US-12618790-B2 - Environment detection apparatus

Abstract

An environment detection apparatus is provided. In one embodiment, the detection apparatus comprises: a first sensing device, a second sensing device in fluid communication with the first sensing device and a spectrum analyzer electrically connected to the first sensing device and the second sensing device. The first sensing device includes a pair of first electrodes configured to provide a first alternating current signal directly to a gas flowing into the first sensing device. The second sensing device includes a first filter configured to capture a solid in the gas flowing into the second sensing device and a pair of second electrodes configured to provide a second alternating current signal directly to the first filter with the solid captured by the first filter.

Inventors

• Ming Da Yang
• CHUN-HSUAN LIN
• Chwen Yu

Assignees

• TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Dates

Publication Date

20260505

Application Date

20231026

Claims (20)

1. 1 . A detection apparatus for detecting a gas generated from semiconductor manufacturing, comprising: a first sensing device, which comprises a pair of first electrodes configured to supply a first alternating current signal directly to the gas flowing into the first sensing device; a second sensing device, which is in fluid communication with the first sensing device and comprises a first filter configured to capture a solid in the gas flowing into the second sensing device and a pair of second electrodes configured to supply a second alternating current signal directly to the first filter with the solid captured by the first filter; and a spectrum analyzing device electrically connected to the first sensing device and the second sensing device; wherein the gas comprises an acid gas and an alkaline gas, and wherein the solid comprises a salt solid.
2. 2 . The detection apparatus of claim 1 , wherein the first sensing device comprises a first air inlet and a first air outlet and the second sensing device comprises a second inlet and a second outlet, and wherein the first inlet of the sensing device is configured to introduce the gas into the first sensing device, and wherein the first air outlet of the first sensing device is connected to the second inlet of the second sensing device, and wherein second outlet of the second sensing device is configured to release the gas from the second sensing device.
3. 3 . The detection apparatus of claim 2 , wherein the first sensing device comprises a second filter arranged between the pair of the first electrodes and being substantially parallel to a direction extending from the first air inlet of the first sensing device toward the first air outlet of the first sensing device, and wherein the first alternating current signal is directly supplied to the filter and the gas passing through the second filter.
4. 4 . The detection apparatus of claim 2 , wherein the first filter is substantially perpendicular to a direction extending from the second air inlet of the second sensing device toward the second air outlet of the second sensing device and arranged between the pair of the pair of second electrodes.
5. 5 . The detection apparatus of claim 4 , wherein the pair of the second electrodes are arranged to be substantially parallel to a direction extending from the second air inlet of the second sensing device toward the second air outlet of the second sensing device.
6. 6 . The detection apparatus of claim 4 , wherein the pair of the second electrodes are arranged to be substantially perpendicular to a direction extending from the second air inlet of the second sensing device toward the second air outlet of the second sensing device.
7. 7 . The detection apparatus of claim 1 , wherein the first sensing device is free of a sensing material capable of electrochemically reacting with the gas flowing into the first sensing device.
8. 8 . The detection apparatus of claim 1 , wherein the second sensing device is free of a sensing material capable of electrochemically reacting with the first filter with the solid.
9. 9 . The detection apparatus of claim 3 , further comprising a pump connected to the first gas inlet of the first sensing device.
10. 10 . A detection apparatus for detecting a gas generated from semiconductor manufacturing, comprising: a first device configured to apply a first alternating current signal to obtain a first response associated with the gas flowing through the first device, wherein the first device is free of a sensing material capable of electrochemically reacting with the gas flowing through the first device; a second device configured to apply a second alternating current signal to obtain a second response associated with a solid in the gas flowing through the second device, wherein the second device is free of a sensing material capable of electrochemically reacting with the solid in the gas flowing through the second device; and an analyzer configured to receive the first response and the second response and generate at least one impedance spectrum based on the first response and the second response; wherein the gas comprises an acid gas and an alkaline gas, and wherein the solid comprises a salt solid.
11. 11 . The detection apparatus of claim 10 , wherein the first device is configured to obtain the first response associated with the gas passing through a first filter disposed within the first device.
12. 12 . The detection apparatus of claim 10 , wherein the second device comprises a second filter configured to collect the solid in the gas, and wherein the second device is configured to obtain the second response associated with the solid collected by the second filter.
13. 13 . The detection apparatus of claim 12 , wherein the second device is configured to obtain a third response regarding the gas flowing through the second filter, and wherein the analyzer is configured to receive the third response and result the at least one impedance spectrum based on the first response, the second response and the third response.
14. 14 . The detection apparatus of claim 10 , wherein the first device is configured to obtain the first response associated with the gas passing through a through hole within the first device.
15. 15 . The detection apparatus of claim 10 , further comprising a pump configured to introduce the gas into the first device.
16. 16 . The detection apparatus of claim 15 , wherein the first device is in fluid communication with the second device, and wherein the gas flows through the first device and then flows through the second device.
17. 17 . A method of detecting a characteristic of a gas generated from semiconductor manufacturing, comprising: providing the gas flowing into a first device; applying a first alternating current signal directly to the gas in the first device so as to obtain a first response; providing the gas flowing from the first device into a second device; applying a second alternating current signal directly to a first filter disposed in the second device and configured to collect a solid in the gas in the second device so as to obtain a second response; and generating at least one impedance spectrum based on the first response and the second response; wherein the gas comprises an acid gas and an alkaline gas, and wherein the solid comprises a salt solid.
18. 18 . The method of claim 17 , further comprising: identifying a characteristic of the gas based on the at least one impedance spectrum.
19. 19 . The method of claim 17 , wherein the first device is free of a sensing material capable of electrochemically reacting with the gas when applying the first alternating current signal.
20. 20 . The method of claim 17 , wherein the second device is free of a sensing material capable of electrochemically reacting with the first filter when applying the second alternating current signal.

