KR-20260064618-A - RIM VENTED SUSCEPTOR

Abstract

A susceptor defining axial, radial, and circumferential directions is provided. The susceptor includes a support surface for a substrate. The susceptor further includes a rim extending around the periphery of the support surface. The rim defines a plurality of pockets spaced apart from each other along the circumferential direction. The rim further defines one or more vents in each individual pocket of the plurality of pockets.

Inventors

• 뉴먼, 존
• 천, 후이
• 롼, 신닝
• 본햄, 숀 조셉

Assignees

• 어플라이드 머티어리얼스, 인코포레이티드

Dates

Publication Date

20260507

Application Date

20251030

Priority Date

20241031

Claims (20)

1. As a susceptor defining a coordinate system including axial, radial, and circumferential directions, Support surface for the substrate; and A rim extending around the periphery of the above-mentioned support surface A susceptor comprising, wherein the rim defines a plurality of pockets spaced apart from each other along the circumferential direction, and the rim additionally defines one or more ventilation holes in each individual pocket of the plurality of pockets.
2. In paragraph 1, the one or more ventilation holes include a plurality of ventilation holes, and one or more of the plurality of ventilation holes are: A first opening defined on the first surface of the rim; A second opening defined on the second surface of the rim perpendicular to the first surface; and A gas channel extending from the first opening to the second opening A susceptor including
3. In paragraph 2, the gas channel is: A first portion extending at an angle with respect to the radial direction from the first opening; and A second part extending from the first part — the second part is parallel to the radial direction — A susceptor including
4. In paragraph 2, The above gas channel includes a first gas channel; The above one or more ventilation holes are: A third opening defined on the first surface — the third opening is spaced from the first opening along the radial direction such that the third opening is closer to the periphery of the rim than the first opening —; and A second gas channel extending along the axial direction from the third opening of the first surface to the first gas channel. A susceptor that further includes
5. In paragraph 2, the second opening is a susceptor defined in the peripheral portion of the susceptor.
6. A susceptor according to claim 1, wherein each individual pocket of the plurality of pockets is defined between the upper surface of the rim and the lower surface of the rim spaced apart from the upper surface along the axial direction.
7. A susceptor according to claim 6, wherein the lower surface of the rim comprises a first portion, a second portion, and a third portion extending along the axial direction from the first portion to the second portion.
8. In claim 6, the susceptor, wherein the one or more vents comprise a single vent defined by the peripheral surface of the rim.
9. A susceptor according to claim 8, further comprising a plurality of ribs extending along the axial direction from the upper surface to the lower surface to divide the single vent into a plurality of vents.
10. As a processing chamber, A chamber body fluidly communicating with one or more gas sources; and A substrate support assembly including a susceptor defining a coordinate system including axial, radial, and circumferential directions Includes, and the susceptor: Support surface for the substrate; and A rim extending around the periphery of the above-mentioned support surface A processing chamber comprising, wherein the rim defines a plurality of pockets spaced apart from each other along the circumferential direction, and the rim further defines one or more ventilation holes in each individual pocket of the plurality of pockets.
11. In paragraph 10, the above one or more ventilation holes include a plurality of ventilation holes, and one or more of the plurality of ventilation holes are: A first opening defined on the first surface of the rim; A second opening defined on the second surface of the rim perpendicular to the first surface; and A gas channel extending from the first opening to the second opening A processing chamber including
12. In Clause 11, the above gas channel is: A first portion extending at an angle with respect to the radial direction from the first opening; and A second part extending from the first part — the second part is parallel to the radial direction — A processing chamber including
13. In Paragraph 12, The above gas channel includes a first gas channel; The above one or more ventilation holes are: A third opening defined on the first surface — the third opening is spaced from the first opening along the radial direction such that the third opening is closer to the periphery of the rim than the first opening —; and A second gas channel extending along the axial direction from the third opening of the first surface to the first gas channel. A processing chamber further comprising
14. In paragraph 12, the second opening is a processing chamber defined in the periphery of the susceptor.
15. In claim 11, each individual pocket of the plurality of pockets is a processing chamber defined between the upper surface of the rim and the lower surface of the rim spaced apart from the upper surface along the axial direction.
16. In claim 15, the lower surface of the rim comprises a first part, a second part, and a third part extending along the axial direction from the first part to the second part, in a processing chamber.
17. In paragraph 16, the processing chamber, wherein the one or more vents comprise a single vent defined by the peripheral surface of the rim.
18. In Paragraph 17, A processing chamber further comprising a plurality of ribs extending along the axial direction from the upper surface to the lower surface to divide the single vent into a plurality of vents.
19. A processing chamber according to claim 16, wherein the third portion of the lower surface extends at an angle with respect to the axial direction, and the angle is in the range of 10 to 90 degrees.
20. As a processing system, It includes a processing chamber, and the processing chamber is: A chamber body fluidly communicating with one or more gas sources; A substrate support assembly including a susceptor defining a coordinate system including axial, radial, and circumferential directions Includes, and the susceptor: Support surface for the substrate; and A rim extending around the periphery of the above-mentioned support surface A processing system comprising, wherein the rim defines a plurality of pockets spaced apart from each other along the circumferential direction, and the rim additionally defines one or more ventilation holes in each individual pocket of the plurality of pockets.

