KR-20260063466-A - DRAIN APPARATUS AND SUBSTRATE PROCESSING APPARATUS WITH DRAIN APPARATUS

Abstract

The present invention provides an apparatus for processing a substrate. The apparatus for processing a substrate includes a processing unit for processing a substrate; a liquid supply unit for supplying liquid to a substrate disposed in the processing unit; and a drain device for discharging liquid drained from the processing unit or the liquid supply unit to the outside. The drain device may include a drain box having an internal space; an inlet pipe for flowing liquid drained from the processing unit or the liquid supply unit into the internal space; a gas supply unit for supplying gas to the internal space through a gas supply pipe; a discharge pipe for discharging liquid within the internal space to the outside; and a recovery pipe branched from the inlet pipe to recover fluid flowing back from the internal space to the inlet pipe to the drain box. The present invention can prevent liquid or fumes from flowing back from the drain device to the liquid supply unit or the processing unit.

Inventors

• 선구원
• 유재승

Assignees

• 세메스 주식회사

Dates

Publication Date

20260507

Application Date

20241030

Claims (20)

1. In a device for processing substrates, Processing unit for processing substrates; A liquid supply unit for supplying liquid to a substrate disposed in the processing unit; and It includes a drain device that discharges the liquid drained from the processing unit or the liquid supply unit to the outside, The above drain device is, A drain box having an internal space; An inlet pipe for flowing the liquid drained from the processing unit or the liquid supply unit into the internal space; A gas supply unit that supplies gas to the internal space through a gas supply pipe; A discharge pipe for discharging the liquid within the internal space to the outside of the drain box; and A substrate processing device comprising a recovery pipe that branches off from the inlet pipe and recovers fluid flowing back into the inlet pipe from the internal space to the drain box.
2. In paragraph 1, A substrate processing device in which a negative pressure forming unit is coupled to the above recovery pipe.
3. In paragraph 1, The above recovery pipe is connected to the above gas supply pipe, and A substrate processing device in which an opening and closing valve is installed in the above recovery pipe.
4. In paragraph 1, An ejector having an inlet, an outlet, and a suction port is installed in the above gas supply pipe, and A pipe located on the gas source side of the gas supply pipe is connected to the above inlet, and A pipe located on the drain box side of the gas supply pipe is connected to the above outlet, and A substrate processing device in which the recovery pipe is connected to the above suction port.
5. In paragraph 4, An opening and closing valve is installed in the above recovery pipe, and The above drain device is, A differential pressure sensor that measures the pressure difference between the gas supply pipe and the return pipe; A substrate processing device further comprising a controller that controls the opening and closing valve installed in the recovery pipe based on the value measured by the differential pressure sensor.
6. In paragraph 5, The above controller is, If the differential pressure measured by the differential pressure sensor exceeds a set value, the opening and closing valve is closed, and A substrate processing device that opens the opening/closing valve when the differential pressure measured by the differential pressure sensor is less than or equal to a set value.
7. In paragraph 1, A substrate processing device in which a check valve preventing backflow is installed in the inlet pipe at a point upstream of where the return pipe branches off.
8. In paragraph 1, The above drain device is, A substrate processing apparatus further comprising a dissolving liquid supply pipe for supplying a dissolving liquid to dissolve a liquid within the internal space into the internal space.
9. In paragraph 1, The above liquid supply unit is, A bottle in which liquid is stored; A liquid supply pipe for supplying the liquid in the above bottle to the above processing unit; and It includes a filter installed in the above liquid supply pipe, and A substrate processing device in which a drainage pipe coupled to the inlet pipe is installed in the filter above.
10. In a drain device for discharging liquid, A drain box having an internal space; An inlet pipe for flowing liquid drained from an external configuration into the internal space; A gas supply unit that supplies gas to the internal space through a gas supply pipe; A dissolving liquid supply pipe that supplies a dissolving liquid to the internal space to dissolve the liquid within the internal space; A discharge pipe for discharging the liquid within the internal space to the outside of the drain box; and A drain device comprising a recovery pipe that branches off from the inlet pipe and recovers fluid flowing back into the inlet pipe from the internal space to the drain box.
11. In Paragraph 10, The above recovery pipe is connected to the above gas supply pipe, and A drain device in which an opening and closing valve is installed in the above recovery pipe.
12. In Paragraph 10, An ejector having an inlet, an outlet, and a suction port is installed in the above gas supply pipe, and A pipe located on the gas source side of the gas supply pipe is connected to the above inlet, and A pipe located on the drain box side of the gas supply pipe is connected to the above outlet, and A drain device to which the recovery pipe is connected to the above suction port.
