KR-20260065518-A - CONTROL METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Abstract

A control method for controlling the lighting of a first LED and a second LED, comprising an acquisition process for acquiring the illuminance of each of the first LED and the second LED, and a determination process for determining a current value to be flowed through the first LED and the second LED based on the measurement result of the acquisition process, wherein the determination process determines the current value flowing through the LED with the lower illuminance among the first LED and the second LED to be smaller than the current value flowing through the other LED.

Inventors

• 우스이 가츠토시

Assignees

• 캐논 가부시끼가이샤

Dates

Publication Date

20260508

Application Date

20251021

Priority Date

20241101

Claims (10)

1. A control method for controlling the lighting of a first LED and a second LED, and An acquisition process for acquiring the illuminance of each of the first LED and the second LED, and A determination process for determining the current value to be flowed to the first LED and the second LED based on the result of the above acquisition process Including, The above determination process determines that the current value flowing to the LED with lower illuminance among the first LED and the second LED becomes smaller than the current value flowing to the other LED. A control method characterized by the following.
2. In paragraph 1, A control method characterized by executing the above acquisition process and the above determination process multiple times.
3. In paragraph 1, A control method characterized by further including a reference acquisition process for acquiring the illuminance of each of the first LED and the second LED before the above acquisition process.
4. In paragraph 3, The method further has a calculation process for calculating illuminance degradation information of each of the first LED and the second LED based on the measurement results of the above-mentioned reference acquisition process and the measurement results of the above-mentioned acquisition process, and A control method characterized by the above determination process determining a current value to be flowed to the first LED and the second LED based on the above illuminance degradation information.
5. In paragraph 4, A control method characterized by the above determination process determining the current value flowing to the LED with a higher illuminance degradation rate among the first LED and the second LED to be smaller than the current value flowing to the other LED.
6. In paragraph 3, A control method characterized by further having a lighting process that performs lighting of the first LED and the second LED at the timing between the above reference acquisition process and the above acquisition process.
7. In paragraph 6, A control method characterized in that the above lighting process is executed such that the light from the first LED and the light from the second LED overlap on the surface to be irradiated.
8. In paragraph 1, A measurement process for measuring the brightness distribution of an irradiated area irradiated by the first LED and the second LED, and An adjustment process for adjusting the shape of the light beam illuminating the irradiation area according to the above luminance distribution A control method characterized by including additional features.
9. It is an exposure device that transfers the pattern of a disc onto a substrate, An acquisition unit for acquiring the illuminance of each of the first LED and the second LED, and A control unit that controls the lighting of the first LED and the second LED. Have, The above control unit is, Acquire the respective illuminance of the first LED and the second LED, and Based on the respective illuminance of the first LED and the second LED obtained, the current value flowing to the LED with the lower illuminance among the first LED and the second LED is determined to be smaller than the current value flowing to the other LED. An exposure device characterized by the following.
10. An exposure process for obtaining an exposed substrate by exposing a substrate using the exposure apparatus described in claim 9, and The process includes developing the above-mentioned exposure substrate to obtain a developed substrate, and A method for manufacturing an article characterized by manufacturing an article from the above-mentioned developing substrate.

Description

Control method, exposure apparatus, and method of manufacturing article The present disclosure relates to a control method, an exposure apparatus, and a method for manufacturing an article. An exposure device is a device that transfers a pattern from a base plate (reticle or mask) onto a photosensitive substrate (such as a wafer or glass plate with a resist layer formed on its surface) through a projection optical system in a lithography process, which is a manufacturing process for semiconductor devices or liquid crystal displays. For example, in projection exposure devices used to transfer patterns to liquid crystal displays, there has recently been a demand to expose a larger area pattern on the mask onto the substrate in batches. To meet this demand, a step-and-scan type scanning projection exposure device has been proposed that enables high resolution and the exposure of a large screen. This scanning exposure device transfers a pattern illuminated by a slit beam onto the substrate through a scanning operation via a projection optical system. As a light source for an exposure device, for example, a mercury lamp is used, but in recent years, there is an expectation that mercury lamps will be replaced by solid-state light-emitting diodes (LEDs). LEDs have the advantages of energy saving and long lifespan because the time required for the light output to stabilize after current is passed through a substrate circuit that controls light emission is short, and there is no need to keep them emitting light constantly like mercury lamps. International Publication No. 2019/229971 discloses a method for reducing overall brightness non-uniformity by adjusting the lighting brightness according to the degree of degradation of each LED. Figure 1 is a schematic diagram showing the configuration of an exposure device. Figure 2 is a schematic diagram showing the configuration of an LED array. Figure 3 is a schematic diagram showing the configuration of a variable slit. FIG. 4 is a flowchart of a control method in a first embodiment. Figure 5 is a graph showing illuminance degradation information. Figure 6 is a graph showing illuminance degradation information. FIG. 7 is a flowchart of a control method in a second embodiment. FIG. 8 is a graph showing the luminance distribution in the second embodiment. Figure 9 is a flowchart of a method for manufacturing an article. Hereinafter, preferred embodiments of the present disclosure will be described in detail based on the accompanying drawings. In addition, in each drawing, the same reference numerals are used for identical components, and redundant descriptions are omitted. <First Embodiment> The exposure device (100) of the present embodiment will be described with reference to FIG. 1. FIG. 1 is a drawing showing the exposure device (100) of the present embodiment. The exposure device (100) of the present embodiment is a step-and-scan type scanning exposure device that scans and exposes a substrate by slit light, and includes an illumination optical system (1), an alignment scope (2), a projection optical system (4), a substrate stage (11), and a control unit (20). In addition, the original plate (3) is held and supported on the original plate stage (30) and is positioned between the alignment scope (2) and the projection optical system (4), and the substrate (10) is held and supported on the substrate stage (11). The control unit (20) includes a CPU or memory and controls the entire exposure device (100) (each part of the exposure device (100)). Additionally, the exposure device (100) may be a step-and-repeat type rather than a step-and-scan type. The illumination optical system (1) may include an LED array (13), a first fly-eye lens (14a), a first condenser lens (15a), a second fly-eye lens (14b), a plane mirror (16), a second condenser lens (15b), an illuminance sensor (17) (acquisition unit), a variable slit (18), and an imaging optical system (19). Light emitted by the LED array (13) passes through the first fly-eye lens (14a), the first condenser lens (15a), and the second fly-eye lens (14b), and then the light path is bent by the plane mirror (16). Then, the variable slit (18) is illuminated through the second condenser lens (15b) so that the light intensity becomes uniform, and after passing through the variable slit, it is incident on the imaging optical system (19). The configuration of the LED array (13) is shown in detail in FIG. 2. The LED array (13) forms a row of chips in which a plurality of LED chips (31) are electrically arranged in series in a direction perpendicular to the X-axis. The row of chips is arranged in the X-direction as shown in FIG. 3, 13A to 13G. An LED driver (13a to 13g) is connected to each row of chips, and the LED driver controls the current flowing through the LED chips (31) by means of a signal from the lamp control unit (21) in FIG. 1. The row of chips 13A to 13G is mounted on individual electrical boards, and if replacement becomes