US-12624447-B2 - Semiconductor process chamber with improved reflector

US12624447B2US 12624447 B2US12624447 B2US 12624447B2US-12624447-B2

Abstract

A substrate processing chamber for performing an epitaxial deposition process is provided. The chamber includes a substrate support having an upper surface, a reflector disposed above the substrate support. The reflector includes a body comprising an upper opening having a first diameter, a bottom opening having a second diameter less than the first diameter, and a flange protruding radially from an outer circumference of the body around the upper opening, wherein the flange comprises a plurality of holes. The chamber includes a plurality of heating elements disposed around the reflector, each heating element being operable to emit energy radiation, a plurality of support kits, each support kit comprising a bar member and a fastener removably coupled to the bar member, wherein the bar member and fastener are configured to secure to the respective hole in the flange so that the reflector is at a height that reduces blockage of the energy radiation and increases an amount of the energy radiation to be distributed across the upper surface of the substrate support. The chamber further includes a cooling plate coupled to the flange by the plurality of support kits, wherein the cooling plate comprises an opening sized to allow passage of the body of the reflector.

Inventors

Sou-Chuan CHIANG
Chia Hung Liu
Yen Chuang

Assignees

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Dates

Publication Date: 20260512
Application Date: 20220610

Claims (20)

1 . A substrate processing chamber for performing an epitaxial deposition process, comprising: a substrate support having an upper surface; a reflector disposed above the substrate support, comprising: a body, comprising: an upper opening having a first diameter; a bottom opening having a second diameter less than the first diameter; a sidewall surface extending between the upper opening and the bottom opening; a light opening extending through the body at the sidewall; and a flange protruding radially from an outer circumference of the body around the upper opening, wherein the flange comprises a plurality of holes, and the light opening is disposed at the sidewall extending between the bottom opening and the flange; and a tube integrated to the body, the tube having a first end terminating at the light opening and a second end terminating at an elevation higher than an upper surface of the flange; a plurality of heating elements disposed around the reflector, each heating element being operable to emit energy radiation; a plurality of support kits, each support kit comprising: a bar member; and a fastener removably coupled to the bar member, wherein the fastener is operatable to secure the bar member to the respective hole of the plurality of holes in the flange; and a cooling plate coupled to the flange by the plurality of support kits, wherein the cooling plate comprises an opening sized to allow passage of the body of the reflector.
2 . The substrate processing chamber of claim 1 , wherein an exterior surface of the body and a bottom surface of the flange define an angle greater than 90 degrees.
3 . The substrate processing chamber of claim 1 , wherein an exterior surface of the body and a bottom surface of the flange define an angle of about 90 degrees.
4 . The substrate processing chamber of claim 1 , wherein the bar member further comprises: a shank; a flange portion coupled to a first end of the shank; and a first thread portion coupled to a second end of the shank.
5 . The substrate processing chamber of claim 4 , wherein the bar member further comprises: a second thread portion disposed between the flange portion and a head portion of the bar member.
6 . The substrate processing chamber of claim 5 , wherein the shank has a first height and the head portion has a second height less than the first height.
7 . The substrate processing chamber of claim 4 , wherein the cooling plate has a plurality of thread holes each sized to receive the first thread portion of the bar member.
8 . The substrate processing chamber of claim 1 , wherein the fastener is a nut-like fastener.
9 . The substrate processing chamber of claim 1 , wherein the tube integrated to the body is formed of a quartz material.
10 . The substrate processing chamber of claim 9 , wherein the tube has an inner surface arranged to guide optical signals from the light opening to a sensor positioned above the flange.
11 . A substrate processing chamber, comprising: a first dome; a second dome; a substrate support disposed between the first and second domes; a reflector removably disposed over the first dome, the reflector comprising: a body having an upper opening and a bottom opening, and a sidewall surface between the upper opening and the bottom opening; a sensor light opening disposed at the sidewall surface; a flange protruding radially from an outer circumference of the body around the upper opening, the flange comprising a plurality of through holes, and the sensor light opening is disposed at the sidewall surface extending between the bottom opening and the flange; and a tube integrated to the body, the tube having a first end terminating at the sensor light opening and a second end terminating at an elevation higher than an upper surface of the flange; and a plurality of heating elements disposed over the first dome and around the reflector, wherein a vertical distance between the bottom of the body and the heating elements is less than about 50 mm.
12 . The substrate processing chamber of claim 11 , further comprising: a plurality of support kits, each support kit comprising: a bar member, comprising: a first thread portion; and a shank coupled to the first thread portion; and a first fastener removably coupled to the shank, wherein the shank and the first fastener are operable to secure the flange at a position between the shank and the first fastener.
13 . The substrate processing chamber of 12 , further comprising: a cooling plate, comprising: an opening sized to allow passage of the body of the reflector; and a plurality of threaded holes on the cooling plate, each threaded hole being configured to accommodate the first thread portion of the bar member.
14 . The substrate processing chamber of claim 11 , wherein the body has a truncated cone shape.
15 . The substrate processing chamber of claim 11 , wherein the sensor light opening is disposed between the bottom opening and the flange.
16 . A substrate processing chamber, comprising: a rotatable substrate support; a reflector removably disposed over the substrate support, the reflector comprising: a body having a first opening, a second opening having a diameter less than that of the first opening, and a sidewall surface extending at an angle from the first opening to the second opening; a flange extending radially from an outer circumference of the body; a light opening disposed at the sidewall surface which extends between the second opening and the flange; and a tube integrated to the body, the tube having a first end terminating at the light opening and a second end terminating at an elevation higher than an upper surface of the flange; and a cooling plate having an opening sized to allow the body of the reflector to pass through; and a plurality of support kits for securing the reflector, each support kit comprising: a bar member removably coupled to the cooling plate; and a fastener operable to secure the flange of the reflector to the bar member.
17 . The substrate processing chamber of claim 16 , further comprising: a light guide assembly removably disposed on the reflector, comprising: a cover plate comprising a plurality of holes each sized to allow a portion of the bar member to pass through; a central reflector; and a bridge member connecting the central reflector to the cover plate.
18 . The substrate processing chamber of claim 17 , wherein the cover plate further comprises: a first opening disposed at the center of the cover plate, the first opening being configured to receive the central reflector; and a second opening disposed at an edge of the cover plate.
19 . The substrate processing chamber of claim 18 , wherein the body has a bottom, and the bottom has a third opening aligned with the second opening.
20 . The substrate processing chamber of claim 19 , wherein the sidewall surface further comprises: a fourth opening; and a tube integrated to the fourth opening, wherein the tube, the fourth opening, and the second opening are aligned.

