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TW-I924846-B - SUBSTRATE PROCESSING APPARATUS, CHEMICAL LIQUID PROCESSING APPARATUS AND METHOD FOR ADJUSTING CENTER ALIGNMENT OF AT LEAST ONE NOZZLE WITH SUBSTRATE IN PROCESSING UNIT

Inventors

  • WANG, HUI
  • LEE, MARK
  • WU, JUN
  • CHENG, CHENG
  • JUNG, ANDREW
  • SOHN, Bruce
  • WANG, JUN
  • KIM, Yy

Assignees

  • 大陸商盛美半導體設備(上海)股份有限公司
  • 韓商盛美半導體設備韓國有限公司
  • 香港商清芯科技有限公司

Dates

Publication Date
20260511
Application Date
20220425
Priority Date
20210425