KR-20260063169-A - IONIZER USING PLASMA

KR20260063169AKR 20260063169 AKR20260063169 AKR 20260063169AKR-20260063169-A

Abstract

An electrostatic discharge device using plasma is an electrostatic discharge device that supplies positive ions into a vacuum chamber containing a discharge target, and the electrostatic discharge device includes a plasma generation chamber in which an electromagnetic field is formed and a process gas is supplied to generate positive ions.

Inventors

김태훈
김진의
최민우
박상선
유한길

Assignees

(주) 예스티

Dates

Publication Date: 20260507
Application Date: 20241030

Claims (17)

As an electrostatic discharge device that supplies cations into a vacuum chamber containing a discharge target, The above electrostatic discharge device is, Electrostatic discharge device using plasma comprising a plasma generation chamber in which an electromagnetic field is formed and a process gas is supplied to generate the positive ions.
In Article 1, First electrode; A second electrode facing the first electrode; and An electrostatic discharge device using plasma, further comprising a power source that applies voltage to the first electrode and the second electrode to form the electromagnetic field in the plasma generation chamber.
In Article 2, An electrostatic discharge device using plasma, wherein the first electrode and the second electrode are located outside the plasma generation chamber.
In Paragraph 3, An electrostatic discharge device using plasma, wherein the first electrode and the second electrode are connected through a connecting part, the first electrode is located on one side of the connecting part, and the second electrode is located on the other side of the connecting part.
In Article 1, It further includes an ion emission unit located on one side of the plasma generation chamber and having an ion emission port formed therein for emitting the positive ions, An electrostatic discharge device using plasma, wherein a bias voltage is applied to the ion emission part to cause the positive ions to flow out through the ion emission port.
In Article 1, An electrostatic discharge device using plasma, further comprising a gas supply unit located on the other side of the plasma generation chamber and having a process gas inlet hole formed therein for introducing the process gas.
In Article 1, It further includes a gas supply unit located on the other side of the plasma generation chamber and having a guide gas inlet hole formed therein, The above guide gas inlet hole is formed on the side of the gas supply part, and An electrostatic discharge device using plasma, wherein the guide gas introduced through the guide gas inlet hole flows along the inner wall of the plasma generation chamber, causing the positive ions to move away from the inner wall.
In Article 1, It further includes a gas supply unit located on the other side of the plasma generation chamber and having an acceleration gas inlet hole formed therein, An electrostatic discharge device using plasma in which the accelerating gas introduced through the accelerating gas inlet hole accelerates the emission of the positive ions.
In Article 8, It further includes an ion emission unit located on one side of the plasma generation chamber and having an ion emission port formed therein for emitting the positive ions, Electrostatic discharge device using plasma, wherein the acceleration gas inlet hole and the ion emission port are located on the same straight line.
In Article 1, It further includes a gas supply unit located on the other side of the plasma generation chamber and having a gas inlet hole formed therein, The above gas inlet hole is, A process gas inlet hole into which the above process gas is introduced; Acceleration gas inlet hole into which acceleration gas is introduced; and It includes a guide gas inlet hole into which guide gas is introduced, and The guide gas is a gas that flows along the inner wall of the plasma generation chamber and causes the cations to move away from the inner wall. An electrostatic discharge device using plasma in which the above-mentioned accelerating gas is a gas that accelerates the emission of the above-mentioned cations.
In Article 1, It further includes a gas supply unit located on the other side of the plasma generation chamber and having a selective gas inlet hole formed therein, Electrostatic discharge device using plasma, wherein the process gas or acceleration gas is selectively introduced through the selective gas inlet hole.
In Article 11, A process gas supply chamber for supplying the above process gas; An acceleration gas supply chamber for supplying the above acceleration gas; A first shut-off valve that opens and closes the path through which the process gas from the process gas supply chamber flows into the gas inlet hole; A second shut-off valve that opens and closes the path through which the acceleration gas from the acceleration gas supply chamber flows into the gas inlet hole; and An electrostatic discharge device using plasma, further comprising a control unit that controls the first shut-off valve and the second shut-off valve to selectively allow the process gas or acceleration gas to flow into the plasma generation chamber through the selective gas inlet hole.
In Article 1, The above plasma generation chamber is a ceramic or quartz tube, and the electrostatic discharge device using plasma.
In Article 1, The above power source is a transformer that provides a supply voltage of 1 to 10,000V, and is an electrostatic discharge device using plasma.
In Paragraph 3, An electrostatic discharge device using plasma, further comprising a shielding part that shields the first electrode and the second electrode from the outside.
In Article 15, The above shielding part is a receptacle that accommodates the first electrode and the second electrode, and is an electrostatic discharge device using plasma.
In Article 15, The above shielding part is a coating layer formed on the surface of the first electrode and the second electrode, in a plasma-based electrostatic discharge device.

