US-12628601-B2 - Filter structure and substrate treating system including filter structure

Abstract

A filter structure includes a housing having an inlet and an outlet; a first filter embedded in the housing and including a polymer membrane for filtering a first fluid flowing from the inlet into the housing; and a second filter embedded in the housing, filtering a second fluid filtered by the first filter, and including mesoporous silica nanoparticles (MSN).

Inventors

• Yunho Kim
• Heechul PARK
• Hyunwoo Kim
• Yigil CHO
• Jaeeun SONG
• Jinhyeok Jang

Assignees

• SAMSUNG ELECTRONICS CO., LTD.

Dates

Publication Date

20260512

Application Date

20221213

Priority Date

20220125

Claims (20)

1. 1 . A filter structure, comprising: a housing having an inlet and an outlet; a first filter in the housing and including a polymer membrane for filtering a first fluid flowing from the inlet into the housing; and a second filter in the housing, filtering a second fluid filtered by the first filter, and including mesoporous silica nanoparticles (MSN), wherein the second filter includes a tube having a non-linear flow path.
2. 2 . The filter structure of claim 1 , wherein a third fluid filtered by the second filter is discharged through the outlet of the housing.
3. 3 . The filter structure of claim 1 , wherein mesoporous silica nanoparticles included in the second filter have a particle size of about 50 nm to about 500 nm, and a pore size of about 5 nm to about 20 nm.
4. 4 . The filter structure of claim 1 , wherein a surface area per unit weight of mesoporous silica nanoparticles included in the second filter is about 500 m 2 /g to about 1400 m 2 /g.
5. 5 . The filter structure of claim 1 , wherein mesoporous silica nanoparticles included in the second filter include a functional group on a surface thereof.
6. 6 . The filter structure of claim 5 , wherein the functional group includes one or more of a thiol group and an amine group.
7. 7 . The filter structure of claim 1 , wherein the tube having a non-linear flow path is filled with the mesoporous silica nanoparticles.
8. 8 . The filter structure of claim 7 , wherein a membrane or a syringe filter having a pore size smaller than a particle size of mesoporous silica nanoparticles is included on at least both ends of the tube having a non-linear flow path.
9. 9 . The filter structure of claim 1 , wherein the second filter includes a porous support and a thin film provided on the porous support, and wherein the thin film includes mesoporous silica nanoparticles of about 50 wt % to about 80 wt % based on a total weight of the thin film.
10. 10 . The filter structure of claim 9 , wherein the thin film is provided on both surfaces of the porous support.
11. 11 . The filter structure of claim 9 , wherein a thickness of the thin film is about 200 nm to about 500 nm.
12. 12 . The filter structure of claim 9 , wherein mesoporous silica nanoparticles included in the thin film have a particle size of about 50 nm to about 200 nm, and have a pore size of about 10 nm to about 20 nm.
13. 13 . The filter structure of claim 9 , wherein the porous support includes polysulfone, and wherein the thin film includes polyamide.
14. 14 . A substrate treating system, comprising: a process chamber performing a semiconductor process on a substrate; a supply source supplying fluid to the process chamber; and a filter structure disposed between the supply source and the process chamber, wherein the filter structure includes: a first filter primarily filtering a first fluid supplied from the supply source and including a polymer membrane; and a second filter secondarily filtering a second fluid filtered by the first filter and including mesoporous silica nanoparticles having a functional group on a surface thereof, wherein the second filter includes a tube having a non-linear flow path.
15. 15 . The substrate treating system of claim 14 , wherein the second filter removes one or more of metals, organic molecules, chemical dyes and oils included in the second fluid.
16. 16 . The substrate treating system of claim 14 , wherein mesoporous silica nanoparticles include one or more functional groups of a thiol group and an amine group on a surface thereof.
17. 17 . The substrate treating system of claim 14 , wherein the first filter includes one or more of ultra-high-molecular-weight polyethylene (UPE), high-density polyethylene (HDPE), polytetrafluoroethylene (PTFE) and nylon.
18. 18 . A filter structure, comprising: a first filter filtering fluid and including a polymer membrane; and a second filter filtering fluid passing through the first filter, wherein the second filter includes mesoporous silica nanoparticles having a particle size of about 50 nm to about 500 nm and a pore size of about 5 nm to about 20 nm and including one or more of functional groups of a thiol group and an amine group on a surface thereof, and wherein the second filter includes a tube having a non-linear flow path.
19. 19 . The filter structure of claim 18 , wherein the first filter and the second filter are connected to each other in series.
20. 20 . The filter structure of claim 18 , further comprising: a third filter connected to the first filter in series and including mesoporous silica nanoparticles, wherein the first filter filters fluid filtered by the third filter.

