US-20260125793-A1 - METHODS AND APPARATUS FOR FLOW DISTRIBUTION

US20260125793A1US 20260125793 A1US20260125793 A1US 20260125793A1US-20260125793-A1

Abstract

Various embodiments of the present technology may provide a spacer plate with a groove and an inlet aperture in fluid communication with the groove, a flow distribution ring disposed within the groove, wherein the flow distribution ring has a plurality of apertures, and a top ring disposed above the spacer plate and the flow distribution ring.

Inventors

Jereld Lee Winkler
Ankit Kimtee

Assignees

ASM IP HOLDING B.V.

Dates

Publication Date: 20260507
Application Date: 20251031

Claims (20)

1 . An apparatus, comprising: a spacer plate comprising: a groove; and an inlet aperture in fluid communication with the groove; a flow distribution ring disposed within the groove, wherein the flow distribution ring comprises a plurality of apertures; and a top ring disposed above the spacer plate and flow distribution ring.
2 . The apparatus according to claim 1 , wherein the plurality of apertures of the flow distribution ring are vertically oriented and in fluid communication with the groove.
3 . The apparatus according to claim 1 , wherein the groove is arranged within a top surface of the spacer plate.
4 . The apparatus according to claim 1 , wherein the groove is annular.
5 . The apparatus according to claim 1 , wherein the inlet aperture is arranged horizontally and coupled to a gas line.
6 . The apparatus according to claim 1 , wherein the top ring comprises a lip that extends radially inward.
7 . The apparatus according to claim 6 , wherein the lip is separated from the spacer place by a gap.
8 . The apparatus according to claim 1 , wherein the spacer plate comprises a lip that extends radially inward and overlaps with an outer edge of a support assembly.
9 . The apparatus according to claim 1 , wherein: the spacer plate is formed from at least one of aluminum, nickel, stainless steel, and titanium; and the flow distribution ring is formed from at least one of aluminum, nickel, stainless steel, and titanium.
10 . The apparatus according to claim 1 , wherein the top ring is formed from at least one of ceramic and quartz.
11 . A reactor, comprising: a lower chamber; a showerhead disposed above the lower chamber; a spacer plate disposed between the lower chamber and the showerhead, wherein the spacer plate comprises: an annular groove within a top surface of the spacer plate; an inlet aperture; and a first lip that extends radially inwards; a flow distribution ring disposed within the annular groove and comprising a plurality of apertures in fluid communication with the inlet aperture; a support assembly disposed within the reaction chamber, wherein the first lip of the spacer plate overlaps with an outer edge of susceptor support assembly; and a top ring coupled to the top surface of the spacer plate.
12 . The reactor according to claim 11 , wherein the inlet aperture is arranged horizontally and coupled to an inlet port arranged on an outer surface of the reaction chamber.
13 . The reactor according to claim 11 , wherein the top ring comprises a second lip that extends radially inward.
14 . The reactor according to claim 11 , wherein the second lip of the top ring is separated from the spacer place by a first gap.
15 . The reactor according to claim 11 , further comprising a seal disposed between the first lip of the spacer plate and the outer edge of the susceptor support assembly.
16 . The reactor according to claim 11 , wherein the second lip of the top ring is separated from the susceptor support assembly by a second gap, wherein the second gap is arranged as an annular ring.
17 . A system, comprising: a reactor comprising: a lower chamber; a showerhead disposed above the lower chamber; a spacer plate disposed between the lower chamber and the showerhead, wherein the spacer plate comprises: an annular groove within a top surface of the spacer plate; an inlet aperture; and a first lip that extends radially inwards; a flow distribution ring disposed within the annular groove and comprising a plurality of apertures in fluid communication with the inlet aperture; a susceptor support assembly disposed within the reaction chamber, wherein the first lip of the spacer plate overlaps with an outer edge of susceptor support assembly; and a top ring coupled to the top surface of the spacer plate; a gas line coupled to the inlet aperture, wherein the gas line comprises a first pipe section and a second pipe section, wherein the first and second pipe sections are in parallel with each other; and a pressure control device upstream from the first and second pipe sections.
18 . The system according to claim 17 , further comprising a first valve disposed in line with the first pipe section and a second valve disposed within the second pipe section.
19 . The system according to claim 17 , wherein the gas line is further coupled to an inert gas source.
