KR-20260066327-A - Stone cleaner and semiconductor fabricating apparatus comprising the same

KR20260066327AKR 20260066327 AKR20260066327 AKR 20260066327AKR-20260066327-A

Abstract

A stone cleaner capable of stably cleaning a wafer table is provided. The stone cleaner comprises a main body including a guide recess; a handle configured to be movable in an up-and-down direction along the guide recess; and a cleaning unit installed on the lower surface of the main body and including a cleaning stone, wherein a plurality of guide pins are installed within the guide recess of the main body, and an elastic body is installed on at least one of the plurality of guide pins, and a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, and when the handle is pressed downward, the guide pin is inserted along the extension direction of the guide hole and the elastic body is compressed, and the repulsive force of the elastic body is configured to control the pressing force of the handle.

Inventors

김동현
조원배
김선호
윤창주
조용주

Assignees

삼성전자주식회사

Dates

Publication Date: 20260512
Application Date: 20241104

Claims (10)

Main body including guide recesses; A handle configured to be movable in the up and down direction along the above guide recess; and It includes a cleaning unit installed on the lower surface of the main body and including a cleaning stone, A plurality of guide pins are installed within the guide recess of the main body, and an elastic body is installed on at least one of the plurality of guide pins. A plurality of guide holes corresponding to the plurality of guide pins are installed in the above handle, and A stone cleaner configured such that when the handle is pressed downward, the guide pin is inserted along the extension direction of the guide hole and the elastic body is compressed, and the repulsive force of the elastic body controls the pressing force of the handle.
In Article 1, Among the plurality of guide holes, the first guide hole penetrates the handle, and among the plurality of guide pins, the first guide pin corresponds to the first guide hole, and A stone cleaner in which, when the handle is pressed downward beyond a preset depth, the first guide pin completely penetrates the first guide hole, and the tip of the first guide pin is exposed to the outside of the handle.
In Paragraph 2, The above handle further includes a handle for a worker to grasp with their fingers, and A stone cleaner in which the second guide hole among the plurality of guide holes is formed to overlap with the handle.
In Article 1, The above main body includes an outer wall and an inner wall that define the guide recess, and The above guide pin is a stone cleaner that protrudes upward from the inner wall.
In Article 1, A first central hole penetrating the main body and having a first inner diameter, and A second central hole penetrating the above handle and having a second inner diameter, and A stone cleaner further comprising a screw penetrating the first central hole and the second central hole, wherein the threads of the screw and the first internal threads installed on the inner wall of the first central hole are coupled.
In claim 1, the cleaning unit is, Cheokgwa, An installation groove formed on the lower side of the above chuck, and A magnet seated within the above-mentioned installation groove, and The above chuck and the holder for holding the magnet are included, The bottom surface of the holder is made of metal, so that the magnet and the bottom surface of the holder are fixed by magnetic force, and The above main body further includes a first central hole having a first inner diameter, and The above cleaning unit further includes a fastening part installed to protrude from the upper part of the chuck, and A stone cleaner configured such that the threads of the above-mentioned fastening portion and the second internal threads installed on the inner wall of the first central hole are coupled.
In Article 1, The above main body includes an outer wall and an inner wall defining the guide recess, and a cleaning fluid supply channel penetrating the outer wall is installed, and A ring guard is installed along the outer wall of the main body, and A stone cleaner in which a cleaning solution is supplied through the cleaning solution supply channel, and the cleaning solution is provided into the space between the ring guard and the cleaning stone.
In Article 1, A plurality of pressure sensors are installed on the upper surface of the handle, and the plurality of pressure sensors overlap the plurality of guide holes. A stone cleaner further comprising a pusher that adjusts the pressure applied to the handle according to the sensing values measured from the plurality of pressure sensors.
Main body including guide recesses; A handle configured to be movable in the up and down direction along the above guide recess and including a handle for a worker to grasp with their fingers; and It includes a cleaning unit installed on the lower surface of the main body and including a cleaning stone, The above main body includes an outer wall and an inner wall that define the guide recess, and A plurality of guide pins are installed within the guide recess of the main body, and the plurality of guide pins protrude upward from the inner wall, and a coil spring is installed on at least one of the plurality of guide pins. A plurality of guide holes corresponding to the plurality of guide pins are installed in the above handle, and The plurality of guide holes includes a first guide hole and a second guide hole, the first guide hole penetrates the handle without overlapping with the handle, the second guide hole overlaps with the handle, and the plurality of guide pins includes a first guide pin corresponding to the first guide hole and a second guide pin corresponding to the second guide hole. A stone cleaner in which, when the handle is pressed downward beyond a preset depth, the first guide pin completely penetrates the first guide hole, and the tip of the first guide pin is exposed to the outside of the handle.
A wafer table having a plurality of protrusions (burls) formed on its surface; A stone cleaner configured to clean the wafer table above; and It includes a controller that controls the stone cleaner, and The above stone cleaner is, A main body including a guide recess, and A handle configured to be movable in the up and down direction along the above guide recess, and It includes a cleaning unit installed on the lower surface of the main body and including a cleaning stone, A plurality of guide pins are installed within the guide recess of the main body, and an elastic body is installed on at least one of the plurality of guide pins. A plurality of guide holes corresponding to the plurality of guide pins are installed in the above handle, and A semiconductor manufacturing apparatus configured such that when the handle is pressed downward, the guide pin is inserted along the extension direction of the guide hole and the elastic body is compressed, and the repulsive force of the elastic body controls the pressing force of the handle.

