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US-20260124646-A1 - STONE CLEANER AND SEMICONDUCTOR FABRICATING APPARATUS COMPRISING THE SAME

US20260124646A1US 20260124646 A1US20260124646 A1US 20260124646A1US-20260124646-A1

Abstract

There is provided a stone cleaner includes a main body including a guide recess; a handle configured to move up and down along the guide recess; and a cleaning unit installed on a lower surface of the main body, including a cleaning stone, wherein a plurality of guide pins are installed in the guide recess of the main body, and an elastic body is installed in at least one of the plurality of guide pins, a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, when the handle is pressed downward, the guide pin is inserted along an extension direction of the guide hole, and the elastic body is compressed so that a repulsive force of the elastic body adjusts a pressing force of the handle.

Inventors

  • Dong Hyun Kim
  • Won Bae JO
  • Sun Ho Kim
  • Chang Ju YUN
  • Yong Joo Cho

Assignees

  • SAMSUNG ELECTRONICS CO., LTD.

Dates

Publication Date
20260507
Application Date
20251031
Priority Date
20241104

Claims (20)

  1. 1 . A stone cleaner comprising: a main body including a guide recess; a handle configured to move up and down along the guide recess; and a cleaning unit installed on a lower surface of the main body, and including a cleaning stone, wherein a plurality of guide pins are installed in the guide recess of the main body, and an elastic body is installed in at least one of the plurality of guide pins, wherein a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, wherein when the handle is pressed downward, each of the guide pins is inserted along an extension direction of a corresponding one of the guide holes, and the elastic body is compressed so that a repulsive force of the elastic body adjusts a pressing force of the handle.
  2. 2 . The stone cleaner of claim 1 , wherein a first guide hole of the plurality of guide holes passes through the handle, and a first guide pin of the plurality of guide pins corresponds to the first guide hole, wherein when the handle is pressed downward by a predetermined depth or more, the first guide pin completely passes through the first guide hole so that a tip of the first guide pin is exposed to the outside of the handle.
  3. 3 . The stone cleaner of claim 2 , wherein the handle further includes a knob for a worker to grasp with a finger, and wherein a second guide hole of the plurality of guide holes is formed to overlap the knob.
  4. 4 . The stone cleaner of claim 1 , wherein the main body includes an outer wall and an inner wall, which define the guide recess, and wherein the guide pins are more protruded upward than the inner wall.
  5. 5 . The stone cleaner of claim 1 , further comprising: a first central hole passing through the main body and having a first inner diameter; a second central hole passing through the handle and having a second inner diameter; and a screw passing through the first central hole and the second central hole, wherein a thread of the screw is coupled to a first inner thread installed on an inner wall of the first central hole.
  6. 6 . The stone cleaner of claim 1 , wherein the cleaning unit includes: a chuck; an installation groove formed below the chuck; a magnet seated in the installation groove; and a holder holding the chuck and the magnet, and wherein a bottom surface of the holder is made of metal, and the magnet and the bottom surface of the holder are fixed by a magnetic force.
  7. 7 . The stone cleaner of claim 6 , wherein the main body further includes a first central hole having a first inner diameter, wherein the cleaning unit further includes a fastening unit installed to be protruded from an upper portion of the chuck, and wherein a thread of the fastening unit is configured to be coupled to a second inner thread installed on an inner wall of the first central hole.
  8. 8 . The stone cleaner of claim 1 , wherein the main body includes an outer wall and an inner wall, which define the guide recess, and is provided with a cleaner fluid supply flow path passing through the outer wall, wherein a ring guard is installed along an outer sidewall of the main body, and wherein a cleaner fluid is supplied through the cleaner fluid supply flow path, and is provided to a space between the ring guard and the cleaning stone.
  9. 9 . The stone cleaner of claim 1 , wherein a plurality of pressure sensors are installed on an upper surface of the handle, and overlap the plurality of guide holes, and wherein the stone cleaner further comprising a pusher for adjusting a pressure applied to the handle in accordance with a sensing value measured from the plurality of pressure sensors.
  10. 10 . The stone cleaner of claim 1 , wherein the elastic body includes a coil spring.
  11. 11 . The stone cleaner of claim 1 , wherein each of the plurality of guide holes is provided with an oil-less bush.
  12. 12 . The stone cleaner of claim 1 , further comprising a ring guard installed along an outer sidewall of the main body.
  13. 13 . The stone cleaner of claim 12 , wherein a lower end surface of the ring guard is higher than a bottom surface of the cleaning stone.
  14. 14 . A stone cleaner comprising: a main body including a guide recess; a handle configured to move up and down along the guide recess, including a knob for a worker to grasp with a finger; and a cleaning unit installed on a lower surface of the main body, and including a cleaning stone, wherein the main body includes an outer wall and an inner wall, which define the guide recess, wherein a plurality of guide pins are installed in the guide recess of the main body, the plurality of guide pins are more protruded upward than the inner wall, and a coil spring is installed in at least one of the plurality of guide pins, wherein a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, wherein the plurality of guide holes include a first guide hole and a second guide hole, the first guide hole passes through the handle without overlapping the knob, the second guide hole overlaps the knob, and the plurality of guide pins include a first guide pin corresponding to the first guide hole and a second guide pin corresponding to the second guide hole, and wherein when the handle is pressed downward by a predetermined depth or more, the first guide pin completely passes through the first guide hole so that a tip of the first guide pin is exposed to the outside of the handle.
  15. 15 . The stone cleaner of claim 14 , further comprising: a first central hole passing through the main body and having a first inner diameter; a second central hole passing through the handle and having a second inner diameter; and a screw passing through the first central hole and the second central hole, wherein a thread of the screw is coupled to a first inner thread installed on an inner wall of the first central hole, wherein the cleaning unit further includes a chuck and a fastening unit installed to be protruded from an upper portion of the chuck, and wherein a thread of the fastening unit is configured to be coupled to a second inner thread installed on the inner wall of the first central hole.
  16. 16 . The stone cleaner of claim 14 , further comprising: a ring guard installed along an outer sidewall of the main body, wherein a lower end surface of the ring guard is higher than a lower end surface of the cleaning stone.
  17. 17 . The stone cleaner of claim 16 , wherein the ring guard is disposed to be spaced apart from the cleaning stone.
  18. 18 . A semiconductor manufacturing device comprising: a wafer table provided with a plurality of burls formed on a surface; a stone cleaner configured to clean the wafer table; and a controller configured to control the stone cleaner, wherein the stone cleaner includes: a main body including a guide recess; a handle configured to move up and down along the guide recess; and a cleaning unit installed on a lower surface of the main body, including a cleaning stone, wherein a plurality of guide pins are installed in the guide recess of the main body, and an elastic body is installed in at least one of the plurality of guide pins, wherein a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, and wherein when the handle is pressed downward, the plurality of guide pins are inserted along an extension direction of the plurality of guide holes, respectively, and the elastic body is compressed so that a repulsive force of the elastic body adjusts a pressing force of the handle.
  19. 19 . The semiconductor manufacturing device of claim 18 , wherein the stone cleaner further includes: a plurality of pressure sensors installed on an upper surface of the handle and overlapped with the plurality of guide holes; and a pusher configured to apply a pressure to the handle, and wherein the controller adjusts the pressure applied to the handle in accordance with a sensing value measured from the plurality of pressure sensors.
  20. 20 . The semiconductor manufacturing device of claim 18 , wherein the main body further includes a cleaner fluid supply flow path, wherein a ring guard is installed along an outer sidewall of the main body, and wherein a cleaner fluid is supplied through the cleaner fluid supply flow path, and is provided to a space between the ring guard and the cleaning stone.

