and the imaginary line connecting the center nozzle and the second nozzle is a straight line.
  2. In paragraph 1, A fluid dispenser characterized in that the first direction is the same as the second direction.
  3. In paragraph 1, A fluid dispenser characterized in that the first direction is perpendicular to the second direction.
  4. In paragraph 1, A fluid dispenser characterized in that the second nozzles are a plurality of times, and the second nozzles are coupled symmetrically around the central nozzle on the lower surface of the nozzle block.
  5. delete
  6. A nozzle arm comprising: a nozzle block configured to have a nozzle coupled to its lower surface; a pipe block coupled to the side of the nozzle block and having intermediate pipes arranged therein for transporting a photoresist (PR) composition and a thinner to the nozzle; and a support block configured to support the lower surface of the pipe block; A transfer device comprising: a transfer body connected to the side of the support block and configured to move the nozzle arm up and down in a direction toward the lower surface of the support block; and a transfer rail coupled to the transfer body and configured to move the transfer body in a direction perpendicular to the direction toward the lower surface of the support block and the direction toward the side of the transfer body connected to the support block. A nozzle part coupled to the lower surface of the nozzle block and configured to discharge the PR composition and thinner toward a substrate; At least one spinner configured to rotate said substrate on which the substrate to be coated is placed; and A nozzle housing configured to have a space for housing the nozzle portion corresponding to the nozzle portion; comprising, The above nozzle part is, A central nozzle coupled at the center of the lower surface of the above nozzle block and configured to discharge a thinner toward the substrate, A plurality of first nozzles configured to be coupled to the central nozzle on the lower surface of the nozzle block in a first direction and to discharge different PR compositions toward a substrate, and It includes at least one second nozzle that is coupled to the central nozzle on the lower surface of the nozzle block in a second direction and configured to discharge a thinner toward the substrate, A spin coater characterized in that the diluent discharged from the central nozzle and the diluent discharged from the second nozzle form a convergence point, and the imaginary line connecting the central nozzle and the second nozzle is a straight line.
  7. In paragraph 6, A spin coater characterized in that the first direction and the second direction are identical.
  8. In paragraph 6, A spin coater characterized in that the first direction is perpendicular to the second direction.
  9. In paragraph 6, A spin coater characterized in that the second nozzles are a plurality of such nozzles, and the second nozzles are coupled symmetrically around the central nozzle on the lower surface of the nozzle block.
  10. delete

Description

Fluid dispenser and spin coater including the same The present invention relates to a semiconductor device manufacturing apparatus, and more specifically, to a fluid dispenser that further enhances the hydrophobicity of a substrate during RRC operation and has an excellent effect of removing organic particles, bubbles, etc. remaining on the substrate, and a spin coater including the same. Semiconductor devices can be manufactured through multiple semiconductor processes. For example, semiconductor processes may include thin film deposition, photolithography, etching, cleaning, and ion implantation processes. Among these, the photolithography process may refer to a process of forming a photoresist (PR) pattern on a substrate such as a wafer. The photolithography process may include, for example, a PR coating process, a baking process, an exposure process, and a development process. FIG. 1 is a plan view schematically showing another spin coater in one embodiment of the present invention. FIG. 2 is a perspective view showing the fluid dispenser and nozzle housing in the spin coater of FIG. 1. FIGS. 3 to 6 are schematic diagrams showing a nozzle portion according to exemplary embodiments of the present invention as viewed from the -z-axis direction. FIGS. 7 and FIGS. 8 are a side view and a front view showing a fluid dispenser and a nozzle housing according to one embodiment of the present invention. FIG. 9 is a schematic diagram showing a fluid dispenser including a controller according to an exemplary embodiment of the present invention. Figure 10 is a graph illustrating the operation of the center nozzle and the second nozzle according to the controller. FIG. 11 is a flowchart illustrating the operation of a fluid dispenser according to an exemplary embodiment. Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Identical components in the drawings are denoted by the same reference numerals, and redundant descriptions thereof are omitted. FIG. 1 is a plan view schematically showing another spin coater (10) of one embodiment of the present invention, and FIG. 2 is a perspective view showing a fluid dispenser (100) and a nozzle housing (200) portion of the spin coater (10) of FIG. 1. Referring to FIGS. 1 and 2, the direction in which the nozzle arm (120) extends can be defined as the x direction, the direction in which the transfer rail extends perpendicular to the x direction can be defined as the y direction, and the direction perpendicular to each of the x direction and the y direction can be defined as the z direction. The spin coater (10) of the present embodiment may include a fluid dispenser (100), a nozzle housing (200), and a spin chuck (300). Additionally, the spin coater (10) may further include a photoresist (PR) composition supply unit, a purge gas supply unit, a thinner or organic solvent supply unit, etc. The fluid dispenser (100) may include a nozzle arm (120), a transfer device (110), and a nozzle part (130). The fluid dispenser (100) may supply fluid to a substrate. According to exemplary embodiments, the fluid dispenser (100) may supply a PR composition, a diluent, etc. to a substrate. In some embodiments, the nozzle arm (120) may include a nozzle block (121), a piping block (123), and a support block (125). The nozzle block (121) may be configured so that a nozzle portion (130) is coupled to its lower surface. In some embodiments, the piping block (123) may be coupled to the side of the nozzle block (121). Intermediate pipes for delivering PR composition, diluent, constant temperature water, etc. may be disposed in the piping block (123). In some embodiments, the support block (125) may support the lower surface of the piping block (123) and be coupled to the side of the transfer body (111). Accordingly, the nozzle arm (120) including the support block (125) may be coupled to the transfer body (111). The transfer device (110) may include a transfer body (111) and a transfer rail (113). In some embodiments, the transfer body (111) may be coupled to the side of the support block (125) and configured to move the support block (125) in the z-direction as indicated by the arrow. The transfer rail (113) may be coupled to the transfer body (111) and configured to move the transfer body (111) in the y-direction, which is the direction in which the transfer rail (113) extends, as indicated by the arrow. Eventually, the support block (125) can be moved to any coordinate on the y-z plane by the transfer body (111), and accordingly, the nozzle arm (120) including the support block (125) can also be moved to any coordinate on the y-z plane. The nozzle section (130) is coupled to the lower surface of the nozzle block (121) and may be configured to discharge fluid toward a substrate. The nozzle section (130) may include a plurality of nozzles. The nozzles may have the shape of a generally conical tube that tapers downward. According t