KR-20260067846-A - X-RAY COMPUTED LAMINOGRAPHY APPARATUS

Abstract

The technical concept of the present invention provides an X-ray computer laminography apparatus comprising: a stage on which a sample is placed; a plurality of patterns placed within the stage; an X-ray source that emits X-rays toward the sample; a detector that detects the X-rays that have passed through the sample and the patterns to generate a two-dimensional image; a storage unit that stores pattern data regarding the arrangement of the patterns placed within a predetermined area of the stage; and a control unit that generates a three-dimensional image by calibrating the two-dimensional image using the pattern data.

Inventors

• 권태진
• 문정호
• 이승렬
• 최가람
• 홍석범
• 안명기
• 이수영
• 이형철

Assignees

• 삼성전자주식회사

Dates

Publication Date

20260513

Application Date

20241106

Claims (10)

1. A stage where the sample is placed; A plurality of patterns arranged within the above stage; An X-ray source that emits X-rays toward the above sample; A detector that generates a two-dimensional image by detecting the X-rays transmitted through the sample and the pattern; A storage unit for storing pattern data regarding the arrangement of the plurality of patterns disposed within a predetermined area of the above stage; and An X-ray computer laminography device comprising: a control unit that generates a three-dimensional image by calibrating the two-dimensional image using the pattern data.
2. In paragraph 1, The stage is located between the X-ray source and the detector, and An X-ray computer laminography device in which a first virtual line connecting the X-ray source and the detector and a second virtual line including the normal of the stage intersect each other.
3. In paragraph 1, X-ray computer laminography device in which the above stage and the above X-ray source rotate relative to each other.
4. In paragraph 1, The above plurality of patterns are classified into key patterns and general patterns, and X-ray computer laminography device in which the above key pattern is different in shape from other patterns among the plurality of patterns arranged within a predetermined area of the stage, and the above general pattern is a pattern other than the key pattern.
5. In paragraph 4, X-ray computer laminography apparatus comprising at least one key pattern in a corresponding area on the stage corresponding to a measurement area where the X-ray emitted from the X-ray source is irradiated onto the sample.
6. In paragraph 5, The above control unit is an X-ray computer laminography device that calibrates by comparing the pattern data in the corresponding area with the pattern image in a two-dimensional image of the measurement area.
7. A stage where the sample is placed; A pattern plate disposed on one side of the above stage and having a plurality of patterns; An X-ray source that emits X-rays toward the above sample; A detector that generates a two-dimensional image by detecting the X-rays transmitted through the sample and the pattern; A storage unit for storing pattern data regarding the arrangement of the plurality of patterns disposed within a predetermined area of the above stage; and An X-ray computer laminography device comprising: a control unit that generates a three-dimensional image by calibrating the two-dimensional image using the pattern data.
8. In Paragraph 7, The above pattern plate is an X-ray computer laminography device placed on the lower or upper surface of the stage.
9. In Paragraph 7, The above plurality of patterns are classified into key patterns and general patterns, and X-ray computer laminography device in which the above key pattern is different in shape from other patterns among the plurality of patterns arranged within a predetermined area of the stage, and the above general pattern is a pattern other than the key pattern.
10. In Paragraph 9, X-ray computer laminography apparatus comprising at least one key pattern in a corresponding area on the stage corresponding to a measurement area where the X-ray emitted from the X-ray source is irradiated onto the sample.

Description

X-ray Computed Laminography Apparatus The technical concept of the present invention is an X-ray computer laminography device, and more specifically, an X-ray computer laminography device capable of accurate calibration. With the advancement of semiconductor packaging technology, 3D integration technologies utilizing bumps and TSVs (Through Silicon Via) are widely used. Non-destructive inspection methods using X-rays are employed for quality inspection of these structures. Representative examples include X-ray Computed Tomography (CT) and Computed Laminography (CL). X-ray CT is a method that identifies 3D structures using projected images acquired from various angles, while X-ray CL is a method that reconstructs cross-sectional images of a region of interest using projected images from limited angles. Recently, research on image quality improvement using artificial intelligence and machine learning technologies is also actively underway. FIG. 1 is a schematic diagram showing an X-ray computer laminography apparatus according to one embodiment of the present invention. FIGS. 2A and FIGS. 2B are schematic diagrams illustrating an example of a plurality of patterns within a stage. Figure 3 is a schematic diagram showing an example of the control unit of Figure 1. FIG. 4 is a schematic diagram showing an X-ray computer laminography apparatus according to another embodiment of the present invention. FIG. 5 is a schematic diagram showing an X-ray computer laminography apparatus according to another embodiment of the present invention. FIGS. 6a to 6d are drawings for explaining the geometry calibration process of an X-ray laminography device according to one embodiment of the present invention. FIG. 7 is a flowchart schematically illustrating a method for acquiring a three-dimensional image using an X-ray computer laminography device according to one embodiment of the present invention. Hereinafter, embodiments of the present invention are described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described below and may be embodied in various other forms. The following embodiments are provided not so as to fully complete the present invention, but rather to sufficiently convey the scope of the present invention to those skilled in the art in the technical field of the present invention. FIG. 1 is a schematic diagram showing an X-ray computer laminography apparatus according to one embodiment of the present invention. Referring to FIG. 1, an X-ray computer laminography device (110) according to one embodiment of the present invention may include a stage (110), a pattern (P), an X-ray source (130), a detector (140), a storage unit (150), and a control unit (160). The stage (110) may be a flat plate-shaped member on which a sample (S) is placed and X-ray inspection is performed. The stage (110) may be formed of a material with high X-ray transmittance to facilitate the transmission of X-rays. For example, the stage (110) may be formed of a polymer material such as polymethyl methacrylate, polycarbonate, polyimide, or polyetherimide. The thickness (T1) of the stage (110) can be optimized by considering X-ray transmittance and mechanical rigidity. As an example, the thickness (T1) of the stage (110) can be selected in the range of 0.5 mm to 20 mm, and preferably in the range of 1 mm to 10 mm. If the thickness (T1) of the stage (110) is less than 0.5 mm, sagging or warping may occur, making it difficult to accurately control the position of the sample (S). Conversely, if the thickness (T1) of the stage (110) exceeds 20 mm, the attenuation of X-rays increases, which may degrade image quality. The flatness of the stage (110) may be a very important factor for precise inspection of the sample (S). The surface flatness of the stage (110) can be machined to 10 μm or less, and preferably 5 μm or less. Such high flatness can be achieved through high-precision machining techniques such as precision grinding and lapping. The movement mechanism of the stage (110) can be designed to enable precise multi-axis driving. Specifically, the stage (110) may include an X-axis driving unit (not shown), a Y-axis driving unit (not shown), a Z-axis driving unit (not shown), and a rotary driving unit (not shown). Each driving unit may include a precision motor and a linear motion conversion mechanism. Motors (not shown) for driving the X-axis, Y-axis, and Z-axis may be 5-phase stepping motors capable of microstepping or servo motors. A ball screw (not shown) may be used to convert the rotational motion of the motor into linear motion. To minimize backlash, a preloaded double nut type may be applied to the ball screw. The rotary drive unit can rotate the stage (110) around the Z-axis. A DD (Direct Drive) motor or a servo motor using a worm gear as a reduction gear may be applied to the rotary drive. The rotation angle can be controlled in the range of 0 to 360 degrees, and