13. In Paragraph 12, An opening and closing valve is installed in the above recovery pipe, and A differential pressure sensor for measuring the pressure difference between the gas supply pipe and the return pipe; and A drain device further comprising a controller that controls the opening and closing valve installed in the recovery pipe based on the value measured by the differential pressure sensor.
14. In Paragraph 13, The above controller is, If the differential pressure measured by the differential pressure sensor exceeds a set value, the opening and closing valve is closed, and A drain device that opens the opening/closing valve when the differential pressure measured by the differential pressure sensor is less than or equal to a set value.
15. In Paragraph 10, The above inlet pipe is, A first inlet pipe for flowing the liquid drained from the first configuration into the internal space; and It includes a second inlet pipe that flows the liquid drained from the second configuration into the internal space, and The above recovery pipe is, A first recovery pipe for recovering fluid flowing back into the first inlet pipe from the internal space into the drain box; and A drain device comprising a second recovery pipe for recovering fluid flowing back into the second inlet pipe from the internal space to the drain box.
16. In paragraph 15, In the above gas supply pipe, a first ejector having a first inlet, a first outlet, and a first suction port, and a second ejector having a second inlet, a second outlet, and a second suction port are installed. A pipe located on the gas source side of the gas supply pipe is connected to the first inlet above, and A pipe located on the drain box side among the gas supply pipes is connected to the first outlet above, and The first recovery pipe is connected to the first suction port, and A pipe located on the gas source side of the gas supply pipe is connected to the second inlet above, and A pipe located on the drain box side among the gas supply pipes is connected to the second outlet above, and A drain device in which the second recovery pipe is connected to the second suction port.
17. In Paragraph 16, A first differential pressure sensor for measuring the pressure difference between the pressure of the gas supply pipe and the pressure of the first recovery pipe; A second differential pressure sensor for measuring the pressure difference between the pressure of the gas supply pipe and the pressure of the second recovery pipe; A first opening/closing valve for opening and closing the first recovery pipe; and A drain device further comprising a second opening/closing valve for opening and closing the second recovery pipe.
18. In Paragraph 17, It further includes a controller that controls the first opening/closing valve and the second opening/closing valve, and The above controller is, If the differential pressure measured by the first differential pressure sensor exceeds a set value, the first opening/closing valve is closed, and If the differential pressure measured by the first differential pressure sensor is less than or equal to a set value, the first opening/closing valve is opened, and If the differential pressure measured by the second differential pressure sensor exceeds a set value, the second shut-off valve is closed, and A drain device that opens the second shut-off valve when the differential pressure measured by the second differential pressure sensor is less than or equal to a set value.
19. In a device for processing substrates, Processing unit for processing substrates; A liquid supply unit for supplying photoresist to a substrate disposed in the processing unit above; and It includes a drain device for discharging photoresist drained from the above liquid supply unit to the outside, and The above drain device is, A drain box having an internal space; An inlet pipe for flowing the photoresist drained from the above liquid supply unit into the above internal space; A gas supply unit that supplies gas to the internal space through a gas supply pipe; A thinner supply pipe for supplying a thinner that dissolves the photoresist within the internal space; A discharge pipe for discharging the liquid within the internal space to the outside of the drain box; A recovery pipe branching from the inlet pipe and recovering fluid flowing back into the inlet pipe from the internal space to the drain box; An opening/closing valve for opening and closing the above recovery pipe; and It includes an ejector installed in the above gas supply pipe and having an inlet, an outlet, and a suction port, and A pipe located on the gas source side of the gas supply pipe is connected to the above inlet, and A pipe located on the drain box side of the gas supply pipe is connected to the above outlet, and A substrate processing device in which the recovery pipe is connected to the above suction port.
20. In Paragraph 19, It further includes a controller that controls the above drain device, The above drain device is, It further includes a differential pressure sensor that measures the difference between the pressure of the gas supply pipe and the pressure of the return pipe, The above controller is, If the differential pressure measured by the differential pressure sensor exceeds a set value, the opening and closing valve is closed, and A substrate processing device that opens the opening/closing valve when the differential pressure measured by the differential pressure sensor is less than or equal to a set value.

