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KR-20260063980-A - Apparatus and Method for Creating of Database for Plasma Simulation

KR20260063980AKR 20260063980 AKR20260063980 AKR 20260063980AKR-20260063980-A

Abstract

The present invention relates to an apparatus and method for generating a database for plasma simulation, comprising a memory including at least one instruction and at least one processor for executing at least one instruction stored in the memory, wherein the processor generates a customized database by extracting at least one first chemical species and at least one first chemical reaction related to a selected reaction species from a linked reference database, and, if necessary, adds at least one second chemical reaction and at least one second chemical species related to the first chemical species to the customized database, and may be applied to other embodiments.

Inventors

  • 권득철
  • 정상영
  • 장원석
  • 윤정식

Assignees

  • 한국핵융합에너지연구원

Dates

Publication Date
20260507
Application Date
20241031

Claims (15)

  1. Memory containing at least one instruction; and It includes at least one processor that executes at least one instruction stored in the memory, The above processor is, A database generation device characterized by generating a customized database by extracting at least one first chemical species and at least one first chemical reaction related to a selected reaction species from a linked reference database, and adding at least one second chemical reaction and at least one second chemical species related to the first chemical species to the customized database as needed.
  2. In paragraph 1, The above processor is, A database generation device characterized by measuring ionic species and neutral species related to the above-mentioned reactive species, extracting the measured ionic species and neutral species from the first database included in the above-mentioned reference database as the first chemical species, and generating a third database included in the above-mentioned customized database.
  3. In paragraph 2, The above processor is, A database generation device characterized by extracting the first chemical reaction related to the first chemical species from the second database included in the reference database and generating it into the fourth database included in the customized database.
  4. In paragraph 3, The above processor is, A database generation device characterized by adding the second chemical reaction, newly identified in relation to the first chemical species, to the fourth database.
  5. In paragraph 4, The above processor is, A database generation device characterized by adding the second chemical species to the third database when a new second chemical species is identified in the second chemical reaction.
  6. In paragraph 5, The above processor is, A database generation device characterized by performing a simulation by selecting at least one reaction coefficient from the above-mentioned fourth database.
  7. In paragraph 6, The above processor is, A database generation device characterized by verifying experimental results in a plasma chamber based on at least one selected reaction coefficient.
  8. In Paragraph 7, The above processor is, A database generation device characterized by completing the optimization of the customized database by controlling the reaction coefficient so that the error value calculated by comparing the result of the simulation and the result according to the experimental result becomes smaller than a threshold value.
  9. Step of the electronic device setting the reaction species; The electronic device extracts at least one first chemical species and at least one first chemical reaction related to the reaction species from a linked reference database to create a customized database; and The step of adding at least one second chemical reaction and at least one second chemical species related to the first chemical species to the customized database as needed by the electronic device; A method for creating a database characterized by including
  10. In Paragraph 9, After the step of setting the above reaction species, A step in which the electronic device measures ionic species and neutral species associated with the reactive species; A method for creating a database characterized by further including
  11. In Paragraph 10, The step of creating the above customized database is, A step of extracting the measured ionic species and neutral species into the first chemical species from the first database included in the reference database; and A step of generating a third database included in the customized database using the first chemical species; A method for creating a database characterized by including
  12. In Paragraph 11, The step of creating the above customized database is, A step of extracting the first chemical reaction related to the first chemical species from the second database included in the reference database; and A step of generating a fourth database included in the customized database through the first chemical reaction; A method for creating a database characterized by including
  13. In Paragraph 12, The step of adding to the above customized database is, A step of confirming the second chemical reaction newly identified in relation to the first chemical species; and The step of adding the above second chemical reaction to the above fourth database; A method for creating a database characterized by including
  14. In Paragraph 13, The step of adding to the above customized database is, A step of identifying a new second chemical species in the second chemical reaction; and The step of adding the above second chemical species to the above third database; A method for creating a database characterized by including
  15. In Paragraph 14, After the step of adding to the customized database above, The electronic device performs a simulation by selecting at least one reaction coefficient from the fourth database; The electronic device confirms the experimental results in the plasma chamber based on the selected at least one reaction coefficient; and A step of completing the optimization of the customized database by controlling the reaction coefficient such that the error value calculated by comparing the result of the simulation with the result of the experiment results becomes smaller than a threshold value; A method for creating a database characterized by further including

