KR-20260064922-A - Improved plating method for materials that are difficult to remove

KR20260064922AKR 20260064922 AKR20260064922 AKR 20260064922AKR-20260064922-A

Abstract

The present invention provides a plating method with improved processing for materials that are difficult to dehydrate, comprising: an immersion degreasing step for removing contaminants remaining on the surface of the material; an acid treatment and acid electrolytic degreasing step for immersing the material from which contaminants have been removed in an acidic aqueous solution to clean the surface and remove oxides and foreign substances present on the surface, and acid electrolytic degreasing the acid-treated material; an electroplating step for immersing the acid electrolytic degreasing material in a plating solution and then plating the surface of the material using electricity; and a dehydration and drying step for introducing the plated material into a dehydrator and then selecting centrifugal dehydration or tilting dehydration to dehydrate and dry the material. By doing so, the invention has the effect of obtaining a material of excellent quality by improving the problem of deterioration in appearance quality, such as liquid pooling or liquid flow stains, through efficient dehydration during the dehydration and drying process, which is a post-treatment process after plating the material.

Inventors

김상길
이오선

Assignees

동아플레이팅 주식회사

Dates

Publication Date: 20260508
Application Date: 20241030

Claims (2)

Immersion degreasing step to remove contaminants remaining on the surface of the material; An acid treatment and acid degreasing step of immersing the above material from which contaminants have been removed in an aqueous acid solution to clean the surface and remove oxides and foreign substances present on the surface, and acid degreasing the above acid-treated material; An electroplating step of immersing the above-mentioned material, which has been dehydrated by acid, in a plating solution and then plating the surface of the above-mentioned material using electricity; and A plating method with an improved process for materials that are difficult to dehydrate, characterized by including a dehydration and drying step in which the plated material is introduced into a dehydrator, and then dehydrates and dries the material by selecting centrifugal dehydration or tilting dehydration.
In Article 1, The above dehydration and drying steps are, Centrifugal dehydration is performed when the inclination of the above dehydrator is 0°, and A plating method with improved processing for materials that are difficult to dehydrate, characterized by tilting dehydration being performed with the tilt of the dehydrator being 10 to 40°.

Description

Improved plating method for materials that are difficult to remove The present invention relates to a plating method with an improved process for materials that are difficult to remove liquid from, and more specifically, to a plating method with an improved process for materials that are difficult to remove liquid from, which can improve the problem of deterioration in appearance quality, such as liquid pooling or liquid flow stains, by efficiently removing liquid during the dehydration and drying process, which is a post-treatment process after plating the material. Generally, plating is a process of treating the surface of a material without altering its properties to achieve characteristics such as improved durability, added functionality, and enhanced aesthetics. There are various methods, including electroplating performed electrochemically, chemical plating performed chemically, electroless plating, hot-dip plating where a metal film is deposited by immersing the metal in a molten state, vacuum plating where the metal is melted in a vacuum chamber to form mist-like granules that are then applied to the surface, and barrel plating where the product is placed in a barrel, rotated, and plated through electrodes. In particular, barrel plating involves placing a material to be surface-treated into a process fixture called a barrel, and then immersing it in wet tanks for pretreatment and plating. When the material is immersed in these wet tanks and undergoes pretreatment (consisting of immersion degreasing, acid treatment, and electrolytic degreasing), plating, and post-treatment processes, there is a possibility that solution may remain on the material as it moves through each process. In particular, during the dehydration and drying processes in post-processing, current dehydration and drying equipment relies solely on centrifugal force for dehydration. Consequently, despite high rotational speeds, liquid pooling occurs depending on the shape of the material, affecting material quality. Furthermore, incomplete dehydration increases the drying time of the material, leading to higher production costs such as increased energy expenses. Therefore, there is a need for a method to efficiently remove the liquid to reduce production costs and protect the environment. FIG. 1 is a flowchart of a plating method with improved process for materials that are difficult to dehydrate according to an embodiment of the present invention. Hereinafter, the technical concept of the present invention will be explained in more detail using the attached drawings. The attached drawings are merely examples illustrated to explain the technical concept of the present invention in more detail, and therefore the technical concept of the present invention is not limited to the form of the attached drawings. FIG. 1 is a flowchart of a plating method with improved process for materials that are difficult to dehydrate according to an embodiment of the present invention. A plating method with improved process for materials that are difficult to dehydrate according to an embodiment of the present invention includes, as shown in FIG. 1, an immersion degreasing step (S100), an acid treatment and acid electrolytic degreasing step (S200), an electroplating step (S300), and a dehydration and drying step (S400). First, the immersion degreasing step (S100) refers to a step of removing contaminants remaining on the surface of the material. Since the presence of surface contaminants on materials subject to plating prevents uniform plating, a process to remove residual contaminants is performed before plating. Specifically, the material is placed in a tank containing a degreasing solution, and contaminants attached to the surface are removed through chemical and physical actions. After being degreased in this manner, the surface of the material may be additionally washed with water to completely remove the degreasing solution. The acid treatment and acid degreasing step (S200) refers to a step of immersing a material from which contaminants have been removed in an acidic aqueous solution to clean the surface, thereby removing oxides and foreign substances present on the surface of the material, and acid degreasing the acid-treated material. Although contaminants remaining on the surface of the material can be removed through the immersion degreasing step (S100), oxidized substances or foreign substances that were not removed through the immersion degreasing step (S100) may occasionally remain on the surface of the material. To remove these, the material from which contaminants have been removed is immersed in an acidic aqueous solution to clean the surface, thereby undergoing a process to further remove oxides and foreign substances present on the surface of the material. The material, from which oxides and impurities have been removed through acid treatment, undergoes an electrolytic degreasing process. This refers to a process of degreasing that use