Description

BACKGROUND Semiconductor substrates are processed for a wide variety of applications, including the fabrication of integrated devices and microdevices. During processing, such as an epitaxial process, the substrate is positioned on a rotating susceptor within a process chamber. Precise process control over a heating source (e.g., heating lamps) allows the substrate to be heated within very strict tolerances. The temperature of the substrate can affect the uniformity of the material deposited on the substrate. Despite the precise control of heating the substrate, improvement in thickness uniformity across the substrate has not been entirely satisfactory. BRIEF DESCRIPTION OF THE DRAWINGS Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion. FIG. 1 is a schematic cross-sectional side view of a process chamber according to embodiments of the present disclosure. FIG. 2A schematically illustrates a perspective view of an inner reflector in accordance with some embodiments. FIG. 2B is a cross-sectional view of the inner reflector of FIG. 2A. FIG. 2C is a top view of the inner reflector of FIG. 2A. FIG. 3A is an exploded view of a light guide assembly in accordance with some embodiments. FIG. 3B is a cross-sectional view of the cover plate of FIG. 3A. FIGS. 3C and 3D are cross-sectional view and top view of the bridge member of FIG. 3A. FIG. 3E is a cross-sectional view of the central reflector of FIG. 3A. FIG. 4 is an exploded view of an inner reflector and a light guide assembly prior to securing to a cooling plate in accordance with some embodiments. FIG. 5A illustrates a cross-sectional view of a support kit in accordance with some embodiments. FIG. 5B is a perspective view of the support kit of FIG. 5A. FIG. 6A is a perspective view of a support kit in accordance with some embodiments. FIG. 6B is the perspective view of a bar member of FIG. 6A pairing with fasteners. FIG. 6C is a cross-sectional view of the bar member of FIG. 6A from a first viewing angle. FIG. 6D is a cross-sectional view of the bar member of FIG. 6A from a second viewing angle opposing the first viewing angle. FIG. 6E is a top view of the bar member of FIG. 6B. FIGS. 7A and 7B are perspective views of a support kit in accordance with some embodiments. FIG. 8A is a perspective view showing a portion of an inner reflector securing to a cooling plate through a support kit in accordance with some embodiments. FIG. 8B is a cross-sectional view of a bar member of FIG. 8A prior to assembly with a fastener. FIGS. 8C-8E illustrate various views of a bar member of FIG. 8B in accordance with some embodiments. FIGS. 8F-8I illustrate various views of a fastener of FIG. 8B in accordance with some embodiments. FIG. 9A is a perspective view of a support kit in accordance with some embodiments. FIG. 9B is a cross-sectional view of a bar member and a cap of FIG. 9A. FIG. 10A is a cross-sectional view of an inner reflector in accordance with some embodiments. FIG. 10B is a top view of the inner reflector of FIG. 10A. FIG. 11 illustrates a perspective view of a light guide assembly prior to securing to an inner reflector in accordance with some embodiments. FIG. 12 illustrates a perspective view of a light guide assembly prior to securing to an inner reflector in accordance with some embodiments. FIG. 13 a schematic cross-sectional side view of a process chamber employing an inner reflector and a support kit in accordance with some embodiments. DETAILED DESCRIPTION The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. Further, spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “over,” “on,” “top,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to anothe