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KR-20260063903-A - SUBSTRATE PROCESSING APPARATUS

KR20260063903AKR 20260063903 AKR20260063903 AKR 20260063903AKR-20260063903-A

Abstract

The present invention provides a device for processing a substrate. The device for processing a substrate includes a processing space for processing the substrate, a bowl for recovering a processing liquid supplied to the substrate, a support unit provided in the processing space for supporting and rotating the substrate, a nozzle for supplying a processing liquid onto the substrate, a lifting unit for raising and lowering the bowl, a measuring unit for measuring the horizontal level of the bowl, and a controller for controlling the optical sensor and the lifting unit. The measuring unit may include a reflector provided on the outside of the bowl spaced apart from the bowl, and an optical sensor installed on the bowl that emits light in a direction toward the reflector and measures the amount of light reflected from the reflector.

Inventors

  • 김성필

Assignees

  • 세메스 주식회사

Dates

Publication Date
20260507
Application Date
20241031

Claims (10)

  1. In a device for processing substrates, A bowl that provides a processing space for processing the above substrate and recovers the processing liquid supplied to the above substrate; A support unit provided in the processing space to support and rotate the substrate; A nozzle for supplying a processing liquid onto the above substrate; A lifting unit for raising and lowering the above-mentioned Paul; A measuring unit for measuring the horizontal level of the above-mentioned Paul; and It includes a controller that controls the lifting unit and the measuring unit, The above measuring unit is, A reflector provided on the outer side of the above-mentioned bowl, spaced apart from the above-mentioned bowl; and A substrate processing device comprising an optical sensor installed in the above-mentioned bowl, emitting light in a direction toward the above-mentioned reflector, and measuring the amount of light reflected from the above-mentioned reflector.
  2. In paragraph 1, The above Paul is provided in multiple quantities, One of the above Pauls is positioned to surround another Paul, and The above optical sensor is provided to measure the horizontal of the outermost bowl, which is positioned at the outermost of the bowls and whose top is placed at the highest position.
  3. In paragraph 2, A substrate processing device having a first actuator connected to one side of the outermost bowl to raise and lower the outermost bowl, and a second actuator connected to the other side of the outermost bowl to raise and lower the outermost bowl.
  4. In paragraph 2, The upper part of the outermost bar mentioned above is movable between multiple positions of different heights, including a first position and a second position, and The above reflector is, A first reflector corresponding to the first position above; A substrate processing device including a second reflector corresponding to the second position above.
  5. In paragraph 4, A substrate processing device in which the horizontal distance between the optical sensor and the first reflector and the horizontal distance between the optical sensor and the second reflector are provided differently.
  6. In paragraph 4, The above controller is, A substrate processing device that determines a horizontal defect when the amount of light measured by the optical sensor at the first position or the second position is less than or equal to a set value.
  7. In paragraph 4, The upper part of the outermost Paul mentioned above can move to a third position in which multiple Pauls mentioned above are all lowered, and The above reflector is a substrate processing device including a third reflector corresponding to the third position.
  8. In Paragraph 7, The above controller is, A substrate processing device that determines a substrate support failure when the amount of light measured by the optical sensor at the third position is less than or equal to a set value.
  9. In a device for processing substrates, A processing space for processing the above substrate, recovering the processing liquid supplied to the above substrate, and a Paul including a first Paul, a second Paul, and a third Paul; A support unit provided in the processing space to support and rotate the substrate; A nozzle for supplying a processing liquid onto the above substrate; A lifting unit for raising and lowering the above-mentioned Paul; A measuring unit for measuring the horizontal level of the above-mentioned Paul; and It includes a controller that controls the lifting unit and the measuring unit, The above measuring unit is, A reflector provided on the outer side of the above-mentioned bowl, spaced apart from the above-mentioned bowl; and It includes an optical sensor installed in the above-mentioned bowl that emits light in a direction toward the reflector and measures the amount of light reflected from the reflector. The first Paul is positioned to surround the support unit, the second Paul is positioned to surround the first Paul, and the third Paul is positioned to surround the second Paul. The optical sensor is provided to measure the horizontal level of the third bowl, and The upper part of the above-mentioned third Paul is movable between the third position where all of the plurality of above-mentioned Pauls are lowered, the first position and the second position raised by the lifting unit, and The above reflector is, A first reflector corresponding to the first position above; A second reflector corresponding to the second position above; and It includes a third reflector corresponding to the third position above, and A substrate processing device in which the horizontal distance between the optical sensor and the first reflector and the horizontal distance between the optical sensor and the second reflector are provided differently.
  10. In Paragraph 9, The above controller is, When the amount of light measured by the optical sensor at the first position or the second position is less than or equal to a set value, it is determined to be a horizontal defect, and A substrate processing device that determines a substrate support failure when the amount of light measured by the optical sensor at the third position is less than or equal to a set value.

