KR-20260063867-A - EDGE EXPOSURE MODULE AND APPARATUS
Abstract
The present disclosure relates to a line-type peripheral exposure module and a stationary peripheral exposure device for exposing a non-patterned area of a substrate, which is a non-patterned area of a display. The line-type peripheral exposure module and stationary peripheral exposure device according to the present disclosure may include an ultraviolet generating unit, a lens unit, a light guide unit, a housing, and a cover. In embodiments of the present disclosure, the ultraviolet generating unit may be configured with a plurality of UV LEDs arranged in a row, the lens unit may be configured with a plurality of aspherical lenses arranged in a row, and the light guide unit may be configured with a plurality of light pipes arranged in a row. The ultraviolet generating unit, the lens unit, and the light guide unit are housed in a housing through an opening in the housing, and an ultraviolet passage slit of a predetermined size may be formed in a cover mounted in the opening of the housing.
Inventors
- 이승훈
Assignees
- 이승훈
Dates
- Publication Date
- 20260507
- Application Date
- 20241031
Claims (5)
- A peripheral exposure module that exposes the periphery of a substrate, which is a non-patterned area of a display, A UV generating unit in which a plurality of UV LEDs are arranged in a row; A lens portion into which ultraviolet rays are incident from the above-mentioned ultraviolet emitting portion; A light guide section in which ultraviolet rays emitted from the above lens section are guided by internal total reflection; A housing in which the above-mentioned ultraviolet generating part, the above-mentioned lens part, and the above-mentioned light guide part are received through an opening; and A cover coupled to the opening of the above housing and having a UV-passing slit formed therein; A line-type peripheral exposure module including
- In claim 1, The above lens portion is configured such that a plurality of aspherical lenses are arranged in a row, and The above light guide unit is configured with a plurality of light pipes arranged in a line, and The above-mentioned ultraviolet passing slit is a line-type peripheral exposure module in which the slit length is greater than or equal to the length of the periphery of the substrate.
- A peripheral exposure device for exposing the periphery of a substrate, which is a non-patterned area of a display, It includes a line-type peripheral exposure module, a stage on which a substrate is loaded/unloaded, and a control unit that controls the operation of the line-type peripheral exposure module and the stage. The above-mentioned line-type peripheral exposure module is A UV generating unit in which a plurality of UV LEDs are arranged in a row; A lens portion into which ultraviolet rays are incident from the above-mentioned ultraviolet emitting portion; A light guide section in which ultraviolet rays emitted from the above lens section are guided by internal total reflection; A housing in which the above-mentioned ultraviolet generating part, the above-mentioned lens part, and the above-mentioned light guide part are received through an opening; and It includes a cover coupled to the opening of the above-mentioned housing and having a UV-passing slit formed therein, A stationary peripheral exposure device in which the movement of the line-type peripheral exposure module and the substrate is stopped by the above-mentioned control unit and the ultraviolet generator is driven to perform peripheral exposure on the substrate.
- In claim 3, The above lens portion is configured such that a plurality of aspherical lenses are arranged in a row, and The above light guide unit is configured with a plurality of light pipes arranged in a line, and The above ultraviolet passing slit is a stationary peripheral exposure device in which the slit length is greater than or equal to the length of the periphery of the substrate.
- In claim 4, The above control unit is a stationary peripheral exposure device that selectively drives only the UV LED in the area corresponding to the length of the periphery of the substrate.
Description
Edge Exposure Module and Edge Exposure Apparatus The present disclosure relates to a peripheral exposure module and a peripheral exposure device for exposing a non-patterned area of a display substrate. The present disclosure was completed with support for the following problem. As background technology to the present disclosure, a surface-type scanning peripheral exposure device is known that progressively exposes a non-patterned area ("periphery") of a display manufacturing substrate ("substrate") or a surface-type peripheral exposure module while moving at a constant speed. According to conventional scanning-type peripheral exposure devices, peripheral exposure of the substrate is performed gradually while the substrate or peripheral exposure module moves, so there is a disadvantage in that the peripheral exposure width (referred to as "line width") cannot be maintained at a constant level and the line width spreads out. In addition, since the peripheral exposure module is a planar type, there is a limit to the miniaturization of the line width. Figure 1 is a work flowchart of the pattern process during the display manufacturing process. FIG. 2 is an exemplary diagram showing a 10.5th generation display manufacturing substrate that can be processed by a stationary peripheral exposure device of the present disclosure. FIG. 3a is a drawing showing an ultraviolet generating unit according to one embodiment of the present disclosure. FIG. 3b is a drawing showing a lens portion according to one embodiment of the present disclosure. FIG. 3c is a drawing showing a light guide part according to one embodiment of the present disclosure. FIG. 3d is a drawing showing a housing and a cover according to one embodiment of the present disclosure. FIG. 4 is a block diagram of a stationary peripheral exposure device according to the present disclosure. FIG. 4a shows a state in which a substrate is loaded on a stage of a stationary peripheral exposure device according to one embodiment of the present disclosure. FIG. 4b is a diagram showing a state in which a peripheral exposure module according to one embodiment of the present disclosure is moved to a position that exposes the peripheral portion on the short side of the substrate in the state of FIG. 4a. FIG. 4c is a diagram showing the stage rotated 90° to expose the periphery of the long side of the substrate after the periphery of the short side of the substrate has been exposed. FIG. 4d is a diagram showing a state in which a peripheral exposure module according to one embodiment of the present disclosure is moved to a position that exposes the peripheral portion on the long side of the substrate in the state of FIG. 4c. FIG. 4e is a drawing showing an unloading state in which a substrate that has completed peripheral exposure is removed from a peripheral exposure device according to one embodiment of the present disclosure. Hereinafter, embodiments of a line-type peripheral exposure module and a peripheral exposure device according to the present disclosure will be described in detail with reference to the attached drawings, but matters considered to correspond to known configurations and functions will be omitted from description as much as possible or will be limited to introduction. With respect to the components illustrated in the attached drawings, the same reference numerals will be assigned to identical components even if they appear in other drawings. In this specification, expressions such as "comprising," "having," and "consisting of" may include other parts or other components unless "only" is used in the preceding part. Terms such as "connection, combination, and connection" indicating the combination relationship between components may include not only cases where components are directly "connected, combined, or connected," but also cases where other components are interposed to be "connected, combined, or connected." In cases where the temporal sequence is described by expressions such as “after, following, next, before,” discontinuous cases may be included unless terms such as “immediately” or “directly” are used together. Also, even if a component is expressed in the singular, that component may be plural. Furthermore, where numerical values of components or corresponding information (e.g., levels, etc.) are mentioned, even without explicit description, such numerical values or corresponding information may be interpreted as including errors caused by various factors (e.g., process factors, internal or external shocks, noise, etc.). FIG. 1 illustrates a patterning process among the manufacturing processes of displays such as LCDs and OLEDs, and includes a photoresist coating process, a peripheral exposure process, and an exposure process. In addition, the patterning process includes a developing process, an etching process, and a photoresist removal process, and may include an oxidation process which is a process prior to the photoresist coating proc