KR-20260066428-A - Apparatus for uniform heating for large-area substrate and method thereof

Abstract

A uniform heating device and method for a large-area substrate are provided. A uniform heating device for a large-area substrate according to an embodiment of the present invention comprises: a chamber having a space for drying an organic solvent of a photoresist; a test panel disposed within the chamber for measuring the temperature of a large-area substrate coated with the photoresist; a heater disposed below the large-area substrate within the chamber for applying heat to the large-area substrate; and a control unit that feeds back to the heater according to the temperature measurement result of the test panel to control the temperature of the large-area substrate to become uniform.

Inventors

• 박재현
• 김승택

Assignees

• 한국생산기술연구원

Dates

Publication Date

20260512

Application Date

20241104

Claims (14)

1. A chamber having a space for drying the organic solvent of the photoresist; A test panel disposed within the chamber above for measuring the temperature of a large-area substrate coated with the photoresist; A heater disposed below the large-area substrate within the chamber to apply heat to the large-area substrate; and A control unit that feeds back to the heater according to the temperature measurement result of the test panel above to control the temperature of the large-area substrate to become uniform; A uniform heating device for a large-area substrate including
2. In paragraph 1, The above test panel is a uniform heating device for a large-area substrate comprising temperature sensors arranged in an array form with a certain spacing.
3. In paragraph 2, The above test panel is a uniform heating device for a large-area substrate that includes a communication unit that collects measurement results of the temperature sensor and transmits them collectively to the control unit.
4. In paragraph 2, The above heater is a uniform heating device for a large-area substrate, individually provided in correspondence with each position of the temperature sensor.
5. In paragraph 1, The above test panel is a uniform heating device for a large-area substrate including an extension module for connecting to another test panel.
6. In paragraph 4, A uniform heating device for a large-area substrate, comprising a control unit that receives the measurement result of the temperature sensor and a monitoring unit that monitors the temperature distribution by location by determining whether the measurement result of the temperature sensor is within a set temperature range.
7. In paragraph 6, A uniform heating device for a large-area substrate, comprising a control unit that provides feedback to adjust the intensity of the heater corresponding to the location when the control unit determines that the measurement result of the temperature sensor is not within a set temperature range.
8. In paragraph 1, A uniform heating device for a large-area substrate, wherein the control unit determines the heating order and heating degree of individual heaters corresponding to a region based on the temperature difference with an adjacent region on the large-area substrate.
9. A step of measuring the temperature of a large-area substrate coated with photoresist using a test panel; A step of monitoring the temperature distribution of the large-area substrate according to the above measurement results; and A step of heating the large-area substrate using a heater based on the monitoring results to make the temperature uniform; A uniform heating method for a large-area substrate including
10. In Paragraph 9, A uniform heating method for a large-area substrate, wherein the step of measuring the temperature above involves measuring the temperature of the large-area substrate using a test panel comprising temperature sensors arranged in an array form with a certain interval.
11. In Paragraph 10, A uniform heating method for a large-area substrate, comprising the step of measuring the temperature and the step of collecting and transmitting the temperature measurement results in batches.
12. In Paragraph 10, The above heating step is a uniform heating method for a large-area substrate, wherein the large-area substrate is heated by the heaters individually provided corresponding to each position of the temperature sensor.
13. In Paragraph 12, The above heating step is, A step of receiving the measurement result of the temperature sensor and determining whether it is within a set temperature range; and A step of providing feedback to adjust the intensity of the heater corresponding to the location when it is determined that the measurement result of the temperature sensor is not within the set temperature range; A uniform heating method for a large-area substrate including
14. A computer-readable recording medium having a program recorded thereon for performing the method of any one of paragraphs 9 through 13.

Description

Apparatus for uniform heating for large-area substrate and method thereof The present invention relates to a uniform heating apparatus and method for a large-area substrate, and in particular, to a uniform heating apparatus and method for a large-area substrate for improving drying non-uniformity that may occur during a photoresist coating process on a large-area substrate. In display and semiconductor manufacturing processes, the bake process, which involves evaporating organic solvents for curing after photoresist coating, is carried out by applying heat with a heater placed near the substrate. In the organic solvent drying process of the photoresist using a large heater inside the chamber, temperature uniformity under high-temperature conditions of the photoresist-coated substrate is critical. In this case, if the temperature of the large-area substrate coated with photoresist is not uniform, uneven evaporation may occur, leading to a problem of uneven coating thickness. However, there is a problem in that it is difficult to control the heater to improve temperature uniformity because it is difficult to measure the temperature of the substrate located at a certain distance from the heater. Therefore, there is a need for a system that can measure the temperature of a large-area substrate inside a chamber where the actual process takes place, away from the heater, and use this information to control the heater and improve the temperature uniformity of the large-area substrate. FIG. 1 is a diagram showing the configuration of a uniform heating device for a large-area substrate according to one embodiment of the present invention. FIG. 2 is a schematic diagram of a uniform heating device for a large-area substrate according to one embodiment of the present invention. FIG. 3 is a detailed block diagram of a test panel of a uniform heating device for a large-area substrate according to one embodiment of the present invention. FIG. 4 is a detailed block diagram of the control unit of a uniform heating device for a large-area substrate according to one embodiment of the present invention. FIG. 5 is a flowchart of a uniform heating method for a large-area substrate according to one embodiment of the present invention. FIG. 6 is a flowchart of the uniform heating procedure of a uniform heating method for a large-area substrate according to one embodiment of the present invention. Hereinafter, embodiments of the present invention are described in detail with reference to the attached drawings so that those skilled in the art can easily implement the present invention. The present invention may be embodied in various different forms and is not limited to the embodiments described herein. In the drawings, parts unrelated to the explanation have been omitted to clearly explain the present invention, and the same reference numerals have been used for identical or similar components throughout the specification. Hereinafter, a uniform heating device and method for a large-area substrate according to an embodiment of the present invention will be described in more detail with reference to the drawings. FIG. 1 is a configuration diagram of a uniform heating device for a large-area substrate according to one embodiment of the present invention, and FIG. 2 is a schematic diagram of a uniform heating device for a large-area substrate according to one embodiment of the present invention. Referring to FIGS. 1 and 2, a uniform heating device (100) for a large-area substrate according to one embodiment of the present invention may include a chamber (110), a test panel (120), a heater (130), and a control unit (140). A uniform heating device (100) for a large-area substrate can measure the temperature of a large-area substrate (10) coated with photoresist using a test panel (120), and can improve the temperature uniformity of the large-area substrate (10) by feeding back to a heater (130) based on the temperature measurement result. Here, the large-area substrate (10) may be thickly coated with a photoresist solution. Additionally, the large-area substrate (10) may be formed of an insulating material used in display devices, such as transparent glass or plastic. The chamber (110) may include a space for drying the organic solvent of the photoresist. That is, the chamber (110) may have a processing space having a sealed structure inside so as to perform a baking process for drying the organic solvent of the photoresist by means of a large-area substrate (10). At this time, the processing space may be formed to allow the introduction of the large-area substrate (10) for stable performance during the baking process. A test panel (120) is placed inside a chamber (110) and can measure the temperature of a large-area substrate (10) coated with photoresist. At this time, the test panel (120) can transmit the temperature measurement result of the large-area substrate (10) to a control unit (140). A heater (130) may be placed below a larg