Description

CROSS-REFERENCE TO RELATED APPLICATION(S) This application claims benefit of priority to Korean Patent Application No. 10-2022-0010487 filed on Jan. 25, 2022 in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference in its entirety. BACKGROUND Example embodiments of the present disclosure relate to a filter structure and a substrate treating system including a filter structure. Generally, semiconductor manufacturing facilities may include a fabrication process for forming an electrical circuit on a silicon wafer used as a semiconductor substrate. In the fabrication process, a plurality of unit processes such as deposition, photolithography, etching, and cleaning processes may be performed. As sizes of substrates have decreased, it may be necessary to strictly control contaminants included in chemical materials used in each unit process. SUMMARY An example embodiment of the present disclosure is to provide a filter structure which may effectively remove contaminants included in chemical materials injected into a semiconductor process chamber and may not impede a flow of chemical materials. An example embodiment of the present disclosure is to provide a substrate treating system including a filter structure which may effectively remove contaminants. According to an example embodiment of the present disclosure, a filter structure includes a housing having an inlet and an outlet; a first filter embedded in the housing and including a polymer membrane for filtering a first fluid flowing from the inlet into the housing; and a second filter embedded in the housing, filtering a second fluid filtered by the first filter, and including mesoporous silica nanoparticles (MSN). According to an example embodiment of the present disclosure, a substrate treating system includes a process chamber performing a semiconductor process on a substrate; a supply source supplying fluid to the process chamber; and a filter structure disposed between the supply source 20 and the process chamber, wherein the filter structure includes a first filter primarily filtering a first fluid supplied from the supply source and including a polymer membrane; and a second filter secondarily filtering a second fluid filtered by the first filter and including mesoporous silica nanoparticles having a functional group on a surface thereof. According to an example embodiment of the present disclosure, a filter structure includes a first filter filtering fluid and including a polymer membrane; and a second filter filtering fluid passing through the first filter, wherein the second filter includes mesoporous silica nanoparticles having a particle size of about 50 nm to about 500 nm and a pore size of about 5 nm to about 20 nm and including one or more of functional groups of a thiol group and an amine group on a surface thereof. BRIEF DESCRIPTION OF DRAWINGS The above and other aspects, features, and advantages of the present disclosure will be more clearly understood from the following detailed description, taken in combination with the accompanying drawings, in which: FIG. 1 is a diagram illustrating a substrate treating system according to an example embodiment of the present disclosure; FIG. 2A is a perspective diagram illustrating a filter structure according to an example embodiment of the present disclosure; FIG. 2B is a cross-sectional diagram illustrating a filter structure according to an example embodiment of the present disclosure; FIG. 3A is a perspective diagram illustrating a filter according to an example embodiment of the present disclosure; FIGS. 3B and 3C are enlarged diagrams illustrating a portion of a filter according to an example embodiment of the present disclosure; FIG. 4 is an enlarged diagram illustrating a portion of a filter according to an example embodiment of the present disclosure; FIG. 5 is a cross-sectional diagram illustrating a filter structure according to an example embodiment of the present disclosure; FIG. 6A is a perspective diagram illustrating a filter structure according to an example embodiment of the present disclosure; FIG. 6B is an enlarged diagram illustrating a portion of a filter according to an example embodiment of the present disclosure; FIG. 7 is an enlarged diagram illustrating a portion of a filter according to an example embodiment of the present disclosure; FIG. 8 is a cross-sectional diagram illustrating a filter structure according to an example embodiment of the present disclosure; FIGS. 9A and 9B are diagrams illustrating a method of manufacturing mesoporous silica nanoparticles according to an example embodiment of the present disclosure; and FIG. 10 is a diagram illustrating a method of manufacturing mesoporous silica nanoparticles. DETAILED DESCRIPTION Hereinafter, embodiments of the present disclosure will be described as follows with reference to the accompanying drawings. A substrate treating system 1 will be described according to an examp