Description

CROSS-REFERENCE TO RELATED APPLICATION This application claims priority under 35 U.S.C. § 119 from Korean Patent Application No. 10-2024-0154205, filed Nov. 4, 2025, in the Korean Intellectual Property Office, and all the benefits accruing therefrom under 35 U.S.C. 119, the contents of which in its entirety are herein incorporated by reference. BACKGROUND Technical Field The present disclosure relates to a stone cleaner and a semiconductor fabricating apparatus comprising the same. Description of the Related Art An exposure device projects a mask pattern (i.e., design layout) onto a sensitive material (i.e., resist) formed on a wafer. For the exposure of fine patterns, the exposure device may adopt, for example, a Deep Ultra-Violet (DUV) light source. In this case, in order to stably fix a wafer, the wafer may be fixed onto a wafer table in a vacuum manner. On the wafer table, a plurality of burls are installed to be spaced apart from each other at predetermined intervals, and a height of each burl may be tens to hundreds of um. Heights of the plurality of burls are managed in accordance with a predetermined specification (i.e., flatness management). In this case, warpage of the wafer may be prevented, and defocus is not generated in an exposure process. Meanwhile, while the exposure process is being performed, the wafer table is exposed to various kinds of chemical/physical stresses, and deposits may be accumulated on the burls. These deposits inhibit the flatness. SUMMARY An object of the present disclosure is to provide a stone cleaner capable of stably cleaning a wafer table. Another object of the present disclosure is to provide a semiconductor fabricating apparatus comprising a stone cleaner capable of stably cleaning a wafer table. The objects of the present disclosure are not limited to those mentioned above and additional objects of the present disclosure, which are not mentioned herein, will be clearly understood by those skilled in the art from the following description of the present disclosure. According to an aspect of the present disclosure, there is provided a stone cleaner comprises a main body including a guide recess; a handle configured to move up and down along the guide recess; and a cleaning unit installed on a lower surface of the main body, and including a cleaning stone, wherein a plurality of guide pins are installed in the guide recess of the main body, and an elastic body is installed in at least one of the plurality of guide pins, a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, when the handle is pressed downward, the guide pin is inserted along an extension direction of the guide hole, and the elastic body is compressed so that a repulsive force of the elastic body adjusts a pressing force of the handle. According to another aspect of the present disclosure, there is provided a stone cleaner comprising a main body including a guide recess, a handle configured to move up and down along the guide recess, including a knob for a worker to grasp with a finger, and a cleaning unit installed on a lower surface of the main body, and including a cleaning stone, wherein the main body includes an outer wall and an inner wall, which define the guide recess, a plurality of guide pins are installed in the guide recess of the main body, the plurality of guide pins are more protruded upward than the inner wall, and a coil spring is installed in at least one of the plurality of guide pins, a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, the plurality of guide holes include a first guide hole and a second guide hole, the first guide hole passes through the handle without overlapping the knob, the second guide hole overlaps the knob, and the plurality of guide pins include a first guide pin corresponding to the first guide hole and a second guide pin corresponding to the second guide hole, when the handle is pressed downward by a predetermined depth or more, the first guide pin completely passes through the first guide hole so that a tip of the first guide pin is exposed to the outside of the handle. According to an aspect of the present disclosure, there is provided a semiconductor manufacturing device comprising a wafer table provided with a plurality of burls formed on a surface, a stone cleaner configured to clean the wafer table, and a controller controlling the stone cleaner, wherein the stone cleaner includes a main body including a guide recess, a handle configured to move up and down along the guide recess, and a cleaning unit installed on a lower surface of the main body, including a cleaning stone, a plurality of guide pins are installed in the guide recess of the main body, and an elastic body is installed in at least one of the plurality of guide pins, a plurality of guide holes corresponding to the plurality of guide pins are installed in the handle, and when the handle is pres