TW-I925042-B - Sputtering targets for forming oxide semiconductor thin films, manufacturing methods of sputtering targets for forming oxide semiconductor thin films, oxide semiconductor thin films, thin film semiconductor devices and manufacturing methods thereof.
Inventors
- TANINO, Kenta
- HANNA, Taku
- TAKEUCHI, MASATO
- TEZUKA, NAOTO
Assignees
- 日商愛發科股份有限公司
Dates
- Publication Date
- 20260511
- Application Date
- 20230908
- Priority Date
- 20220916