US-12625436-B2 - Lithography apparatus

Abstract

A lithography apparatus comprises a wafer stage, a cable configured to be bent as the wafer stage moves, a first support configured to prevent the cable from sagging, and to support the cable to maintain a bent state of the cable when the cable moves, a first rail installed on a first side of the cable, and including curved track extending in a direction from a lower portion of the cable toward an upper portion of the cable, wherein the first rail includes a concave first surface, a second rail installed on a second side of the cable opposite the first side of the cable, and including curved track extending in the direction from the lower portion of the cable toward the upper portion of the cable, wherein the second rail includes a concave second surface.

Inventors

• Sung Yong BAE
• Hyeon Jin Kim
• Jeong-gil Kim
• Kyoung Hwan OH
• Dong Jin Lee

Assignees

• SAMSUNG ELECTRONICS CO., LTD.

Dates

Publication Date

20260512

Application Date

20240628

Priority Date

20231013

Claims (20)

1. 1 . A lithography apparatus comprising: a wafer stage; a cable connected to the wafer stage; a first support supporting the cable; a first rail installed on a first side of the cable, and including a curved track extending in a direction from a lower portion of the cable toward an upper portion of the cable, wherein the first rail includes a concave first surface; a second rail installed on a second side of the cable opposite the first side of the cable, and including a curved track extending in the direction from the lower portion of the cable toward the upper portion of the cable, wherein the second rail includes a concave second surface; a first wheel configured to roll along the first surface of the first rail, wherein the first wheel includes a first N pole area and a first S pole area, wherein a surface of the first wheel facing the first surface of the first rail has a curvature; a second wheel configured to roll along the second surface of the second rail, wherein the second wheel includes a second N pole area and a second S pole area, wherein a surface of the second wheel facing the second surface of the second rail has a curvature; a first sliding member, wherein the first wheel is mounted on the first sliding member, and is connected to the first support through a first bracket on a side surface of the first sliding member; and a second sliding member, wherein the second wheel is mounted on the second sliding member and is connected to the first support through a second bracket on a side surface of the second sliding member, wherein the first surface of the first rail includes: a first magnetic area; a second magnetic area spaced apart from the first magnetic area; and a third magnetic area between the first magnetic area and the second magnetic area, wherein the third magnetic area includes: a third S pole area vertically overlapping the first N pole area of the first wheel; and a third N pole area vertically overlapping the first S pole area of the first wheel, wherein the second surface of the second rail includes: a fourth magnetic area; a fifth magnetic area spaced apart from the fourth magnetic area; and a sixth magnetic area between the fourth magnetic area and the fifth magnetic area, wherein the sixth magnetic area includes: a fourth S pole area vertically overlapping the second N pole area of the second wheel; and a fourth N pole area vertically overlapping the second S pole area of the second wheel.
2. 2 . The lithography apparatus of claim 1 , wherein when the first wheel rolls along the first surface of the first rail, the first magnetic area and the second magnetic area are positioned such that a spacing between the first magnetic area and the first N pole area of the first wheel is smaller than a spacing between the second magnetic area and the first N pole area of the first wheel, wherein the first magnetic area has N-pole magnetism.
3. 3 . The lithography apparatus of claim 2 , wherein when the first wheel rolls along the first surface of the first rail, the first magnetic area and the second magnetic area are positioned such that a spacing between the second magnetic area and the first S pole area of the first wheel is smaller than a spacing between the first magnetic area and the first S pole area of the first wheel, wherein the second magnetic area has S-pole magnetism.
4. 4 . The lithography apparatus of claim 1 , wherein a curvature of the first surface of the first rail is equal to or less than the curvature of the surface of the first wheel facing the first surface of the first rail.
5. 5 . The lithography apparatus of claim 4 , wherein a curvature of the second surface of the second rail is equal to or less than the curvature of the surface of the second wheel facing the second surface of the second rail.
6. 6 . The lithography apparatus of claim 1 , wherein the first rail is spaced apart from the first side of the cable by a first spacing, wherein the second rail is spaced apart from the second side of the cable by a second spacing, wherein the first and second rails are arranged parallel to each other, wherein the lithography apparatus further comprises: a third rail spaced apart from the first side of the cable by a third spacing greater than the first spacing; a fourth rail spaced apart from the second side of the cable by a fourth spacing greater than the second spacing; and a second support configured to prevent the cable from sagging, wherein when the cable moves, the second support is spaced apart from the first support and supports the cable to maintain a bent state of the cable.
7. 7 . The lithography apparatus of claim 6 , wherein the third rail includes a curved track extending in a direction from the lower portion of the cable toward the upper portion of the cable and a concave third surface, wherein the fourth rail includes a curved track extending in a direction from the lower portion of the cable toward the upper portion of the cable and a concave fourth surface.
8. 8 . The lithography apparatus of claim 7 , wherein the third surface includes a seventh magnetic area and an eighth magnetic area having different polarities, and a ninth magnetic area between the seventh magnetic area and the eighth magnetic area.
