KR-20260066603-A - Ion Source Including Porous Baffle

KR20260066603AKR 20260066603 AKR20260066603 AKR 20260066603AKR-20260066603-A

Abstract

One embodiment may provide an ion source comprising: an output unit including an anode electrode, a cathode electrode, and an output case, which generates and outputs ions by means of an electric field and a magnetic field; and a source body located on one side of the output unit and which transmits a voltage for generating ions to the anode electrode of the output unit, wherein the output unit generates ions between the anode electrode and the cathode electrode using the voltage, and the output unit is connected to one port of a chamber and communicates with the internal space of the chamber in a vacuum state so as to utilize the atmosphere of the internal space of the chamber, and outputs the ions to the internal space of the chamber using the magnetic field, and controls at least one of the output intensity and output direction of the ions through a porous baffle positioned in the direction in which the ions are output and arranged integrally with the output unit, and wherein the distribution of the pores of the porous baffle varies according to the position of the port of the chamber connected to the output unit.

Inventors

김홍직
임영진
이영섭

Assignees

주식회사 저스템

Dates

Publication Date: 20260512
Application Date: 20250519
Priority Date: 20241104

Claims (8)

An output unit comprising an anode electrode, a cathode electrode, and an output case, which generates and outputs ions by an electric field and a magnetic field; and It includes a source body located on one side of the output unit and transmitting a voltage for generating ions to the anode electrode of the output unit. The output unit generates ions between the anode electrode and the cathode electrode using the voltage, and the output unit is connected to one port of the chamber and communicates with the internal space of the chamber in a vacuum state, thereby utilizing the atmosphere of the internal space of the chamber, outputs the ions into the internal space of the chamber using the magnetic field, and controls at least one of the output intensity and output direction of the ions through a porous baffle positioned in the direction in which the ions are output and arranged integrally with the output unit. An ion source comprising a porous baffle, wherein the arrangement of the pores of the porous baffle varies depending on the position of one port of the chamber connected to the output section.
In paragraph 1, The above cathode electrode comprises a central cathode electrode located at the center of an opening and an edge cathode electrode located at the edge of an opening, wherein the central cathode electrode is located at the inner center of a circular output case and the edge cathode electrode is located at the inner edge of the output case and is electrically connected to have the same potential, and the ion source includes a porous baffle.
In paragraph 1, An ion source comprising a porous baffle that controls the output intensity and output direction of the ions by controlling at least one of the pore spacing, pore size, and pore distribution of the porous baffle.
In paragraph 3, When the above output unit is connected to the center side of the chamber, An ion source comprising a porous baffle that uniformly forms ions inside the chamber by making at least one of the pore spacing, pore size, and pore distribution of the porous baffle uniform.
In paragraph 3, When the above output unit is connected to one side of the chamber, An ion source comprising a porous baffle that forms ions uniformly inside the chamber by making at least one of the pore spacing, pore size, and pore distribution of the porous baffle non-uniform.
In paragraph 3, An ion source comprising a porous baffle, wherein the porous baffle further comprises a pore control plate capable of controlling at least one of the pore spacing, pore size, and pore distribution.
In paragraph 1, An ion source comprising a porous baffle that controls the output intensity and output direction of the ions according to the thickness of the porous baffle.
In paragraph 1, An ion source comprising a porous baffle, wherein the porous baffle further comprises a baffle coupling portion capable of combining a plurality of porous baffles.

Description

Ion Source Including Porous Baffle The present embodiment relates to an ion source comprising a porous baffle capable of effectively removing static electricity by forming ions in the internal space of a chamber through the integral arrangement of a porous baffle capable of controlling at least one of the ion output intensity and output direction. Static electricity is generated by various causes, including friction and peeling. Such static electricity can occur in diverse environments, regardless of whether the material is a solid, liquid, insulator, or conductor. While the generated static electricity consists of equal amounts of positive and negative charges, in actual processes, static electricity of only one polarity often appears due to the difference in capacitance between the two. In the manufacturing process of electronic devices such as memory devices, flat panel displays, and integrated circuits, foreign substances may adhere to the electronic devices due to the generation of static electricity, or patterns may be damaged by electrostatic discharge. Various methods are being implemented to suppress or eliminate such static electricity generation, and methods to eliminate static electricity using ionization devices are mainly being proposed. Ionization devices generate positive and negative ions and release them into the air using a fan or compressed air, and the released ions neutralize the charged particles by providing ion particles opposite to the charged particles of the substrate where static electricity is generated, thereby eliminating static electricity. However, conventional ionization devices for electrostatic discharge release ions into the air in a non-vacuum environment, which presents a problem in that they are difficult to apply in vacuum environments where high cleanliness must be maintained. Conventional electrostatic discharge processes involve two steps: forming a thin film of an electronic device in a vacuum environment, and then removing static electricity through a separate discharge process in a non-vacuum environment. Conventional electrostatic discharge devices have limitations in preventing device damage caused by static electricity because the thin film process and the static discharge process are separated, making it impossible to immediately remove static electricity generated during thin film formation. In addition, conventional electrostatic discharge devices may cause damage to the substrate because they directly irradiate the substrate with ion particles and ion light generated during the ion generation process. Figure 1 is a drawing showing a chamber that performs a specific process in a vacuum. FIG. 2 is a diagram showing an ion source coupled to a chamber according to one embodiment. FIGS. 3 and FIGS. 4 are drawings showing a side cross-section of an ion source according to one embodiment. FIG. 5 is a drawing showing a part of the upper surface of an ion source according to one embodiment. FIG. 6 is a first example drawing showing a porous baffle disposed in an ion source according to one embodiment. FIG. 7 is a second example drawing showing a plurality of porous baffles arranged in an ion source according to one embodiment. FIG. 8 is a third example drawing showing a thick porous baffle disposed in an ion source according to one embodiment. FIG. 9 is a diagram showing that the pores of a porous baffle according to one embodiment are uniformly arranged. FIG. 10 is a diagram showing that the pores of a porous baffle according to one embodiment are unevenly arranged. FIGS. 11 and 12 are drawings showing the installation location of an ion source according to one embodiment and the arrangement of the pores of the porous baffle accordingly. FIG. 13 is an example drawing of the shape of a porous baffle according to one embodiment. Hereinafter, some embodiments of the present invention will be described in detail with reference to the exemplary drawings. It should be noted that in assigning reference numerals to the components of each drawing, the same components are given the same reference numeral whenever possible, even if they are shown in different drawings. Furthermore, in describing the present invention, if it is determined that a detailed description of related known components or functions could obscure the essence of the invention, such detailed description is omitted. In addition, terms such as first, second, A, B, (a), (b), etc., may be used when describing the components of the present invention. These terms are intended only to distinguish the components from other components, and the essence, order, or sequence of the components is not limited by the terms. Where it is stated that a component is "connected," "combined," or "connected" to another component, it should be understood that the component may be directly connected or connected to the other component, but that another component may also be "connected," "combined," or "connected" between each