US-12625430-B2 - Colored photosensitive resin composition and mutilayer cured film prepared therefrom

Abstract

The colored photosensitive resin composition of the present invention maintains excellent resolution, visibility, and the like while it has excellent reflectance R SCI measured by the SCI (specular component included) method, reflectance R SCE measured by the SCE (specular component excluded) method, and the ratio between them (R SCE /R SCI ), and has a uniform film thickness in an appropriate range. Thus, it can be formed into a multilayer cured film that simultaneously satisfies such physical properties as a high reflectance and a high light-shielding property. In addition, when a cured film is formed from the composition, it is possible to form a pattern on a multilayer film in a single development process. Thus, it can be advantageously used for a quantum dot display device.

Inventors

• Seung-Keun Kim
• Kyung-Jae Park

Assignees

• ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

Dates

Publication Date

20260512

Application Date

20231114

Priority Date

20201124

Claims (6)

1. 1 . A multilayer cured film, which comprises a first cured film formed from a first colored photosensitive resin composition and a second cured film formed from a second colored photosensitive resin composition, wherein the first colored photosensitive resin composition comprises (A1) a first copolymer; (B) a photopolymerizable compound; (C) a photopolymerization initiator; and (D1) a white pigment, the second colored photosensitive resin composition comprises (A2) a second copolymer; (B) a photopolymerizable compound; (C) a photopolymerization initiator; and (D2) a pigment other than white, wherein the pigment other than white (D2) is at least one selected from the group consisting of a yellow pigment, a violet pigment, a red pigment, an orange pigment, and a blue pigment, wherein the pigment other than white (D2) is employed in an amount of 5 to 10 parts by weight relative to 100 parts by weight of the second copolymer (A2) (on the basis of the solids content), the multilayer cured film has a total thickness of 6 μm or more, and wherein the reflectance R SCI measured by the SCI (specular component included) method and the reflectance R SCE measured by the SCE (specular component excluded) method for the multilayer cured film satisfy the following relationships, respectively: 50%≤ R SCI (Relationship 1) 40%≤ R SCE (Relationship 2) 50%≤ R SCE /R SCI (Relationship 3).
2. 2 . The multilayer cured film of claim 1 , wherein the first cured film and the second cured film have a thickness of 10 μm or less, respectively.
3. 3 . The multilayer cured film of claim 2 , wherein the second cured film is composed of multiple layers.
4. 4 . The multilayer cured film of claim 3 , wherein the second cured film is composed of 2 to 10 layers.
5. 5 . The multilayer cured film of claim 1 , wherein the multilayer cured film has a total thickness of 6 μm to 20 μm.
6. 6 . The multilayer cured film of claim 1 , wherein the multilayer cured film is used as a structure of quantum dot barrier ribs.

Description

CLAIM OF BENEFIT OF PRIOR APPLICATION This is a divisional application of U.S. patent application Ser. No. 17/529,008, filed Nov. 17, 2021, which is the Convention Filing of KR10-2020-0159138, filed Nov. 24, 2020 and KR 10-2021-0129605, filed Sep. 30, 2021, all of which are incorporated by reference herein in their entirety. TECHNICAL FIELD The present invention relates to a colored photosensitive resin composition having excellent light-shielding property and reflectance to be applicable as quantum dot barrier ribs and to a multilayer cured film for quantum dot barrier ribs prepared from the composition. BACKGROUND ART In recent years, interest in various electronic devices employing quantum dots (QDs) has increased. Quantum dots are a material that produces an effect of quantum confinement as a nanocrystal of a semiconductor material having a diameter of approximately 10 nm or less. Although they are composed of hundreds of thousands of electrons or more, most electrons are firmly bound to the atomic nucleus, so that the number of free electrons that are not bound is limited to about 1 to 100. In such an event, the energy level of the electrons is discontinuously limited to show electrical and optical characteristics different from those of a semiconductor in a bulk state that forms a continuous band. These quantum dots can produce various colors by generating light wavelengths of different lengths for each particle size even without a change in the material type. Since they have the advantages of high color purity and light safety as compared with conventional light emitters, they are currently used in various fields such as displays, solar cells, biosensors, and lighting, and are drawing attention as a next-generation light emitting device. FIG. 1 is a schematic view for illustrating a typical quantum dot device. Referring to FIG. 1, the substrate structure (100) of the quantum dot device comprises a transparent substrate (110) and barrier ribs (120) formed to partition the area on the substrate (110). Different quantum dot solutions, that is, a first quantum dot solution (130), a second quantum dot solution (140), and a third quantum dot solution (150) are present in the respective partitioned areas. The first quantum dot solution (130), the second quantum dot solution (140), and the third quantum dot solution (150) are composed of quantum dots having different energy levels. That is, they are configured to have different emission wavelength bands as the size or material of the quantum dots is manipulated. In general, the barrier ribs (120) among the above may be formed as a cured film from a photosensitive resin composition. The barrier ribs (120) should function as a partition separation (or blocking) so that the compositions of respective colors discharged to the partitioned areas are prevented from being mixed. In addition, they should be capable of preventing deterioration in contrast and color purity caused by light leakage from light sources such as colored OLEDs. Accordingly, in recent years, a cured film having the performance of high reflectance and high light-shielding properties is required. In addition, in order to be applied to a quantum dot device, it is necessary to accomplish a uniform film and an appropriate film thickness to maintain excellent resolution. For example, if the film is not uniform or the film thickness is too small, it is not suitable for barrier ribs, so that the quantum dot solution may overflow the barrier ribs, resulting in mixing of colors or deterioration in the resolution due to poor color purity. If the film thickness is adjusted by coating a photosensitive resin composition thick and curing it in order to solve this problem, it is difficult to accomplish uniform coating, whereby there is a problem that stains or contamination may be generated. PRIOR ART DOCUMENT Patent Document (Patent Document 1) Japanese Patent No. 6318699 DETAILED DESCRIPTION OF THE INVENTION Technical Problem An object of the present invention is to provide a colored photosensitive resin composition having a high light-shielding property and a high reflectance while the resolution and pattern characteristics are maintained to be excellent and a multilayer cured film prepared from the same. Solution to the Problem The present invention provides a colored photosensitive resin composition, which comprises (A) a copolymer; (B) a photopolymerizable compound; (C) a photopolymerization initiator; and (D) a pigment, wherein when the copolymer (A) comprises a first copolymer (A1), the pigment (D) comprises a white pigment (D1), when the copolymer (A) comprises a second copolymer (A2), the pigment (D) comprises a pigment other than white (D2), the first copolymer (A1) comprises (a1) a structural unit derived from an ethylenically unsaturated carboxylic acid, an ethylenically unsaturated carboxylic anhydride, or a combination thereof; (a2) a structural unit derived from an ethylenically unsaturated co