Description

Apparatus and Method for Creating of Database for Plasma Simulation The present invention relates to an apparatus and method for generating a database for plasma simulation. Semiconductor processes utilizing plasma include dry etching and chemical vapor deposition. In these processes, a semiconductor substrate is placed inside a plasma chamber capable of generating plasma, and the interior of the chamber is set to specific reaction conditions before plasma is generated to carry out the etching and chemical vapor deposition processes. The plasma state changes depending on these plasma process conditions or plasma generation conditions, such as a mass flow controller, a radio frequency source, or bias power, and consequently, the deposition or etching characteristics vary. Therefore, it is important to find suitable plasma process conditions to obtain deposition or etching characteristics suitable for semiconductor processes. However, since plasma equipment and semiconductor processes are very expensive, plasma researchers, universities, research institutes, and semiconductor equipment manufacturers generally perform plasma simulations using plasma simulators, which are programs that mimic plasma chambers. Through this, they identify plasma process conditions capable of obtaining suitable plasma conditions and apply them to actual processes or experiments to save costs and time. To perform simulations using such plasma simulators, reaction coefficients for the physicochemical reactions occurring within the plasma chamber are required. However, since the physical data that can be generated through the measurement or calculation of reaction coefficients is currently limited, databases are being developed using a method that assumes possible reactions, predicts reaction coefficients for those hypotheses, and then optimizes the coefficients by comparing simulation and experimental results. During this database development process, problems arise such as excessive time and effort required for data collection, organization, and optimization, as well as reduced accuracy due to human error. Therefore, there is a growing need for the development of technology capable of automatically generating plasma databases in conjunction with plasma chambers. FIG. 1 is a schematic diagram showing a system for generating a database according to an embodiment of the present invention. FIG. 2 is a flowchart illustrating a method for creating a database according to an embodiment of the present invention. FIG. 3 is a detailed flowchart for specifically explaining a method for creating a database according to an embodiment of the present invention. FIG. 4 is a detailed flowchart for specifically explaining a method for optimizing a database according to an embodiment of the present invention. FIG. 5 is an exemplary diagram showing a first DB according to an embodiment of the present invention. FIG. 6 is an exemplary diagram showing a second DB according to an embodiment of the present invention. FIG. 7 is an exemplary diagram showing the first generated third DB according to an embodiment of the present invention. FIG. 8 is an exemplary diagram showing the first generated fourth DB according to an embodiment of the present invention. FIG. 9 is an exemplary diagram showing an updated third DB according to an embodiment of the present invention. FIG. 10 is an exemplary diagram showing an updated fourth DB according to an embodiment of the present invention. FIG. 11 is an exemplary diagram showing a part of an optimized fourth DB according to an embodiment of the present invention. FIG. 12 is an example diagram showing a graph comparing simulation and experimental results for optimizing the fourth DB according to an embodiment of the present invention. Hereinafter, preferred embodiments according to the present invention will be described in detail with reference to the accompanying drawings. The detailed description disclosed below, together with the accompanying drawings, is intended to describe exemplary embodiments of the present invention and is not intended to represent the only embodiment in which the present invention can be practiced. In order to clearly explain the present invention in the drawings, parts unrelated to the description may be omitted, and the same reference numerals may be used for identical or similar components throughout the specification. FIG. 1 is a schematic diagram showing a system for generating a database according to an embodiment of the present invention. Referring to FIG. 1, the system (10) according to the present invention may include a reference DB (100) and an electronic device (200). The reference DB (100) may include a first DB (110) and a second DB (120). The first DB (110) and the second DB (120) are databases provided on a server, etc., located outside the electronic device (200), and are accessible to the electronic device (200). To this end, the server equipped with the reference DB (100) c