KR-20260064025-A - INSULATING GLASS FOR CONSTRUCTION EQUIPPED WITH FREQUNCY SELECTIVITY

KR20260064025AKR 20260064025 AKR20260064025 AKR 20260064025AKR-20260064025-A

Abstract

An insulating glass for architecture having frequency selectivity is provided. The insulating glass comprises: a first glass layer; and an insulating metal thin film layer disposed on one surface of the first glass layer. Herein, the insulating metal thin film layer comprises a plurality of unit cells arranged within the plane of the insulating metal thin film layer, and at least some of the unit cells comprise a grid pattern including a plurality of longitudinal slits and a plurality of transverse slits; an inner square slit disposed at the center of the grid pattern; and an outer square slit disposed around the inner square slit and spaced apart from the inner square slit.

Inventors

홍원빈
박승덕
조성대
박상진
김경민
복진비
김민경

Assignees

주식회사 케이씨씨글라스
포항공과대학교 산학협력단

Dates

Publication Date: 20260507
Application Date: 20241031

Claims (10)

As an architectural insulating glass having frequency selectivity, First glass layer; and A thermal insulating metal thin film layer disposed on one surface of the first glass layer; comprising, The above insulating metal thin film layer comprises a plurality of unit cells arranged within the plane of the insulating metal thin film layer, and at least some of the unit cells are A grid pattern including a plurality of longitudinal slits and a plurality of transverse slits; An inner square slit positioned at the center of the above grid pattern; and An outer square slit surrounding the inner square slit and spaced apart from the inner square slit; comprising Architectural insulating glass with frequency selectivity.
In Article 1, The above plurality of longitudinal slits are, A longitudinal center slit located at the transverse center of the above unit cell; A first longitudinal additional slit spaced apart in a first transverse direction of the above longitudinal center slit; A second longitudinal additional slit spaced apart in the second transverse direction of the above longitudinal central slit; A first longitudinal outer slit spaced apart in a first transverse direction of the first longitudinal additional slit; and A second longitudinal outer slit spaced apart in the second transverse direction of the second longitudinal additional slit; comprising Architectural insulating glass with frequency selectivity.
In Article 2, The above plurality of transverse slits are, A transverse center slit located at the longitudinal center of the above unit cell; A first transverse additional slit spaced apart in the first longitudinal direction of the above transverse central slit; A second transverse additional slit spaced apart in the second longitudinal direction of the above transverse central slit; A first transverse outer slit spaced apart in the first longitudinal direction of the first transverse additional slit; and A second transverse outer slit spaced apart in the second longitudinal direction of the second transverse additional slit; comprising Architectural insulating glass with frequency selectivity.
In Paragraph 3, The above-mentioned first longitudinal outer slit, second longitudinal outer slit, first transverse outer slit, and second transverse outer slit are, A double slit having a predetermined spacing, Architectural insulating glass with frequency selectivity.
In Paragraph 3, Each of the above longitudinal center slit and transverse center slit is, The central part of the above unit cell is provided with a short section having a predetermined length, divided into two partial slits, Architectural insulating glass with frequency selectivity.
In Article 5, The inner square slit above is, It is formed to be in contact with the end portion in the direction of the short section of the above-mentioned longitudinal center slit and transverse center slit, and The above outer square slit is, A portion formed in the inner region of the rectangle formed by the first longitudinal additional slit, the second longitudinal additional slit, the first transverse additional slit, and the second transverse additional slit. Architectural insulating glass with frequency selectivity.
In Article 4, The above grid pattern is, A plurality of grid patches are formed based on the plurality of longitudinal slits and a plurality of transverse slits, and At least some of the aforementioned plurality of grid patches have different sizes, Architectural insulating glass with frequency selectivity.
In Article 4, The transverse length of the outermost grid patch formed in the first transverse direction of the first longitudinal outer slit is four times the spacing between the double slits of the first longitudinal outer slit, and The transverse length of the grid patch formed between the first longitudinal outer slit and the first longitudinal additional slit is six times the spacing between the double slits of the first longitudinal outer slit, and The transverse length of the above unit cell is 40 times the spacing between the double slits of the first longitudinal outer slit, Architectural insulating glass with frequency selectivity.
In Article 4, The length of one side of the inner square slit above is, The spacing between the double slits of the first longitudinal outer slit is twice the spacing between the double slits, and The length of one side of the above outer square slit is, Four times the spacing between the double slits of the first longitudinal outer slit, Architectural insulating glass with frequency selectivity.
In Article 1, The above unit cell is square and has a side length of 1 mm, and The line width of the plurality of longitudinal slits and the plurality of transverse slits is 10 μm, and The line width of the inner square slit above is 10 μm, and The line width of the outer square slit above is 20 μm, and The thickness of the above insulating metal thin film layer is 10 to 40 μm, Architectural insulating glass with frequency selectivity.

