US-12620544-B2 - Hybrid multi-source x-ray source and imaging system

Abstract

Some embodiments include a system, comprising: at least one x-ray source, each x-ray source including: an electron source configured to generate an electron beam; and a target configured to receive the electron beam and convert the electron beam into an x-ray beam; and a collimator. A first edge of the collimator closest to the electron source is closer to the electron source than a central axis of the x-ray beam before entering the collimator; and a second edge of the collimator opposite to the first edge is at the central axis of the x-ray beam before entering the collimator or closer to the electron source than the central axis of the x-ray beam before entering the collimator.

Inventors

• Houman Jafari
• Bo Gao
• Vance Scott Robinson

Assignees

• VEC Imaging GmbH & Co. KG
• VAREX IMAGING CORPORATION

Dates

Publication Date

20260505

Application Date

20240619

Priority Date

20210216

Claims (19)

1. 1 . A system, comprising: a plurality of x-ray sources comprising: a first electron source configured to generate a first electron beam; a second electron source configured to generate a second electron beam; and a target configured to: receive the first electron beam and convert the first electron beam into a first x-ray beam; and receive the second electron beam and convert the second electron beam into a second x-ray beam; a collimator; a filter downstream of the collimator; and a first focusing electrode; wherein: a surface of the target is disposed at an angle relative to the first electron beam that is different from perpendicular; a first edge of the collimator closest to the first electron source is closer to the first electron source than a central axis of the first x-ray beam before entering the collimator; a second edge of the collimator opposite to the first edge is at the central axis of the first x-ray beam before entering the collimator or closer to the first electron source than the central axis of the first x-ray beam before entering the collimator; a first edge of the filter closest to the first electron source has a first thickness; a second edge of the filter opposite the first edge of the filter has a second thickness less than the first thickness; the first electron source is configured to direct the first electron beam through the first focusing electrode; and the second electron source is configured to direct the second electron beam to the target without passing through a focusing electrode.
2. 2 . The system of claim 1 , wherein: a first x-ray source of the plurality of x-ray sources is different from a second x-ray source of the plurality of x-ray sources; and the target is a linear target.
3. 3 . The system of claim 1 , wherein the filter comprises at least one of molybdenum (Mo), rhodium (Rh), silver (Ag), aluminum (Al), copper (Cu), or stainless steel.
4. 4 . The system of claim 1 , wherein: a first x-ray source of the plurality of x-ray sources operates at a first maximum current; and a second x-ray source of the plurality of x-ray sources operates at a second maximum current different from the first maximum current.
5. 5 . The system of claim 4 , further comprising a cooling system configured to provide different cooling to a first region of the target associated with the first x-ray source and a second region of the target associated with the second x-ray source.
6. 6 . The system of claim 4 , wherein: a third x-ray source of the plurality of x-ray sources operates at the first maximum current; the first x-ray source and the third x-ray source are generated by the first electron beam and a third electron beam focused on a first region of the target; and the second x-ray source is generated by the second electron beam directed to a second region of the target different from the first region.
7. 7 . The system of claim 6 , wherein the first focusing electrode is configured to focus the first electron beam and the third electron beam without focusing the second electron beam.
8. 8 . The system of claim 1 , wherein; a first surface of the target is parallel to a longitudinal axis of the target and disposed at a first angle relative to the first electron beam; a second surface of the target is parallel to the longitudinal axis of the target and disposed at a second angle relative to the second electron beam; and the second angle is different from the first angle.
9. 9 . An x-ray system comprising: a target; a first electron source configured to generate a first electron beam directed toward a first region of the target at a first angle perpendicular to a longitudinal axis of the target; a second electron source configured to generate a second electron beam directed toward a second region of the target at a second angle oblique to the longitudinal axis of the target; and a third electron source configured to generate a third electron beam directed toward the second region of the target at a third angle oblique to the longitudinal axis of the target, wherein: at least one of the second electron source or the third electron source is larger or smaller than the first electron source.
10. 10 . The x-ray system of claim 9 , further comprising a focusing electrode, wherein: the first electron source is configured to generate the first electron beam directed toward the target outside of the focusing electrode; and the second and third electron sources are configured to generate the second and third electron beams directed toward the target through the focusing electrode.
11. 11 . The x-ray system of claim 9 , wherein: the first electron source is configured to operate at a first maximum current; and the second and third electron sources are configured to operate at a second maximum current different from the first maximum current.
12. 12 . The x-ray system of claim 9 , wherein: the first region comprises a first surface angled at a first angle relative to the first electron beam and parallel to the longitudinal axis of the target; the second region comprises a second surface angled at a second angle relative to the second and third electron beams and parallel to the longitudinal axis of the target; and the second angle is different from the first angle.
13. 13 . The x-ray system of claim 9 , wherein a first material of the target in the first region is different from a second material of the target in the second region.
14. 14 . The x-ray system of claim 9 , wherein: the first electron source comprises a first type of electron emitter; and the second and third electron sources comprise a second type of electron emitter different from the first type of electron emitter.
15. 15 . The x-ray system of claim 9 , wherein: the first electron source is configured to direct the first electron beam towards a first focal spot on the target having a first area; the second electron source is configured to direct the second electron beam towards a second focal spot on the target having a second area; and the first area is different from the second area.
16. 16 . An x-ray source comprising: a target defining a first region with a first slope relative to a longitudinal axis of the target and a second region with a second slope different from the first slope relative to the longitudinal axis; a first electron source configured to generate a first electron beam in a first focal spot in the first region with a first area on the target; and a second electron source configured to generate a second electron beam in a second focal spot in the second region with a second area on the target, the second area being larger or smaller than the first area, the second area being spatially separated from overlapping the first area, wherein: the first slope is angled at a first angle relative to a first axis of the first electron beam; the second slope is angled at a second angle relative to a second axis of the second electron beam; and the second angle is closer to 90° than the first angle.
17. 17 . The x-ray source of claim 16 , wherein the second electron source and the second area are larger than the first electron source and the first area, respectively.
18. 18 . The x-ray source of claim 16 , wherein the second electron source is configured to generate the second electron beam with a lower maximum current than the first electron beam and the second area is smaller than the first area.
19. 19 . The x-ray source of claim 16 , wherein: the second area is larger than the first area.

