KR-20260062863-A - IMPRINT METHOD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD

KR20260062863AKR 20260062863 AKR20260062863 AKR 20260062863AKR-20260062863-A

Abstract

An imprint method for forming a pattern on an imprint material disposed on at least one layer formed on a substrate using a mold, comprising: a step of acquiring gas information regarding a gas in a storage space for storing a substrate; a step of determining a value of a control parameter for controlling exposure to irradiate light onto an imprint material while the mold is in contact with the imprint material on at least one layer of a substrate stored in the storage space, based on the gas information acquired in the acquisition step; and a step of performing exposure according to the value of the control parameter determined in the determination step.

Inventors

시치조 마사토

Assignees

캐논 가부시끼가이샤

Dates

Publication Date: 20260507
Application Date: 20251027
Priority Date: 20241029

Claims (15)

An imprint method for forming a pattern on an imprint material disposed on at least one layer formed on a substrate using a mold, and A step of acquiring gas information regarding a gas within a storage space storing the above substrate; A step of determining the value of a control parameter for controlling an exposure to irradiate light onto an imprint material while the mold is in contact with the imprint material on at least one layer of the substrate stored in the storage space, based on the gas information obtained in the above-mentioned acquisition step; and An imprint method comprising the step of performing the exposure according to the value of the control parameter determined in the above determining step.
In paragraph 1, The above exposure is Pre-exposure for increasing the viscosity of the imprint material by irradiating the imprint material with light before curing the imprint material; and An imprint method comprising a main exposure in which light is irradiated onto the imprint material after the above-mentioned prior exposure to cure the imprint material.
In paragraph 2, In the above determining step, the value of the control parameter for controlling the above pre-exposure is determined, and In the step of performing the above exposure, the imprint method in which the above prior exposure is performed.
In paragraph 3, The above-mentioned pre-exposure is an imprint method performed in parallel with alignment between the mold and the substrate in the above state.
In paragraph 1, In the above acquisition step, the gas information is obtained by an imprint method in which the gas is detected using a gas detector placed within the storage space.
In paragraph 1, The above gas information is an imprint method including the type of gas and the concentration of the gas.
In paragraph 6, The above gas is an imprint method containing oxygen.
In paragraph 1, The above control parameter is an imprint method comprising at least one of the illuminance, irradiation time, and wavelength of light irradiated onto the imprint material.
In paragraph 1, An imprint method further comprising the step of displaying the gas information obtained in the above-mentioned acquisition step on a user interface.
In paragraph 1, An imprint method further comprising the step of displaying the value of the control parameter determined in the above determining step on a user interface.
In paragraph 1, The above-mentioned at least one layer is an imprint method comprising spin-on carbon.
An imprint device that forms a pattern on an imprint material disposed on at least one layer formed on a substrate using a mold, and An acquisition unit configured to acquire gas information regarding a gas within a storage space storing the above substrate; A determination unit configured to determine the value of a control parameter for controlling an exposure to irradiate light onto the imprint material while the mold is in contact with the imprint material on at least one layer of the substrate stored in the storage space, based on the gas information acquired by the acquisition unit; and An imprint device comprising a processing unit configured to perform the exposure according to the value of the control parameter determined by the above-mentioned determination unit.
In Paragraph 12, An imprint device further comprising a user interface configured to display the above gas information and the values of the above control parameters.
In Paragraph 13, The above user interface is an imprint device that receives user operations to adjust the value of the above control parameter.
It is a method of manufacturing an item, and A step of forming a pattern on a substrate using the imprint method defined in claim 1; A step of processing the substrate on which the pattern is formed in the above formation step; and A method for manufacturing an article comprising the step of manufacturing an article from the above-mentioned processed substrate.

Description

IMPRINT METHOD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD The present disclosure relates to an imprint method, an imprint device, and a method for manufacturing an article. As one of the lithography devices for manufacturing a device, there is an imprint device that performs an imprint process to form a pattern formed from the cured imprint material by contacting a mold with an imprint material on a substrate and curing the imprint material. The imprint process includes a contact step of contacting the imprint material on the substrate with the mold, an alignment step of aligning the mold and the substrate after the contact step, and a curing step of curing the imprint material after the alignment step. Before performing the imprint process, an underlayer and an adhesion layer are placed (coated) on the substrate. Regarding an imprint device, Japanese Patent Publication No. 2021-190595 proposes a technique for reducing relative vibration between a mold and a substrate in a state where an imprint material on a substrate and a mold are in contact with each other (contact state). Japanese Patent Publication No. 2021-190595 discloses an imprint device comprising an adjustment unit for adjusting the viscosity of the imprint material, and a control unit for changing parameter values that control the adjustment unit according to changes in control information for controlling the alignment operation between the mold and the substrate in the contact state. In an imprint device, during the alignment stage, so-called pre-exposure is performed by irradiating the imprint material with light in a wavelength band having light absorption sensitivity and increasing the viscosity of the imprint material to reduce relative vibration between the mold and the substrate. However, if a substrate with an underlayer or a bonding layer is stored in a storage space, and the oxygen concentration in the storage space is high, oxygen is absorbed by the underlayer or bonding layer, which hinders the curing of the imprint material and prevents the viscosity of the imprint material from being sufficiently increased during pre-exposure. As a result, the relative vibration between the mold and the substrate cannot be reduced as intended, and the alignment precision between the mold and the substrate is reduced. The present disclosure provides a technology advantageous for aligning a mold and a substrate. According to one aspect of the present disclosure, an imprint method is provided for forming a pattern on an imprint material disposed on at least one layer formed on a substrate using a mold, wherein the imprint method comprises: a step of acquiring gas information regarding a gas in a storage space for storing a substrate; a step of determining, based on the gas information acquired in the acquisition step, a value of a control parameter for controlling exposure to irradiate light onto the imprint material while the mold is in contact with the imprint material on at least one layer of the substrate stored in the storage space; and a step of performing exposure according to the value of the control parameter determined in the determination step. Further aspects of the present disclosure will become apparent from the following description of exemplary embodiments with reference to the accompanying drawings. Figure 1 is a schematic diagram illustrating the configuration of an imprint system. Figure 2 is a schematic diagram illustrating the configuration of an imprint system. Figure 3 is a schematic diagram illustrating the configuration of a light source unit. Figure 4 is a diagram illustrating an example of variation in relative vibration between a mold and a substrate. Figure 5 is a diagram illustrating an example of variation in relative vibration between a mold and a substrate. Figure 6 is a flowchart illustrating the operation of an imprint system. FIGS. 7A and FIGS. 7B are drawings illustrating an example of gas information and control parameter values displayed on a user interface. FIGS. 8a to 8f are drawings for explaining a method of manufacturing an article. Hereinafter, embodiments are described in detail with reference to the accompanying drawings. It should be noted that the following embodiments do not limit the scope of the claimed disclosure. Although numerous features are described in the embodiments, the invention is not limited to requiring all such features, and numerous such features may be appropriately combined. Furthermore, in the accompanying drawings, the same reference numerals are assigned to identical or similar components, and redundant descriptions thereof are omitted. FIG. 1 is a schematic diagram illustrating the configuration of an imprint system (1000). The imprint system (1000) is a system for forming a pattern on an imprint material on a substrate. The imprint system (1000) includes a coating device (100), a control device (300), and an imprint device (1). The coating device (100) includes, for ex