Description

Insulating glass for construction equipped with frequency selectivity The present invention relates to insulating glass for construction, and more specifically, to insulating glass for construction having frequency selectivity. In modern commercial and residential construction, Low-E (Low-emissivity) glass is widely used for energy saving purposes. Low-E glass is a glass surface coated with an ultra-thin metal layer to reduce heat loss; because it enhances indoor temperature maintenance and energy saving effects, it is particularly widely used as a window or building exterior material. In this regard, Fig. 1 is a conceptual diagram of Low-E glass. As shown in Fig. 1, Low-E glass can prevent indoor heating from escaping to the outside by reflecting solar rays from the outside or allowing visible light to pass through, while ensuring visibility by providing a Low-E coating on at least one surface of the glass window. In other words, the core technology of Low-E glass lies in reducing the loss of indoor heat to the outside through a heat-reflecting metal coating, and generally, such a coating can be composed of silver (Ag) or a metal oxide layer. The low-E coating layer reflects infrared wavelengths from the sun, preventing heat from entering the room in the summer and preventing heat from escaping the room in the winter. However, while the introduction of a metal thin film layer in low-e glass offers excellent thermal insulation, it has the disadvantage of interfering with the transmission and reception of radio waves, which are a core element of modern information and communication technology. As illustrated in Fig. 1, the low-e coating can interfere with the transmission of signals from a base station to an indoor wireless terminal, and conversely, it can interfere with the transmission of signals from an indoor wireless terminal to a base station. This may be attributed to the fact that the low-e coating layer also reflects wireless signals. To address these issues, removing a portion of the metal thin film layer of insulating glass could be considered; however, since the removal of this layer results in a degradation of thermal insulation performance, it was difficult to simultaneously satisfy both radio wave transmittance and thermal insulation performance. Furthermore, modern wireless communication systems operate in a wide variety of ways, and the frequency bands used by each system are widely distributed; consequently, it is not easy to guarantee radio wave transmittance across various frequencies, and there may even be situations where security is required by shielding radio waves for specific frequency bands. Figure 1 is a conceptual diagram of Low-E glass. Figure 2 shows an exemplary double-layer structure of Low-E glass. Figure 3 shows the S-parameter measurement results according to single Low-E glass. Figure 4 shows the S-parameter measurement results according to double low-e glass. FIG. 5 shows an exemplary structure of an insulating glass for construction having frequency selectivity according to one embodiment of the present invention. Figure 6 shows the arrangement of unit cells within the plane of the insulating metal thin film layer of Figure 5. FIG. 7 illustrates a grid pattern of a unit cell according to one embodiment of the present invention. Figure 8 shows the S-parameter measurement results according to the pattern of Figure 7. FIG. 9 illustrates a grid-circular slit pattern of a unit cell according to one embodiment of the present invention. Figure 10 shows the results of S-parameter measurements in a broadband frequency range according to the pattern of Figure 9. Figure 11 shows the results of S-parameter measurements in the partial frequency range according to the pattern of Figure 9. FIG. 12 illustrates a grid-double circular slit pattern of a unit cell according to one embodiment of the present invention. Figure 13 shows the results of S-parameter measurements in a broadband frequency range according to the pattern of Figure 12. Figure 14 shows the results of S-parameter measurements in the partial frequency range according to the pattern of Figure 12. FIG. 15 illustrates a grid-double square slit pattern of a unit cell according to one embodiment of the present invention. Figure 16 shows the results of S-parameter measurements in a broadband frequency range according to the pattern of Figure 15. Figure 17 shows the results of S-parameter measurements in the partial frequency range according to the pattern of Figure 15. FIG. 18 illustrates a grid-cross circular slit pattern of a unit cell according to one embodiment of the present invention. Figure 19 shows the results of S-parameter measurements in the partial frequency range according to the pattern of Figure 18. FIG. 20 illustrates a double square-cross slit pattern of a unit cell according to one embodiment of the present invention. Figure 21 shows the results of S-parameter measurements in the partial frequency range accor