KR-20260067336-A - METHODS AND APPARATUS FOR FLOW DISTRIBUTION

Abstract

Various embodiments of the present invention may provide a spacer plate having a groove and an inlet aperture fluidly communicating with the groove, a flow distribution ring disposed within the groove and having a plurality of apertures, and an upper ring disposed on the spacer plate and the flow distribution ring.

Inventors

• 윈클러 제랄드 리
• 킴티 안키트

Assignees

• 에이에스엠 아이피 홀딩 비.브이.

Dates

Publication Date

20260512

Application Date

20251031

Priority Date

20241105

Claims (20)

1. As a device, Spacer plate - The above spacer plate is Home; and Includes an inlet aperture that communicates fluidly with the above-mentioned groove -; A flow distribution ring disposed within the above-mentioned groove and comprising a plurality of apertures; and The upper ring positioned on the above spacer plate and flow distribution ring A device including
2. A device according to claim 1, wherein a plurality of apertures of the flow distribution ring are vertically oriented and fluidly communicating with the groove.
3. A device according to claim 1, wherein the groove is arranged within the upper surface of the spacer plate.
4. A device according to claim 1, wherein the groove is annular.
5. In claim 1, the device wherein the inlet aperture is arranged horizontally and connected to a gas line.
6. A device according to claim 1, wherein the upper ring includes a lip extending radially inward.
7. In claim 6, the device wherein the lip is separated from the spacer plate by a gap.
8. The device according to claim 1, wherein the spacer plate includes a lip that extends radially inward and overlaps with the outer edge of the support assembly.
9. In paragraph 1, The above spacer plate is formed from at least one of aluminum, nickel, stainless steel, and titanium; The above flow distribution ring is formed from at least one of aluminum, nickel, stainless steel, and titanium, forming a device.
10. A device according to claim 1, wherein the upper ring is formed of at least one of ceramic and quartz.
11. As a reactor, Lower chamber; A shower head positioned above the lower chamber; A spacer plate disposed between the lower chamber and the shower head - the spacer plate is, An annular groove within the upper surface of the above spacer plate; Inlet aperture; and Includes a first lip extending radially inward -; A flow distribution ring comprising a plurality of apertures disposed within the annular groove and fluidly communicating with the inlet aperture; A support assembly disposed within the reaction chamber, wherein the first lip of the spacer plate overlaps with the outer edge of the susceptor support assembly; and The upper ring coupled to the upper surface of the above spacer plate A reactor containing
12. In claim 11, the reactor, wherein the inlet aperture is arranged horizontally and coupled to an inlet port arranged on the outer surface of the reaction chamber.
13. A reactor according to claim 11, wherein the upper ring comprises a second lip extending radially inward.
14. In claim 11, a reactor in which the second lip of the upper ring is separated from the spacer plate by the first gap.
15. A reactor according to claim 11, further comprising a seal disposed between the first lip of the spacer plate and the outer edge of the susceptor support assembly.
16. In claim 11, the second lip of the upper ring is separated from the susceptor support assembly by a second gap, and the second gap is arranged as an annular ring, a reactor.
17. As a system, Reactor - The above reactor is Lower chamber; A shower head positioned above the lower chamber; A spacer plate disposed between the lower chamber and the shower head, wherein the spacer plate is, An annular groove within the upper surface of the above spacer plate; Inlet aperture; and A spacer plate including a first lip extending radially inward; A flow distribution ring comprising a plurality of apertures disposed within the annular groove and fluidly communicating with the inlet aperture; A susceptor support assembly disposed within the reaction chamber, wherein a first lip of the spacer plate overlaps with the outer edge of the susceptor support assembly; and Includes an upper ring coupled to the upper surface of the above spacer plate -; A gas line coupled to the inlet aperture and comprising first and second pipe sections, wherein the first pipe section and the second pipe section are parallel to each other; and Pressure control device upstream from the first and second pipe sections mentioned above A system including
18. A system according to claim 17, further comprising a first valve arranged in alignment with the first pipe section and a second valve arranged within the second pipe section.
19. In paragraph 17, the system wherein the gas line is additionally coupled to an inert gas supply source.
20. A system according to claim 17, further comprising a controller configured to communicate with and operate the first and second valves.