Description

Electrostatic discharge device using plasma {IONIZER USING PLASMA} The present invention relates to an electrostatic discharge device using plasma, and more specifically, to an electrostatic discharge device using plasma in which an electrode forming an electric field inside a plasma generation chamber is located outside the plasma generation chamber. Static electricity is generated by various causes, including friction and peeling. Such static electricity can occur in diverse environments, regardless of whether the material is a solid, liquid, insulator, or conductor. While the generated static electricity consists of equal amounts of positive and negative charges, in actual processes, static electricity of only one polarity often manifests due to the difference in capacitance between the two. In the manufacturing process of electronic devices such as memory devices, flat panel displays, and integrated circuits, foreign substances may adhere to the electronic devices due to the generation of static electricity, or patterns may be damaged by electrostatic discharge. In particular, static electricity can be generated on the surface of the glass substrate during the deposition process of display panels, and in the deposition process of Organic Light Emitting Diodes (OLED) display panels, static electricity generated during substrate transport causes a problem where the substrate is physically damaged by the mask stick during the mask attachment and detachment process. To eliminate such static electricity, an ionization device that generates plasma and supplies ions can provide positive ions into a vacuum process space (see Registered Patent No. 10-1622320). In addition, there is a capacitive coupling plasma (CCP) method, which is a parallel plate-type plasma method for generating plasma (see Registered Patent No. 10-1840294); however, the conventional CCP method has a problem in that electrodes are present within the plasma generation chamber, causing the electrodes to be contaminated and damaged by the plasma. FIG. 1 is a simplified cross-sectional view of an electrostatic discharge device according to one embodiment of the present invention. FIG. 2(a) is a cross-sectional view of a hemispherical electrode composed of a first electrode and a second electrode. FIG. 2(b) is a cross-sectional view of a "C" shaped electrode composed of a first electrode and a second electrode. Figure 3(a) is a cross-sectional view of a hemispherical electrode with a shielding portion formed thereon. Figure 3(b) is a cross-sectional view of a "C"-shaped electrode with a shielding portion formed thereon. FIG. 4 is a cross-sectional view of an electrostatic discharge device according to another embodiment of the present invention. Figure 5 is a diagram showing how a guide gas causes cations to move away from the inner wall of the chamber. Figure 6 is a diagram showing an accelerating gas accelerating the emission of cations. FIG. 7 is a cross-sectional view of an electrostatic discharge device according to another embodiment of the present invention. The present invention is not limited to the embodiments disclosed below but may be implemented in various different forms, and these embodiments are provided merely to make the disclosure of the present invention complete and to fully inform those skilled in the art of the scope of the invention. In this specification, the singular form includes the plural form unless specifically stated otherwise in the text. As used in this specification, "comprises" and/or "comprising" do not exclude the presence or addition of one or more other components, steps, and actions in addition to the mentioned components, steps, and actions. With reference to FIGS. 1 to 3, an electrostatic discharge device according to an embodiment of the present invention will be described. FIG. 1 is a simplified cross-sectional view of an electrostatic discharge device according to an embodiment of the present invention. FIG. 2(a) is a cross-sectional view of a hemispherical electrode composed of a first electrode and a second electrode. FIG. 2(b) is a cross-sectional view of a "C"-shaped electrode composed of a first electrode and a second electrode. FIG. 3(a) is a cross-sectional view of a hemispherical electrode with a shielding portion formed therein. FIG. 3(b) is a cross-sectional view of a "C"-shaped electrode with a shielding portion formed therein. Referring to FIGS. 1 to 3, an electrostatic discharge device (10) according to one embodiment of the present invention includes a plasma generating chamber (20), an ion emitting unit (30), a gas supply unit (40), electrode bodies (120, 130), and a power source (70). The plasma generation chamber (20) is equipment that generates positive ions (PI) to be supplied to a vacuum chamber where static electricity is formed. In this regard, as an example, static electricity may be generated on the surface of a glass substrate during an OLED deposition process in a vacuum proc