Description

Stone cleaner and semiconductor fabricating apparatus comprising the same The present invention relates to a stone cleaner and a semiconductor manufacturing apparatus including the same. The exposure device projects a mask pattern (i.e., design layout) onto a sensitive material (i.e., resist) formed on a wafer. For the exposure of fine patterns, the exposure device may adopt, for example, a DUV (Deep Ultra-Violet) light source. In this case, to stably secure the wafer, the wafer may be fixed to a wafer table using a vacuum method. On the wafer table, a plurality of burls are installed at predetermined intervals, and the height of each burl may be tens to hundreds of micrometers. The heights of the plurality of burls are managed according to preset specifications (i.e., flatness management). By doing so, wafer warpage can be prevented, and defocus does not occur during the exposure process. Meanwhile, during the photolithography process, the wafer table is exposed to various chemical and physical stresses, and deposits can accumulate on the protrusions. These deposits impair flatness. FIG. 1 is a perspective view of a stone cleaner according to some embodiments of the present invention. Figure 2 is a perspective view of the stone cleaner of Figure 1 viewed from below. Figure 3 is an exploded perspective view of the stone cleaner of Figure 1. FIG. 4 is a perspective view illustrating the arrangement of guide pins and elastic bodies within the stone cleaner of FIG. 1. Figure 5 is a view of the stone cleaner of Figure 4 seen from B. Figure 6 is a cross-sectional view taken along AA of Figure 5. Figure 7 is a diagram illustrating the operation of the stone cleaner of Figure 1. Figures 8 and 9 are drawings for explaining the cleaning section of the stone clear of Figure 1. Figure 10 is a drawing for explaining the ring guard of the stone cleaner of Figure 1. FIGS. 11 and 12 are drawings for explaining a method of disassembling a stone cleaner according to some embodiments of the present invention. FIG. 13 is a drawing for illustrating a stone cleaner according to some embodiments of the present invention. FIG. 14 is a plan view illustrating a plurality of pressure sensors shown in FIG. 13. FIG. 15 is a flowchart for explaining the operation of the stone cleaner illustrated in FIG. 13. FIGS. 16 to 18 are drawings for illustrating a stone cleaner according to some embodiments of the present invention. FIG. 19 is a schematic diagram illustrating an exposure apparatus in which a stone cleaner according to some embodiments of the present invention may be adopted. Embodiments of the present invention will be described in detail below with reference to the attached drawings. Identical components in the drawings are denoted by the same reference numerals, and redundant descriptions thereof are omitted. FIG. 1 is a perspective view of a stone cleaner according to some embodiment of the present invention. FIG. 2 is a perspective view of the stone cleaner of FIG. 1 viewed from below. FIG. 3 is an exploded perspective view of the stone cleaner of FIG. 1. FIG. 4 is a perspective view illustrating the arrangement of guide pins and elastic bodies within the stone cleaner of FIG. 1. FIG. 5 is a view of the stone cleaner of FIG. 4 viewed from B. FIG. 6 is a cross-sectional view taken along A-A of FIG. 5. FIG. 7 is a drawing illustrating the operation of the stone cleaner of FIG. 1. FIG. 8 and FIG. 9 are drawings illustrating the cleaning portion of the stone cleaner of FIG. 1. FIG. 10 is a drawing illustrating the ring guard of the stone cleaner of FIG. 1. First, referring to FIGS. 1 to 6, a stone cleaner according to some embodiments of the present invention includes a main body (100), a handle (200), and a cleaning unit (300). The main body (100) guides the operation of the handle (200). That is, the main body (100) guides the up and down movement of the handle (200) and prevents the handle (200) from coming off. In addition, a cleaning unit (300) for cleaning a wafer table is installed in the main body (100). The main body (100) may be made of plastic (e.g., PEEK (PolyEtherEtherKetone)), but is not limited thereto. This main body (100) includes a body (110), a guide recess (120), a guide pin (130), an elastic body (140), etc. A guide recess (120) is formed on the upper surface of the main body (100). The guide recess (120) can be defined by an inner wall (111) and an outer wall (112). For example, the inner wall (111) may be cylindrical and the outer wall (112) may also be cylindrical, and accordingly, the guide recess (120) may be torus-shaped. As will be described later, a first central hole (118) is installed inside the inner wall (111), and a screw (410)/washer (420) is connected to the first central hole (118). Accordingly, the depth of the guide recess (120) limits the maximum movable distance of the handle (200). The handle (200) moves within the guide recess (120) without moving out of the guide recess (120). In other