Description

Methods and apparatus for flow distribution The present disclosure generally relates to flow distribution methods and apparatus. More specifically, the present disclosure relates to a flow distribution ring disposed within a spacer plate to provide a gas curtain around a susceptor. Reaction chambers used in semiconductor manufacturing may include spaces or volumes that need to be purged with an inert gas to prevent chemical deposition in these areas. The deposition of chemicals within these spaces can cause contamination of the reaction space and/or impair the function of components within the reaction chamber. Various embodiments of the present invention may provide a spacer plate having a groove and an inlet aperture fluidly communicating with the groove, a flow distribution ring disposed within the groove (the flow distribution ring has a plurality of apertures), and an upper ring disposed on the spacer plate and the flow distribution ring. According to one embodiment, the device comprises a spacer plate (the spacer plate comprises a groove; and an inlet aperture fluidly communicating with the groove); a flow distribution ring disposed within the groove and comprising a plurality of apertures; and an upper ring disposed over the spacer plate and the flow distribution ring. In one embodiment, a plurality of apertures of the flow distribution ring are oriented vertically and communicate with the grooves and fluids. In one embodiment, the groove is arranged within the top surface of the spacer plate. In one embodiment, the groove is annular. In one embodiment, the inlet aperture is arranged horizontally and connected to a gas line. In one embodiment, the top ring includes a lip that extends radially inward. In one embodiment, the lip is separated from the spacer plate by a gap. In one embodiment, the spacer plate includes a lip that extends radially inward and overlaps with the outer edge of the support assembly. In one embodiment, the spacer plate is formed of at least one of aluminum, nickel, stainless steel, and titanium; and the flow distribution ring is formed of at least one of aluminum, nickel, stainless steel, and titanium. In one embodiment, the top ring is formed of at least one of ceramic and quartz. According to another embodiment, the reactor comprises: a lower chamber; a shower head disposed above the lower chamber; a spacer plate disposed between the lower chamber and the shower head (the spacer plate comprises an annular groove within the upper surface of the spacer plate; an inlet aperture; and a first lip extending radially inward); a flow distribution ring comprising a plurality of apertures disposed within the annular groove and fluidly communicating with the inlet aperture; a support assembly disposed within the reaction chamber, wherein the first lip of the spacer plate overlaps with the outer edge of a susceptor support assembly; and an upper ring coupled to the upper surface of the spacer plate. In one embodiment, the inlet aperture is horizontally arranged and coupled to an inlet port arranged on the outer surface of the reaction chamber. In one embodiment, the upper ring includes a second lip extending radially inward. In one embodiment, the second lip of the upper ring is separated from the spacer plate by the first gap. In one embodiment, the device further includes a seal disposed between the first lip of the spacer plate and the outer edge of the susceptor support assembly. In one embodiment, the second lip of the upper ring is separated from the susceptor support assembly by a second gap, and the second gap is arranged as an annular ring. According to another embodiment, the system comprises: a reactor (the reactor comprises: a lower chamber; a shower head disposed above the lower chamber; a spacer plate disposed between the lower chamber and the shower head (the spacer plate comprises: an annular groove within the upper surface of the spacer plate; an inlet aperture; and a first lip extending radially inward); a flow distribution ring comprising a plurality of apertures disposed within the annular groove and fluidly communicating with the inlet aperture; a susceptor support assembly disposed within the reaction chamber, wherein the first lip of the spacer plate overlaps with the outer edge of the susceptor support assembly; and an upper ring coupled to the upper surface of the spacer plate); a gas line coupled to the inlet aperture and comprising a first pipe section and a second pipe section, wherein the first pipe section and the second pipe section are parallel to each other; and a pressure control device upstream of the first and second pipe sections. In one embodiment, the system further includes a first valve arranged in line with a first pipe section and a second valve arranged within a second pipe section. In one embodiment, the gas line is additionally connected to an inert gas source. In one embodiment, the system further includes a controller configured to communic