Description

BACKGROUND In the semiconductor industry, there is an increasing demand for stricter regulations on the emission of waste gases due to the requirement of achieving net zero emissions. Net zero emissions have become an important aspect of corporate social responsibility (CSR) for semiconductor companies. The semiconductor industry is known for its significant contribution to greenhouse gas emissions, particularly through the release of waste gases during the manufacturing process. These waste gases have a high global warming potential and can remain in the atmosphere for a long time, contributing to climate change. To address this issue, governments and regulatory bodies are imposing more stringent regulations on waste gas emissions from semiconductor facilities. These regulations aim to reduce the industry's environmental impact and promote sustainable practices. Semiconductor companies are now required to invest in advanced emission control technologies and implement measures to minimize waste gas emissions. Achieving net zero emissions has become a crucial CSR goal for semiconductor companies. By committing to net zero emissions, these companies demonstrate their dedication to environmental sustainability and reducing their carbon footprint. This commitment involves not only complying with regulatory requirements but also actively seeking innovative solutions to minimize waste gas emissions throughout the entire manufacturing process. Furthermore, achieving net zero emissions can enhance the reputation and competitiveness of semiconductor companies. As sustainability becomes a key consideration for customers, investors, and other stakeholders, companies that prioritize environmental responsibility are more likely to attract business and investment opportunities. By aligning their CSR goals with net zero emissions, semiconductor companies can demonstrate their commitment to sustainable practices and differentiate themselves in the market. Therefore, net zero emissions have become an important aspect of CSR for semiconductor companies, as they demonstrate a commitment to environmental sustainability and contribute to the overall sustainability of the industry. By investing in advanced emission control technologies and adopting cleaner manufacturing processes, semiconductor companies can reduce their environmental impact and enhance their reputation in the market. However, there is currently no system or device available that can monitor and analyze the emissions of waste gases from semiconductor factories in real-time. Semiconductor manufacturers typically require complex and time-consuming analysis processes, such as the process of ion chromatography (IC) analysis, to determine if their emitted waste gases meet the requirements. BRIEF DESCRIPTION OF THE DRAWINGS Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion. FIG. 1 is a schematic illustration of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 2 is a block diagram of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 3A is a schematic illustration of an embodiment of the gas sensing device of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 3B is a schematic illustration of another embodiment of the gas sensing device of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 3C is a schematic illustration of another embodiment of the gas sensing device of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 4A is a schematic illustration of an embodiment of the solid sensing device of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 4B is a schematic illustration of another embodiment of the solid sensing device of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 5 is a flow chart representing a method for operating the detection apparatus in accordance with an embodiment of the present disclosure. FIG. 6 illustrates a state of use of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 7 illustrates another state of use of the detection apparatus in accordance with an embodiment of the instant disclosure. FIG. 8 illustrates another state of use of the detection apparatus in accordance with an embodiment of the instant disclosure. DETAILED DESCRIPTION The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are