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US-20260126569-A1 - OPTICAL LENS ASSEMBLY, IMAGING APPARATUS AND ELECTRONIC DEVICE

US20260126569A1US 20260126569 A1US20260126569 A1US 20260126569A1US-20260126569-A1

Abstract

An optical lens assembly includes at least one optical lens element and at least one optical element. At least one surface of the at least one optical lens element or the at least one optical element includes a low reflection layer, and the low reflection layer includes a rough layer, a nanocrystalline particle and a hydrophobic layer. The nanocrystalline particle is disposed between the rough layer and the hydrophobic layer, and the hydrophobic layer is farther away from the surface of the at least one optical lens element or the at least one optical element than the nanocrystalline particle. A material of the nanocrystalline particle at least includes SiO 2 .

Inventors

  • Wen-Yu Tsai
  • Cheng-Yu Tsai
  • Chun-Hung Teng

Assignees

  • LARGAN PRECISION CO., LTD.

Dates

Publication Date
20260507
Application Date
20260105

Claims (19)

  1. 1 . An optical lens assembly, comprising: at least one optical lens element; and at least one optical element; wherein at least one surface of the at least one optical lens element or the at least one optical element comprises a low reflection layer, the low reflection layer comprises a rough layer, a nanocrystalline particle and a hydrophobic layer, the nanocrystalline particle is disposed between the rough layer and the hydrophobic layer, and the hydrophobic layer is farther away from the surface of the at least one optical lens element or the at least one optical element than the nanocrystalline particle; wherein a material of the nanocrystalline particle at least comprises SiO 2 ; wherein a height of the nanocrystalline particle is Tc, and the following condition is satisfied: 200 ⁢ nm < T ⁢ c < 700 ⁢ nm .
  2. 2 . The optical lens assembly of claim 1 , wherein the nanocrystalline particle is a multi-layer structure, and the nanocrystalline particle comprises at least one high refractive index layer and at least one low refractive index layer; wherein the at least one high refractive index layer and the at least one low refractive index layer are arranged by alternately, the at least one low refractive index layer is closer to the hydrophobic layer than the at least one high refractive index layer, and a main material of the at least one low refractive index layer is SiO 2 .
  3. 3 . The optical lens assembly of claim 2 , wherein an average diameter of the nanocrystalline particle is DC, and the following condition is satisfied: 200 ⁢ nm ⁢ < D ⁢ C < 8 ⁢ 0 ⁢ 0 ⁢ nm .
  4. 4 . The optical lens assembly of claim 3 , wherein the average diameter of the nanocrystalline particle is DC, and the following condition is satisfied: 200 ⁢ nm < D ⁢ C < 400 ⁢ nm .
  5. 5 . The optical lens assembly of claim 3 , wherein the height of the nanocrystalline particle is Tc, and the following condition is satisfied: 200 ⁢ nm < T ⁢ c < 600 ⁢ nm .
  6. 6 . The optical lens assembly of claim 5 , wherein a reflectance in a wavelength range of 400 nm-1000 nm of the surface comprising the low reflection layer is R40100, and the following condition is satisfied: 0 ⁢ % < R ⁢ 40100 ≤ 1.5 % .
  7. 7 . The optical lens assembly of claim 5 , wherein a reflectance in a wavelength range of 400 nm-700 nm of the surface comprising the low reflection layer is R4070, and the following condition is satisfied: 0 ⁢ % < R ⁢ 4070 ≤ 1.5 % .
  8. 8 . The optical lens assembly of claim 7 , wherein a reflectance in a wavelength range of 500 nm-700 nm of the surface comprising the low reflection layer is R5070, and the following condition is satisfied: 0 ⁢ % < R ⁢ 5070 ≤ 1.5 % .
  9. 9 . An imaging apparatus, comprising: an optical lens assembly; and at least one carrier; wherein at least one surface of the optical lens assembly or the at least one carrier comprises a low reflection layer, the low reflection layer comprises a rough layer, a nanocrystalline particle and a hydrophobic layer, the nanocrystalline particle is disposed between the rough layer and the hydrophobic layer; wherein an average diameter of the nanocrystalline particle is DC, a height of the nanocrystalline particle is Tc, and the following conditions are satisfied: 200 ⁢ nm < DC < 600 ⁢ nm ; and 200 ⁢ nm < Tc .
  10. 10 . The imaging apparatus of claim 9 , wherein the hydrophobic layer is farther away from the surface of the optical lens assembly or the at least one carrier than the nanocrystalline particle.
  11. 11 . The imaging apparatus of claim 10 , wherein the nanocrystalline particle is a multi-layer structure, and the nanocrystalline particle comprises at least one high refractive index layer and at least one low refractive index layer; wherein the at least one high refractive index layer and the at least one low refractive index layer are arranged by alternately, the at least one low refractive index layer is closer to the hydrophobic layer than the at least one high refractive index layer, and a main material of the at least one low refractive index layer is SiO 2 .
  12. 12 . The imaging apparatus of claim 9 , wherein a material of the hydrophobic layer is selected from at least one polyurethane compound, a polyimide compound, an organosilane compound, a fluoroalkane compound, a fluoroalkenyl ether polymer, a fluorosilane compound and a fluoroacrylate compound.
  13. 13 . The imaging apparatus of claim 11 , wherein the average diameter of the nanocrystalline particle is DC, and the following condition is satisfied: 200 ⁢ nm < DC < 400 ⁢ nm .
  14. 14 . The imaging apparatus of claim 13 , wherein the average diameter of the nanocrystalline particle is DC, and the following condition is satisfied: 200 ⁢ nm < D ⁢ C ≤ 301.2 nm .
  15. 15 . The imaging apparatus of claim 13 , wherein the height of the nanocrystalline particle is Tc, and the following condition is satisfied: 200 ⁢ nm < T ⁢ c < 600 ⁢ nm .
  16. 16 . The imaging apparatus of claim 12 , wherein a reflectance in a wavelength range of 400 nm-1000 nm of the surface comprising the low reflection layer is R40100, and the following condition is satisfied: 0 ⁢ % < R ⁢ 40100 ≤ 1.5 % .
  17. 17 . The imaging apparatus of claim 16 , wherein a reflectance in a wavelength range of 400 nm-700 nm of the surface comprising the low reflection layer is R4070, and the following condition is satisfied: 0 ⁢ % < R ⁢ 4070 ≤ 1.5 % .
  18. 18 . The imaging apparatus of claim 17 , wherein a reflectance in a wavelength range of 700 nm-1000 nm of the surface comprising the low reflection layer is R70100, and the following condition is satisfied: 0 ⁢ % < R ⁢ 70100 ≤ 1.6 % .
  19. 19 . An electronic device, comprising: the imaging apparatus of claim 9 .