Description

Rim Vented Susceptor Cross-reference regarding related applications This application claims the benefit of U.S. Patent Application No. 18/932,875, titled “Rim Vented Susceptor,” filed on October 31, 2024, the contents of which are incorporated in whole into this application. field The examples described in this application generally relate to susceptors used in epitaxy deposition processes, and more specifically, to a susceptor having a support surface for a substrate (e.g., substrate) and a rim (e.g., protruding relative to the support surface) that extends around the periphery of the support surface and defines a plurality of pores to improve the uniformity of the silicon growth rate on the substrate. Vapor deposition processes are used in conjunction with other processes to epitaxially deposit a thin layer (typically less than 10 microns) on a substrate in semiconductor substrate processing. During the deposition process, the substrate is placed on the support surface of a susceptor, and a film (e.g., an epitaxial film) is deposited on the substrate. However, the film is not deposited on the substrate at a uniform rate in all directions, and consequently, the thickness of the film deposited on the substrate is non-uniform. Therefore, devices that enable uniform film deposition are required. In one embodiment, a susceptor is provided. The susceptor defines a coordinate system including axial, radial, and circumferential directions. The susceptor includes a support surface for a substrate; and a rim extending around the periphery of the support surface, wherein the rim defines a plurality of pockets spaced apart from each other along the circumferential direction, and the rim further defines one or more vents in each individual pocket of the plurality of pockets. In another embodiment, a processing chamber is provided. The processing chamber comprises a chamber body in fluid communication with one or more gas sources. The processing chamber further comprises a substrate support assembly comprising a susceptor that defines a coordinate system including axial, radial, and circumferential directions. The susceptor comprises a support surface for the substrate; and a rim extending around the periphery of the support surface, wherein the rim defines a plurality of pockets spaced apart from each other along the circumferential direction, and the rim further defines one or more vents in each individual pocket of the plurality of pockets. In another embodiment, a processing system is provided. The processing system comprises a processing chamber comprising a chamber body in fluid communication with one or more gas sources. The processing chamber further comprises a substrate support assembly comprising a susceptor that defines a coordinate system including axial, radial, and circumferential directions. The susceptor comprises a support surface for the substrate; and a rim extending around the periphery of the support surface, wherein the rim defines a plurality of pockets spaced apart from each other along the circumferential direction, and the rim further defines one or more vents in each individual pocket of the plurality of pockets. In a manner that allows the features described above of the disclosure to be understood in detail, a more specific description, briefly summarized above, may be made with reference to examples, some of which are illustrated in the accompanying drawings. However, it should be noted that the accompanying drawings are merely illustrative of some examples and therefore should not be construed as limiting the scope of the disclosure so as to allow for other equally effective examples. FIG. 1 is a schematic plan view of an exemplary multi-chamber processing system according to some embodiments of the present disclosure. FIG. 2 is a cross-sectional view of a heat treatment chamber that can be used to perform epitaxial growth according to some embodiments of the present disclosure. FIG. 3 is a plan view of a susceptor having a substrate placed on a supporting surface of the susceptor according to some embodiments of the present disclosure. FIG. 4a is a top perspective view of a susceptor according to some embodiments of the present disclosure. FIG. 4b is a plan view of a susceptor according to some embodiments of the present disclosure. FIG. 4c is an enlarged view of a part of the susceptor shown in FIG. 4a according to some embodiments of the present disclosure. FIG. 4d is an enlarged view of a portion of the susceptor shown in FIG. 4b according to some embodiments of the present disclosure. FIG. 4e is a cross-sectional view of the pocket of the susceptor of FIG. 4a according to some embodiments of the present disclosure. FIG. 4f is an enlarged view of a portion of the pocket of the susceptor of FIG. 4e according to some embodiments of the present disclosure. FIG. 5a is a top perspective view of a susceptor according to some embodiments of the present disclosure. FIG. 5b is a plan view of