9. 9 . The lithography apparatus of claim 8 , wherein the ninth magnetic area includes a fifth N-pole area and a fifth S-pole area, wherein one of the seventh magnetic area and the eighth magnetic area closer to the fifth N-pole area has S-pole magnetism, while the other of the seventh magnetic area and the eighth magnetic area closer to the fifth S-pole area has N-pole magnetism.
10. 10 . The lithography apparatus of claim 7 , further comprising: a third sliding member, wherein a third wheel configured to roll along the third surface of the third rail is mounted on the third sliding member; and a fourth sliding member, wherein a fourth wheel configured to roll along the fourth surface of the fourth rail is mounted on the fourth sliding member, wherein the third wheel includes a surface facing the third surface of the third rail and having a curvature equal to or greater than a curvature of the third surface of the third rail, wherein the fourth wheel includes a surface facing the fourth surface of the fourth rail and having a curvature equal to or greater than a curvature of the fourth surface of the fourth rail.
11. 11 . The lithography apparatus of claim 10 , wherein the third surface of the third rail includes a seventh magnetic area on a center area of the third surface, wherein the seventh magnetic area longitudinally extends in a longitudinal direction of the third rail, wherein the seventh magnetic area includes a fifth N-pole area and a fifth S-pole area arranged side by side and each extending in the longitudinal direction of the third rail, wherein the third wheel includes a sixth N pole area and a sixth S pole area, wherein when the third wheel rolls along the third surface of the third rail, the sixth N pole area contacts the fifth S pole area, and the sixth S pole area contacts the fifth N pole area.
12. 12 . The lithography apparatus of claim 11 , wherein the third surface of the third rail further includes an eighth magnetic area and a ninth magnetic area spaced apart from each other and each extending in the longitudinal direction of the third rail, wherein the seventh magnetic area is between the eighth magnetic area and the ninth magnetic area, wherein the eighth magnetic area and the ninth magnetic area have different polarities.
13. 13 . A lithography apparatus comprising: a wafer stage; a cable configured to move while maintaining a bent state thereof as the wafer stage moves; a first support coupled to the cable and configured to support the cable by moving on the cable as the cable moves; a first rail disposed on a first side of the cable and including a first track curved along a direction in which the cable is bent; a second rail disposed on a second side of the cable opposite the first side of the cable and including a second track curved along a direction in which the cable is bent, wherein the first and second rails are arranged parallel to each other; a first sliding member configured to move along a first surface of the first rail, wherein the first sliding member includes a first body, and a first wheel and a second wheel respectively disposed at both opposing ends of the first body; a second sliding member configured to move along a second surface of the second rail, wherein the second sliding member includes a second body, and a third wheel and a fourth wheel respectively disposed at both opposing ends of the second body; a first bracket mounted on a side surface of the first body and connects the first sliding member and the first support to each other; and a second bracket mounted on a side surface of the second body and connects the second sliding member and the first support to each other, wherein the first surface longitudinally extends in a longitudinal direction of the first rail and includes a first magnetic area on a center area of the first surface, wherein the second surface longitudinally extends in a longitudinal direction of the second rail and includes a second magnetic area on a center area of the second surface, wherein each of the first surface and the second surface is concave in an inner area thereof, wherein each of the first to fourth wheels include a convex side surface, wherein the side surface of each of the first to fourth wheels includes a first area and a second area arranged side by side and extending along a circumference of each of the first to fourth wheels, wherein the first area and the second area have different magnetic polarities.
14. 14 . The lithography apparatus of claim 13 , wherein the side surface of each of the first and second wheels has a shape in which a central portion thereof protrudes from each of both opposing edge portions thereof.
15. 15 . The lithography apparatus of claim 14 , wherein a curvature of the side surface of each of the first and second wheels is equal to or greater than a curvature of the first surface.
16. 16 . The lithography apparatus of claim 13 , wherein the first magnetic area includes a first N pole area and a first S pole area longitudinally extending in the longitudinal direction of the first rail and arranged side by side in a direction intersecting the longitudinal direction of the first rail, wherein when each of the first and second wheels rolls along the first rail, the first area of each of the first and second wheels rolls on the first S pole area, while the second area of each of the first and second wheels rolls on the first N pole area, wherein the first area has N-pole magnetism, and the second area has S-pole magnetism.
17. 17 . The lithography apparatus of claim 16 , wherein the first surface further includes a third magnetic area and a fourth magnetic area longitudinally extending in the longitudinal direction of the first rail and spaced apart from each other, wherein the first magnetic area is disposed between the third magnetic area and the fourth magnetic area, wherein the third magnetic area is disposed adjacent to the first N pole area, and the fourth magnetic area is disposed adjacent to the first S pole area, wherein the third magnetic area has S-pole magnetism, and the fourth magnetic area has N-pole magnetism.