Description

Stationary tomosynthesis may be performed using a multi-source x-ray tube. Such a multi-source x-ray tube may include multiple emitters, such as nanotube emitters. While tomosynthesis may be performed using a multi-source x-ray tube, the dose may be insufficient to perform certain higher dose two-dimensional (2D) imaging. BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS FIG. 1 is a block diagram of a system with multiple x-ray sources according to some embodiments. FIG. 2 is a block diagram of a system with multiple x-ray sources according to some other embodiments. FIGS. 3A-3B are block diagrams of a system with an x-ray source with multiple emitters according to some other embodiments. FIG. 4 is a block diagram of a system with an x-ray source including a smaller emitter according to some embodiments. FIG. 5 is a block diagram of a system with an x-ray source including a larger emitter according to some embodiments. FIG. 6A is a block diagram of a system with x-ray sources with a target with multiple regions according to some embodiments. FIG. 6B is a block diagram of regions of a target with different slopes according to some embodiments. FIG. 7 is a block diagram of a system with x-ray sources with a target with multiple regions with different cooling systems according to some embodiments. FIG. 8 is a block diagram of a system with x-ray sources with multiple vacuum enclosures according to some embodiments. FIG. 9 is a block diagram of an imaging system according to some embodiments. FIG. 10 is a block diagram of an imaging system according to some other embodiments. FIG. 11 is a flowchart of a technique of operating a system with multiple x-ray sources according to some embodiments. FIG. 12 is a block diagram of a system with multiple x-ray sources according to some embodiments. DETAILED DESCRIPTION Some embodiments relate to x-ray sources with multiple x-ray fluxes (representing different doses). Embodiments described herein may allow for tomosynthesis used in lower dose three-dimensional (3D) imaging (e.g., “3D” mammography) and either or both of higher dose two-dimensional (2D) imaging and magnification imaging. Different electron emitters—anode configurations may be used in an x-ray source with different x-ray fluxes appropriate for the different applications. FIG. 1 is a block diagram of a system with multiple x-ray sources according to some embodiments. The system 100a includes multiple x-ray sources 101a including emitters 102 and 104 and a target 106. The system 100a may include other components, electronics, vacuum enclosures, or the like; however, those are not illustrated for clarity. The emitters 102 and 104 may be any variety of emitters. For example, each of the emitters 102 and 104 may include a filament (e.g., coil filament emitter), a low work function (LWF) emitter, a field emitter, a dispenser cathode, a photo emitter, or the like. The emitters 102 and 104 may be the same or different types of emitters. For example, emitters 102 may be field emitters used in tomosynthesis while emitter 104 may be a filament used in 2D and/or magnification imaging. The target 106 is a structure configured to generate x-rays in response to incident electron beams such as electron beams 108 and 110. The target 106 may include materials such as tungsten (W), molybdenum (Mo), rhodium (Rh), silver (Ag), rhenium (Re), palladium (Pd), or the like. In some embodiments, the target 106 is a linear target where the target length is 2 times, 5 times, 10 times, 20, or 50 times the target width (or height) with a length:width (or length:height) aspect ratio. In some embodiments, the linear target may be flat or in a curve, such as a continuous curve, a piecewise-linear curve, a combination of such curves, or the like. In some embodiments, the electron beams 108 and 110 from each of the emitters 102 and 104 may strike a different sections or portions of the target 106. In some embodiments, the electron beams 108 and 110 from the emitters 102 and 104 may strike at least three, five, or ten different sections or portions of the target 106. In some embodiment, the x-rays emitted from the x-ray sources 101 may be directed towards a common location. For example, the x-ray source 101 may be oriented in a housing, gantry, or other structure such that the x-rays are directed towards a single point or region. When the system 100a is installed the point or region may be a location where an object, specimen, patient, or the like is placed. In some embodiments, the system may be mounted on a stationary structure or gantry. The placement and orientation of the x-ray source 101 may alleviate a need to rotate the system around an object, specimen, patient, or the like. The combination of an emitter 102 or 104 and the target 106 forms an x-ray source 101a. For example, x-ray source 101a-0 includes emitter 104 and the target 106. X-ray sources 101a-1 to 101a-n each includes the corresponding emitter 102-1 to 102-n and the target 1