Description

Substrate Processing Apparatus The present invention relates to an apparatus for processing a substrate. To manufacture semiconductor devices, desired patterns are formed on a substrate through various processes such as photolithography, etching, ashing, ion implantation, and thin film deposition. Various processing solutions are used in each process, and contaminants and particles are generated during the process. To address this, cleaning processes to remove contaminants and particles are essential before and after each process. Generally, multiple processing solutions are used sequentially to treat a substrate in a cleaning process. Some of the processing solutions are recovered after substrate treatment and reused through a regeneration system, while others are discarded. Multiple bowls are provided to separate and recover or discard the multiple processing solutions. The multiple bowls are provided to surround a support unit that supports the substrate, and one of the multiple bowls is positioned to surround another bowl. FIG. 1 is a schematic diagram showing a general support unit and a processing vessel. Referring to FIG. 1, a substrate (W) is supported by a support unit (5300), and a processing vessel (5100) for recovering processing liquid surrounds the support unit (5300). The processing vessel (5100) includes a plurality of bowls (5110, 5130). The plurality of bowls are connected to each other so that when an inner bowl (5110) rises, the outer bowl (5130) also rises together, and if the horizontal of one bowl is misaligned, the horizontal of the other bowls is also misaligned. Each bowl (5110, 5130) is raised and lowered by two actuators. A first actuator (5111, 5131) is connected to one side of each bowl ((5110, 5130)), and a second actuator (5113, 5133) is connected to the other side. At this time, if the magnitude of the force applied to each actuator is different or the horizontal alignment of the bowls is misaligned, the horizontal alignment of the bowls becomes misaligned when the bowls are raised to form a recovery space, and as shown in FIG. 2, when the processing liquid is supplied to the substrate, the processing liquid is not recovered into the recovery space and there is a problem of scattering. Figure 1 is a schematic diagram showing a typical support unit and a processing vessel. Figure 2 is a diagram schematically showing a method of recovering the processing liquid through the processing container of Figure 1. FIG. 3 is a plan view schematically showing a substrate processing apparatus according to one embodiment of the present invention. FIG. 4 is a schematic diagram showing one embodiment of the liquid processing chamber of the substrate processing device of FIG. 3. FIG. 5 is a schematic diagram showing one embodiment of the processing vessel and measuring unit of FIG. 4. Figure 6 is a diagram schematically showing how the measuring unit operates when the substrate is normally supported by the support unit at the first position. Figure 7 is a diagram schematically showing how the measurement unit operates when the substrate is poorly supported at the first position. FIG. 8 is a schematic diagram showing how the measuring unit operates when the processing vessel is horizontal at the second position. FIG. 9 is a diagram schematically showing how the measuring unit operates when the horizontal alignment of the processing vessel is off at the second position. FIG. 10 is a diagram schematically showing how the measuring unit operates when the processing vessel is horizontal at the third position. FIG. 11 is a diagram schematically showing how the measuring unit operates when the horizontal alignment of the processing vessel is off at the third position. FIG. 12 is a diagram schematically showing how the measuring unit operates when the processing vessel is horizontal at the fourth position. FIG. 13 is a diagram schematically showing how the measuring unit operates when the horizontal alignment of the processing vessel is off at the fourth position. FIG. 14 is a schematic diagram showing another embodiment of the reflection unit of FIG. 4. Embodiments of the present invention are described below with reference to the attached drawings so that those skilled in the art can easily implement them. However, the present invention may be embodied in various different forms and is not limited to the embodiments described herein. Furthermore, in describing preferred embodiments of the present invention in detail, specific descriptions of related known functions or configurations are omitted if it is determined that such detailed descriptions would unnecessarily obscure the essence of the present invention. Additionally, the same reference numerals are used throughout the drawings for parts having similar functions and operations. The term 'comprising' a component means that, unless specifically stated otherwise, it does not exclude other components but rather allows for the inclusion of additi