18. 18 . A lithography apparatus comprising: a wafer stage; a first cable connected to the wafer stage and configured to be bent as the wafer stage moves in a first direction; a second cable disposed under the first cable and configured to be bent as the wafer stage moves in a second direction intersecting the first direction; a first support supporting the second cable and configured to prevent the second cable from sagging; a first rail disposed on a first side of the second cable and including a first track curved along a direction in which the second cable is bent, wherein the first rail includes a concave first surface; a second rail disposed on a second side of the second cable opposite the first side of the second cable and including a second track curved along a direction in which the second cable is bent, wherein the first and second rails are arranged in parallel with each other, wherein the second rail includes a concave second surface, a first sliding member configured to move along the first surface of the first rail, wherein the first sliding member includes a first body, and a first wheel and a second wheel respectively disposed at both opposing ends of the first body, wherein each of the first wheel and the second wheel includes a convex surface facing the first surface of the first rail, wherein the first sliding member further includes a first bracket connecting the first body and the first support to each other; and a second sliding member configured to move along the second surface of the second rail, wherein the second sliding member includes a second body, and a third wheel and a fourth wheel respectively disposed at both opposing ends of the second body, wherein each of the third wheel and the fourth wheel includes a convex surface facing the second surface of the second rail, wherein the second sliding member further includes a second bracket connecting the second body and the first support to each other, wherein the first surface includes a first N pole area and a first S pole area longitudinally extending in a longitudinal direction of the first rail, and arranged side by side in a center area of the first surface, wherein the second surface includes a second N pole area and a second S pole area longitudinally extending in a longitudinal direction of the second rail, and arranged side by side in a center area of the second surface, wherein each of the first to fourth wheels includes a first area and a second area extending along a circumference thereof and arranged side by side, wherein the first area and the second area have different magnetic polarities, wherein when each of the first and second wheels rolls along the first surface of the first rail, the first area of each of the first and second wheels contacts the first S pole area, and the second area of each of the first and second wheels contacts the first N pole area, wherein when each of the third and fourth wheels rolls along the second surface of the second rail, the first area of each of the third and fourth wheels contacts the second S pole area, and the second area of each of the third and fourth wheels contacts the second N pole area, wherein the first area has N-pole magnetism, and the second area has S-pole magnetism.
19. 19 . The lithography apparatus of claim 18 , further comprising: a second support spaced apart from the first support and configured to prevent the second cable from sagging when the second cable moves in the second direction; a third rail disposed on the first side of the second cable and including a third track curved along a direction in which the second cable is bent, wherein the third rail includes a concave third surface; a fourth rail disposed on a second side of the second cable opposite the first side of the second cable and including a fourth track curved along the direction in which the second cable is bent, wherein the third and fourth rails are arranged side by side, wherein the fourth rail includes a concave fourth surface; a third sliding member configured to move along the third surface of the third rail, wherein the third sliding member includes a third body, and fifth and sixth wheels respectively disposed at both opposing ends of the third body, wherein each of the fifth and sixth wheels includes a convex surface facing the third surface of the third rail, wherein the third sliding member further includes a third bracket connecting the third body and the second support to each other; and a fourth sliding member configured to move along the fourth surface of the fourth rail, wherein the fourth sliding member includes a fourth body, and a seventh wheel and an eighth wheel respectively disposed at both opposing ends of the fourth body, wherein each of the seventh wheel and the eighth wheel includes a convex surface facing the fourth surface of the fourth rail, wherein the fourth sliding member further includes a fourth bracket connecting the fourth body and the second support to each other, wherein the third surface includes a third N pole area and a third S pole area longitudinally extending in a longitudinal direction of the third rail, and arranged side by side in a center area of the third surface, wherein the fourth surface includes a fourth N pole area and a fourth S pole area longitudinally extending in a longitudinal direction of the fourth rail, and arranged side by side in a center area of the fourth surface, wherein each of the fifth to eighth wheels includes a third area and a fourth area arranged side by side and extending along a circumference thereof, wherein the third area and the fourth area have different magnetic polarities, wherein when each of the fifth and sixth wheels rolls along the third surface of the third rail, the third area of each of the fifth and sixth wheels contacts the third S pole area, and the fourth area of each of the fifth and sixth wheels contacts the third N pole area, wherein when each of the seventh and eighth wheels rolls along the fourth surface of the fourth rail, the third area of each of the seventh and eighth wheels contacts the fourth S pole area, and the fourth area of each of the seventh and eighth wheels contacts the fourth N pole area, wherein the third area has N-pole magnetism, and the fourth area has S-pole magnetism.
20. 20 . The lithography apparatus of claim 18 , wherein the first surface further includes a first magnetic area and a second magnetic area longitudinally extending in the longitudinal direction of the first rail, and spaced apart from each other, wherein the first N pole area and the first S pole area are disposed between the first magnetic area and the second magnetic area, wherein the first magnetic area is disposed adjacent to the first N pole area, and the second magnetic area is disposed adjacent to the first S pole area, wherein the first magnetic area has S-pole magnetism, and the second magnetic area has N-pole magnetism.