Description

RELATED APPLICATIONS This application is a continuation of U.S. application Ser. No. 18/187,744, filed Mar. 22, 2023, which claims priority to U.S. Provisional Application Ser. No. 63/322,667 filed Mar. 23, 2022, which is herein incorporated by reference. BACKGROUND Technical Field The present disclosure relates to an optical lens assembly, an imaging apparatus and an electronic device. More particularly, the present disclosure relates to an optical lens assembly, an imaging apparatus and an electronic device including an optical lens element or an optical element, and the surfaces of the optical lens element or the optical element include a low reflection layer. Description of Related Art In recent years, it has become more and more popular to use a miniature optical lens assembly of a mobile device for photographing. However, the performance of the mobile device is often affected by strong sunlight in the outdoor environment, resulting in that the image quality of the optical lens assembly is greatly reduced by strong non-imaging stray lights. In the prior arts, a surface of the opaque optical elements of the optical lens assembly is treated by the ink-painting method, the sandblasting method and the coating method so as to reduce the reflectance thereof and eliminate the stray light. However, although the image quality of the optical lens assembly can be enhanced by the aforementioned treatments, the high-intensity stray light still cannot be eliminated effectively. Further, in the field of the optical lens assembly applied in the non-mobile devices, there are other methods used to reduce the reflectance. For example, a porous microstructure can be formed by etching the surface of the film on the optical lens assembly, but the structural support of the porous microstructure is insufficient, so that the film-layer surface is easy to deform when an external force is applied thereon, and the anti-reflection effect thereof will be greatly reduced. Moreover, although most of the prior arts can achieve a better anti-reflection effect by a multi-layer coating method, the multi-layer preparing process is complicated, and the cost of the coating is high, making it impossible to be widely used in the field of the optical lens assembly. SUMMARY According to one aspect of the present disclosure, an optical lens assembly includes at least one optical lens element and at least one optical element. At least one surface of the at least one optical lens element or the at least one optical element includes a low reflection layer, and the low reflection layer includes a rough layer, a nanocrystalline particle and a hydrophobic layer. The nanocrystalline particle is disposed between the rough layer and the hydrophobic layer, and the hydrophobic layer is farther away from the surface of the at least one optical lens element or the at least one optical element than the nanocrystalline particle. A material of the nanocrystalline particle at least includes SiO2. When an average diameter of the nanocrystalline particle is DC, the following condition is satisfied: 200 nm<DC<1000 nm. According to one aspect of the present disclosure, an imaging apparatus includes an optical lens assembly and at least one carrier. At least one surface of the optical lens assembly or the at least one carrier includes a low reflection layer, and the low reflection layer includes a rough layer, a nanocrystalline particle and a hydrophobic layer. The nanocrystalline particle is disposed between the rough layer and the hydrophobic layer, and the hydrophobic layer is farther away from the surface of the optical lens assembly or the at least one carrier than the nanocrystalline particle. A material of the nanocrystalline particle at least includes SiO2. When an average diameter of the nanocrystalline particle is DC, the following condition is satisfied: 200 nm<DC. According to one aspect of the present disclosure, an electronic device includes the imaging apparatus according to the aforementioned aspect. According to one aspect of the present disclosure, a low reflection layer includes a rough layer, a nanocrystalline particle and a hydrophobic layer. The nanocrystalline particle is disposed between the rough layer and the hydrophobic layer. When an average diameter of the nanocrystalline particle is DC, and a reflectance in a wavelength range of 400 nm-1000 nm of a surface including the low reflection layer is R40100, the following conditions are satisfied: 200 nm<DC<1000 nm; and 0%<R40100≤2.4%. BRIEF DESCRIPTION OF THE DRAWINGS The present disclosure can be more fully understood by reading the following detailed description of the embodiment, with reference made to the accompanying drawings as follows: FIG. 1 is a surface diagram of a substrate according to Comparative example 1. FIG. 2 is a relationship diagram between the reflectance and the wavelengths of a surface including a reflection layer of Comparative example 1. FIG. 3 is a relationship diagra