20 . The system according to claim 17 , further comprising a controller in communication with and configured to operate the first and second valves.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS This application is a nonprovisional of, and claims priority to and the benefit of, U.S. Provisional Patent Application No. 63/716,445, filed Nov. 5, 2024 and entitled “METHODS AND APPARATUS FOR FLOW DISTRIBUTION,” which is hereby incorporated by reference herein. FIELD OF INVENTION The present disclosure generally relates to a method and apparatus for flow distribution. More particularly, the present disclosure relates to a flow distribution ring disposed within the spacer plate to provide a gas curtain around the susceptor. BACKGROUND OF THE TECHNOLOGY Reaction chambers used in semiconductor manufacturing may contain spaces or volumes that need purging with an inert gas to prevent chemicals from depositing in those areas. Deposition of chemicals in these spaces may result in contamination of the reaction space and/or impair the functionality of parts within the reaction chamber. SUMMARY OF THE INVENTION Various embodiments of the present technology may provide a spacer plate with a groove and an inlet aperture in fluid communication with the groove, a flow distribution ring disposed within the groove, wherein the flow distribution ring has a plurality of apertures, and a top ring disposed above the spacer plate and the flow distribution ring. According to one aspect, an apparatus comprises: a spacer plate comprising: a groove; and an inlet aperture in fluid communication with the groove; a flow distribution ring disposed within the groove, wherein the flow distribution ring comprises a plurality of apertures; and a top ring disposed above the spacer plate and flow distribution ring. In one embodiment, the plurality of apertures of the flow distribution ring are vertically oriented and in fluid communication with the groove. In one embodiment, the groove is arranged within a top surface of the spacer plate. In one embodiment, the groove is annular. In one embodiment, the inlet aperture is arranged horizontally and coupled to a gas line. In one embodiment, the top ring comprises a lip that extends radially inward. In one embodiment, the lip is separated from the spacer place by a gap. In one embodiment, the spacer plate comprises a lip that extends radially inward and overlaps with an outer edge of a support assembly. In one embodiment, the spacer plate is formed from at least one of aluminum, nickel, stainless steel, and titanium; and the flow distribution ring is formed from at least one of aluminum, nickel, stainless steel, and titanium. In one embodiment, the top ring is formed from at least one of ceramic and quartz. According to another aspect, a reactor comprises: a lower chamber; a showerhead disposed above the lower chamber; a spacer plate disposed between the lower chamber and the showerhead, wherein the spacer plate comprises: an annular groove within a top surface of the spacer plate; an inlet aperture; and a first lip that extends radially inwards; a flow distribution ring disposed within the annular groove and comprising a plurality of apertures in fluid communication with the inlet aperture; a support assembly disposed within the reaction chamber, wherein the first lip of the spacer plate overlaps with an outer edge of susceptor support assembly; and a top ring coupled to the top surface of the spacer plate. In one embodiment, the inlet aperture is arranged horizontally and coupled to an inlet port arranged on an outer surface of the reaction chamber. In one embodiment, the top ring comprises a second lip that extends radially inward. In one embodiment, the second lip of the top ring is separated from the spacer place by a first gap. In one embodiment, the apparatus further comprises a seal disposed between the first lip of the spacer plate and the outer edge of the susceptor support assembly. In one embodiment, the second lip of the top ring is separated from the susceptor support assembly by a second gap, wherein the second gap is arranged as an annular ring. According to yet another aspect, a system comprises: a reactor comprising: a lower chamber; a showerhead disposed above the lower chamber; a spacer plate disposed between the lower chamber and the showerhead, wherein the spacer plate comprises: an annular groove within a top surface of the spacer plate; an inlet aperture; and a first lip that extends radially inwards; a flow distribution ring disposed within the annular groove and comprising a plurality of apertures in fluid communication with the inlet aperture; a susceptor support assembly disposed within the reaction chamber, wherein the first lip of the spacer plate overlaps with an outer edge of susceptor support assembly; and a top ring coupled to the top surface of the spacer plate; a gas line coupled to the inlet aperture, wherein the gas line comprises a first pipe section and a second pipe section, wherein the first and second pipe sections are in parallel with each other; and a pressure control device upstream from the first and second