Description

CROSS-REFERENCE TO RELATED APPLICATION This application claims priority to Korean Patent Application No. 10-2023-0136658 filed on Oct. 13, 2023 in the Korean Intellectual Property Office, and all the benefits accruing therefrom under 35 U.S.C. 119, the contents of which in its entirety are herein incorporated by reference. BACKGROUND Technical Field The present disclosure relates to a lithography apparatus, specifically a photolithography apparatus, and more specifically, to a photolithography apparatus using extreme ultraviolet (EUV). Description of Related Art EUV lithography provides finer pattern resolution than conventional optical lithography (UV lithography) and thus is currently considered a candidate for next-generation lithography. Increasing the resolution using the EUV lithography stems from a fact that the conventional optical lithography is performed using a wavelength in a range of 150 to 250 nm, whereas the EUV lithography is performed using a wavelength in a range of 11 to 15 nm. In general, the shorter the wavelength of the light used for pattern imaging in lithography is, the finer the resolution obtained is. An EUV lithography apparatus needs to move a mask and a wafer, such as a semiconductor wafer, to form a pattern. The mask or the wafer moves on a stage. Particles may be produced due to collision or abrasion between units connected to each other during an operation of the stage. These particles contaminate the wafer and cause decrease in yield. Therefore, a lithography apparatus that reduces the production of the particles during the operation of the stage is desirable. SUMMARY Embodiments of the present invention provide a lithography apparatus in which particle production is reduced, and a product yield is increased. The benefits of the present invention are not limited to the above-mentioned examples. Other advantages according to the present invention that are not mentioned may be understood based on following descriptions, and may be more clearly understood based on embodiments according to the present disclosure. Further, it will be easily understood that the purposes and advantages according to the present disclosure may be realized using means shown in the claims or combinations thereof. According to an aspect of the present disclosure, there is provided a lithography apparatus comprising a wafer stage, a cable connected to the wafer stage, a first support supporting the cable, a first rail installed on a first side of the cable, and including a curved track extending in a direction from a lower portion of the cable toward an upper portion of the cable, wherein the first rail includes a concave first surface, a second rail installed on a second side of the cable opposite the first side of cable, and including curved track extending in the direction from the lower portion of the cable toward the upper portion of the cable, wherein the second rail includes a concave second surface, a first wheel configured to roll along the first surface of the first rail, wherein the first wheel includes a first N pole area and a first S pole area, wherein a surface of the first wheel facing the first surface of the first rail has a curvature, a second wheel configured to roll along the second surface of the second rail, wherein the second wheel includes a second N pole area and a second S pole area, wherein a surface of the second wheel facing the second surface of the second rail has a curvature, a first sliding member, wherein the first wheel is mounted on the first sliding member, and is connected to the first support through a first bracket on a side surface of the first sliding member, and a second sliding member, wherein the second wheel is mounted on the second sliding member and is connected to the first support through a second bracket on a side surface of the second sliding member, wherein the first surface of the first rail includes a first magnetic area, a second magnetic area spaced apart from the first magnetic area, and a third magnetic area between the first magnetic area and the second magnetic area, wherein the third magnetic area includes a third S pole area vertically overlapping the first N pole area of the first wheel, and a third N pole area vertically overlapping the first S pole area of the first wheel, wherein the second surface of the second rail includes a fourth magnetic area, a fifth magnetic area spaced apart from the fourth magnetic area, and a sixth magnetic area between the fourth magnetic area and the fifth magnetic area, wherein the sixth magnetic area includes a fourth S pole area vertically overlapping the second N pole area of the second wheel, and a fourth N pole area vertically overlapping the second S pole area of the second wheel. According to an aspect of the present disclosure, there is provided a lithography apparatus comprising a wafer stage, a cable configured to move while maintaining a bent state thereof as the wafer stage moves, a first suppo