Description

Drain apparatus and substrate processing apparatus including the same {DRAIN APPARATUS AND SUBSTRATE PROCESSING APPARATUS WITH DRAIN APPARATUS} The present invention relates to a drain device and a substrate processing device including the same. To manufacture semiconductor devices, various processes such as cleaning, deposition, photolithography, etching, and ion implantation are performed. Among these processes, the photolithography process includes a coating process that forms a film by applying a photosensitive material, such as photoresist (PR), to the surface of a substrate; an exposure process that transfers a circuit pattern onto the film formed on the substrate; and a development process that selectively removes the film formed on the substrate from the exposed area or the opposite area. Generally, a device performing a coating process forms a liquid film on a substrate by supplying a liquid, such as photoresist, from a nozzle to a rotating substrate. As shown in FIG. 1, a liquid supply unit (5100) that supplies liquid to a nozzle (5190) supplies gas to a bottle (5110) through a gas supply unit (5120) and supplies the liquid inside the bottle (5110) to a trap tank (5140) through a liquid supply pipe (5130). A pump (5150) that provides flow pressure and a filter (5170) are provided in the liquid supply pipe (5130) downstream of the trap tank (5140) to flow the liquid inside the trap tank (5140) to the nozzle (5190) and filter out impurities inside the liquid. The liquid filtered by the filter (5170) is drained to a drain device (5300) and discharged to the outside. Referring to FIG. 2, the drain device (5300) includes a drain box (5310), an inlet pipe (5330) that flows liquid drained from a filter (5170) into the drain box (5310), a thinner supply unit (5350), a discharge pipe (5370) that discharges the liquid to the outside, and a gas supply unit (5390). The gas supply pipe (5390) supplies high-pressure gas into the drain box (5310) to mix the liquid and thinner, and discharges the liquid through the discharge pipe (5370). Due to the supply of gas, the pressure inside the drain box (5310) increases, causing the liquid or fume inside the drain box (5310) to flow back into the inlet pipe (5330), and contaminated liquid or fume flows into the filter (5170) due to the failure or damage of the check valve (5331) installed in the inlet pipe (5330). As the liquid or fume flowing back into the filter (5170) flows through the liquid supply pipe (5130), there is a problem of contaminating the components of the liquid supply unit (5100) and the substrate (W). Figure 1 is a drawing showing an example of a typical liquid supply unit that supplies liquid to a nozzle. Figure 2 is a drawing showing an example of a typical drain device. FIG. 3 is a schematic diagram showing a substrate processing apparatus according to one embodiment of the present invention. Figure 4 is a schematic diagram showing an example of the processing unit of Figure 3. FIG. 5 is a perspective view schematically showing an example of the drain device of FIG. 3. Fig. 6 is a front view of the drain device of Fig. 5. FIGS. 7 and 8 are schematic diagrams illustrating a liquid recovery method of a drain device according to one embodiment. FIG. 9 is a diagram schematically showing the structure of a liquid supply unit according to another embodiment. FIG. 10 is a schematic diagram showing an example of the drain device of FIG. 9. FIG. 11 is a schematic diagram showing another embodiment of the drain device of FIG. 9. FIG. 12 is a schematic diagram showing another embodiment of the substrate processing apparatus of FIG. 2. FIG. 13 is a schematic diagram showing another embodiment of the drain device of FIG. 6. Embodiments of the present invention are described below with reference to the attached drawings so that those skilled in the art can easily implement them. However, the present invention may be embodied in various different forms and is not limited to the embodiments described herein. Furthermore, in describing preferred embodiments of the present invention in detail, specific descriptions of related known functions or configurations are omitted if it is determined that such detailed descriptions would unnecessarily obscure the essence of the present invention. Additionally, the same reference numerals are used throughout the drawings for parts having similar functions and operations. The term 'comprising' a component means that, unless specifically stated otherwise, it does not exclude other components but rather allows for the inclusion of additional components. Specifically, terms such as "comprising" or "having" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof. Singu