US-20260126349-A1 - INFORMATION PROCESSING APPARATUS AND MACHINE DIFFERENCE ANALYSIS METHOD

US20260126349A1US 20260126349 A1US20260126349 A1US 20260126349A1US-20260126349-A1

Abstract

An information processing apparatus includes an acquisition unit that acquires sensor data of a sensor that detects a state of each of a plurality of substrate processing apparatuses executing an identical process including a plurality of steps, a determination unit that determines a normalization coefficient of a summary value of the sensor data for each sensor and each step based on the sensor data for each execution of the process, a normalization processing unit that performs a normalization processing of the summary value for each sensor and each step using the normalization coefficient, an analysis unit that analyzes a machine difference of the substrate processing apparatuses based on the summary value after the normalization processing, and a display control unit that displays an analyzed result on a display.

Inventors

Atsushi Shigenobu
Huizhen BU
Toshiyuki Fukumoto

Assignees

TOKYO ELECTRON LIMITED

Dates

Publication Date: 20260507
Application Date: 20251027
Priority Date: 20241107

Claims (7)

1 . An information processing apparatus comprising: acquisition circuitry configured to acquire sensor data of a sensor that detects a state of each of a plurality of substrate processing apparatuses executing an identical process including a plurality of steps; determination circuitry configured to determine a normalization coefficient of a summary value of the sensor data for each sensor and each step based on the sensor data for each execution of the process; normalization processing circuitry configured to perform a normalization processing of the summary value for each sensor and each step using the normalization coefficient; analysis circuitry configured to analyze a machine difference of the plurality of substrate processing apparatuses based on the summary value after the normalization processing; and display control circuitry configured to display an analyzed result on a display.
2 . The information processing apparatus according to claim 1 , wherein the determination circuitry calculate, from a plurality of datasets including the sensor data having a number of executions of the process equal to or greater than a specific value, a standard deviation of the summary value of the sensor data for each sensor and each step included in the datasets, select a maximum standard deviation from the calculated standard deviation, and then determine the maximum standard deviation as the normalization coefficient.
3 . The information processing apparatus according to claim 2 , wherein the determination circuitry determine a value greater of the maximum standard deviation or a minimum resolution, as the normalization coefficient.
4 . The information processing apparatus according to claim 1 , wherein the determination circuitry determine a standard deviation calculated by a weighted average of a number of executions of the process in a variance of the summary value of the sensor data for each sensor and each step included in a plurality of datasets satisfying a condition, as the normalization coefficient.
5 . The information processing apparatus according to claim 1 , wherein the summary value of the sensor data is a statistical quantity converted from the sensor data for each sensor and step.
6 . The information processing apparatus according to claim 1 , wherein the analysis circuitry perform dimensionality reduction of a data space of the summary value after the normalization processing by principal component analysis, and analyze the machine difference of the plurality of substrate processing apparatuses based on a magnitude of a distances of the summary value in the data space after the dimensionality reduction.
7 . A machine difference analysis method comprising: acquiring sensor data of a sensor that detects a state of each of a plurality of substrate processing apparatuses executing an identical process including a plurality of steps; determining a normalization coefficient of a summary value of the sensor data for each sensor and each step based on the sensor data for each execution of the process; performing a normalization processing of the summary value for each sensor and each step using the normalization coefficient; analyzing a machine difference of the plurality of substrate processing apparatuses based on the summary value after the normalization processing; and displaying an analyzed result on a display.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS This application is based on and claims priority from Japanese Patent Application No. 2024-194952, filed on Nov. 7, 2024, with the Japan Patent Office, the disclosure of which is incorporated herein in its entirety by reference. TECHNICAL FIELD The present disclosure relates to an information processing apparatus and a machine difference analysis method. BACKGROUND In the related art, analysis of machine differences of substrate processing apparatuses has been performed, for example, by an expert having knowledge of the substrate processing apparatuses, who first narrows down analysis target sensors from sensors of the substrate processing apparatuses, and then checks sensor data of the analysis target sensors. Japanese Patent Laid-Open Publication No. 2022-168572 proposes a technique in which, even when the power supplied to a heater is kept the same, a difference arises in the temperature profile due to a machine difference, which is an individual difference among apparatuses, and therefore, the target temperature used for the control of the heater is corrected to absorb the machine difference, thereby achieving uniformity of the temperature profile. SUMMARY An aspect of the present disclosure is an information processing apparatus that analyzes a machine difference of a plurality of substrate processing apparatuses, including an acquisition unit that acquires sensor data of a sensor that detects a state of each of a plurality of substrate processing apparatuses executing an identical process including a plurality of steps, a determination unit that determines a normalization coefficient of a summary value of the sensor data for each sensor and each step based on the sensor data for each execution of the process, a normalization processing unit that performs a normalization processing of the summary value for each sensor and each step using the normalization coefficient, an analysis unit that analyzes the machine difference of the plurality of substrate processing apparatuses based on the summary value after the normalization processing, and a display control unit that displays an analyzed result. The foregoing summary is illustrative only and is not intended to be in any way limiting. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features will become apparent by reference to the drawings and the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a configuration diagram illustrating an example of a substrate processing system 1 according to the present embodiment. FIG. 2 is a hardware configuration diagram illustrating an example of a computer. FIG. 3 is a functional block diagram illustrating an example of a server apparatus 16 according to the present embodiment. FIG. 4 is a flowchart illustrating an example of a machine difference analysis method according to the present embodiment. FIGS. 5A to 5C are diagrams illustrating an example of a recipe and sensor data. FIG. 6 is a flowchart illustrating one example of processing in step S14. FIGS. 7A and 7B are explanatory diagrams illustrating an example of processing in step S14. FIG. 8 is a flowchart illustrating another example of processing in step S14. FIGS. 9A and 9B are explanatory diagrams illustrating the other example of processing in step S14. DETAILED DESCRIPTION In the following detailed description, reference is made to the accompanying drawings, which form a part hereof. The illustrative embodiments described in the detailed description, drawings, and claims are not meant to be limiting. Other embodiments may be utilized, and other changes may be made without departing from the spirit or scope of the subject matter presented here. Hereinafter, embodiments for carrying out the present disclosure will be described with reference to the drawings. <System Configuration> FIG. 1 is a configuration diagram illustrating an example of a substrate processing system 1 according to the present embodiment. The substrate processing system 1 illustrated in FIG. 1 includes a substrate processing apparatus 10, an apparatus controller 12, a sensor 14, a server apparatus 16, and an operator terminal 18. The substrate processing apparatus 10, the apparatus controller 12, and the sensor 14 are installed in a manufacturing plant 2. The server apparatus 16 and the operator terminal 18 may be installed either within or outside the manufacturing plant 2. The operator terminal 18 is an information processing terminal operated by an operator such as an apparatus manager or an analysis manager of the substrate processing apparatus 10 installed in the manufacturing plant 2. The operator terminal 18 may be, for example, a personal computer (PC) or a smartphone. The substrate processing apparatus 10, the apparatus controller 12, the sensor 14, the server apparatus 16, and the operator terminal 18 are connected in a communicable manner via