US-20260130155-A1 - FLUID CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS

Abstract

A fluid control device that controls a fluid supplied into a process container includes: a flow path block; and a fluid controller installed to the flow path block. The flow path block includes: a gas supply flow path including an inlet, through which the fluid is introduced, and an outlet through which the fluid flows into the process container; and a storage chamber that stores the fluid in the gas supply flow path between the inlet and the outlet. The fluid controller includes: a first valve that opens and closes the gas supply flow path between the inlet and the storage chamber; and a second valve that opens and closes the gas supply flow path between the storage chamber and the outlet.

Inventors

• Takashi Yoshida

Assignees

• TOKYO ELECTRON LIMITED

Dates

Publication Date

20260507

Application Date

20251219

Priority Date

20230331

Claims (14)

1. 1 . A fluid control device that controls a fluid supplied into a process container, the fluid control device comprising: a flow path block; and a fluid controller installed to the flow path block, wherein the flow path block includes: a gas supply flow path including an inlet, through which the fluid is introduced, and an outlet through which the fluid flows into the process container; and a storage chamber that stores the fluid in the gas supply flow path between the inlet and the outlet, and wherein the fluid controller includes: a first valve that opens and closes the gas supply flow path between the inlet and the storage chamber; a second valve that opens and closes the gas supply flow path between the storage chamber and the outlet; and a pressure sensor that detects an internal pressure of the storage chamber, wherein the storage chamber has a volume larger than a volume of the gas supply flow path.
2. 2 . The fluid control device of claim 1 , wherein the flow path block includes an exhaust flow path connected to the storage chamber, and wherein the fluid controller includes a third valve that opens and closes the exhaust flow path.
3. 3 . The fluid control device of claim 2 , wherein the first valve, the third valve, and the second valve are arranged in a row in this order from the inlet to the outlet.
4. 4 . The fluid control device of claim 3 , wherein the exhaust flow path has an exhaust port provided on a surface of the flow path block where the inlet is provided.
5. 5 . The fluid control device of claim 2 , wherein the exhaust flow path has an exhaust port provided on a surface of the flow path block where the inlet is provided.
6. 6 . The fluid control device of claim 1 , wherein the pressure sensor is provided on a surface of the flow path block where the inlet is provided.
7. 7 . The fluid control device of claim 1 , wherein the fluid controller includes a heater provided in an interior of the flow path block.
8. 8 . A substrate processing apparatus comprising: a process container; and a fluid control device that controls a fluid supplied into the process container, wherein the fluid control device includes: a flow path block; and a fluid controller installed to the flow path block, wherein the flow path block includes: a gas supply flow path including an inlet, through which the fluid is introduced, and an outlet through which the fluid flows into the process container; and a storage chamber that stores the fluid in the gas supply flow path between the inlet and the outlet, and wherein the fluid controller includes: a first valve that opens and closes the gas supply flow path between the inlet and the storage chamber; a second valve that opens and closes the gas supply flow path between the storage chamber and the outlet; and a pressure sensor that detects an internal pressure of the storage chamber, wherein the storage chamber has a volume larger than a volume of the gas supply flow path.
9. 9 . The substrate processing apparatus of claim 8 , wherein the flow path block includes an exhaust flow path connected to the storage chamber, and wherein the fluid controller includes a third valve that opens and closes the exhaust flow path.
10. 10 . The substrate processing apparatus of claim 9 , wherein the first valve, the third valve, and the second valve are arranged in a row in this order from the inlet to the outlet.
11. 11 . The substrate processing apparatus of claim 10 , wherein the exhaust flow path has an exhaust port provided on a surface of the flow path block where the inlet is provided.
12. 12 . The substrate processing apparatus of claim 9 , wherein the exhaust flow path has an exhaust port provided on a surface of the flow path block where the inlet is provided.
13. 13 . The substrate processing apparatus of claim 8 , wherein the pressure sensor is provided on a surface of the flow path block where the inlet is provided.
14. 14 . The substrate processing apparatus of claim 8 , wherein the fluid controller includes a heater provided in an interior of the flow path block.

Description

CROSS-REFERENCE TO RELATED APPLICATION This application is a continuation of U.S. patent application Ser. No. 18/615,271, filed Mar. 25, 2024, and is based upon and claims the benefit of priority from Japanese Patent Application No. 2023-058918, filed on Mar. 31, 2023, the entire contents of each of which are incorporated herein by reference. TECHNICAL FIELD The present disclosure relates to a fluid control device and a substrate processing apparatus. BACKGROUND A block valve with a tank chamber is known, which has a gas supply flow path, through which a gas supplied from a gas source flows to a process chamber, and a branch passage, which is branched from the gas supply flow path and is connected to a vacuum pump, the tank chamber being provided in the middle of the branch passage (see, e.g., Patent Document 1). Prior Art Documents [Patent Documents] Patent Document 1: Japanese Laid-Open Publication No. H07-119844. SUMMARY According to one embodiment of the present disclosure, a fluid control device that controls a fluid supplied into a process container includes: a flow path block; and a fluid controller installed to the flow path block. The flow path block includes: a gas supply flow path including an inlet, through which the fluid is introduced, and an outlet through which the fluid flows into the process container; and a storage chamber that stores the fluid in the gas supply flow path between the inlet and the outlet. The fluid controller includes: a first valve that opens and closes the gas supply flow path between the inlet and the storage chamber; and a second valve that opens and closes the gas supply flow path between the storage chamber and the outlet. BRIEF DESCRIPTION OF DRAWINGS The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the present disclosure, and together with the general description given above and the detailed description of the embodiments given below, serve to explain the principles of the present disclosure. FIG. 1 is a diagram illustrating a substrate processing apparatus according to an embodiment. FIG. 2 is a cross-sectional view illustrating a fluid control device according to the embodiment. FIG. 3 is a cross-sectional view illustrating a fluid control device according to a first modification of the embodiment. FIG. 4 is a cross-sectional view illustrating a fluid control device according to a second modification of the embodiment. DETAILED DESCRIPTION Reference will now be made in detail to various embodiments, examples of which are illustrated in the accompanying drawings. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present disclosure. However, it will be apparent to one of ordinary skill in the art that the present disclosure may be practiced without these specific details. In other instances, well-known methods, procedures, systems, and components have not been described in detail so as not to unnecessarily obscure aspects of the various embodiments. Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding members or components will be denoted by the same or corresponding reference numerals, and redundant descriptions thereof will be omitted. Substrate Processing Apparatus A substrate processing apparatus according to an embodiment will be described with reference to FIG. 1. The substrate processing apparatus according to the embodiment is an apparatus configured to accommodate substrates inside a process container and to perform predetermined processes (e.g., film formation and etching) on the substrates. The substrate processing apparatus is, for example, a batch type apparatus that processes a plurality of substrates at once. The substrate processing apparatus may be a single wafer type apparatus that processes one substrate at a time. The substrate processing apparatus includes a process container 1, a gas supplier 2, and an exhauster 3. In the substrate processing apparatus, a predetermined process is performed on a substrate accommodated inside the process container 1 by supplying a process gas into the process container 1 by the gas supplier 2. In the substrate processing apparatus, the process gas supplied into the process container 1 is discharged through the exhauster 3. The process container 1 accommodates the substrate. The process container 1 has a supply port 11, and the process gas is supplied into the process container 1 from the gas supplier 2 via the supply port 11. The process container 1 has an exhaust port 12, and the process gas is discharged from inside the process container 1 via the exhaust port 12. The gas supplier 2 includes a supply source 21, a fluid control device 22, and a supply pipe 23. The supply source 21 includes a process gas supply source