WO-2026095045-A1 - GAS ANALYSIS SYSTEM, GAS ANALYSIS METHOD, PROGRAM FOR GAS ANALYSIS, AND MATERIAL GAS SUPPLY SYSTEM

WO2026095045A1WO 2026095045 A1WO2026095045 A1WO 2026095045A1WO-2026095045-A1

Abstract

The present invention stably measures the concentration of a highly reactive hydrocarbon or hydrogen without affecting the flow rate of an analysis device, and comprises: a main flow path 5 through which a sample gas flows; an analysis device 6 which measures the concentration of a hydrocarbon or hydrogen in the sample gas flowing through the main flow path 5; a sub-flow path 7 which diverges from the main flow path 5 upstream of the analysis device 6; and a flow rate adjustment mechanism 8 which is provided to the sub-flow path 7 and adjusts the flow rate of the sample gas in the main flow path 5 upstream of the sub-flow path 7 by adjusting the flow rate of the sample gas flowing through the sub-flow path 7.

Inventors

ICHIKAWA,Takato
YAMAMOTO, TOMOMI
HAMAUCHI, Shota
OTAGAKI, Yuma

Assignees

株式会社堀場製作所

Dates

Publication Date: 20260507
Application Date: 20251031
Priority Date: 20241101

Claims (14)

A gas analysis system for measuring the concentration of hydrocarbons or hydrogen in a sample gas sampled from a process apparatus using a chemical reaction, The main channel through which the sample gas flows, An analytical device for measuring the concentration of hydrocarbons or hydrogen in the sample gas flowing through the main channel, In the main channel, a sub-channel is branched off from the upstream side of the analyzer, A gas analysis system comprising a flow rate adjustment mechanism provided in the sub-channel, which adjusts the flow rate of the sample gas in the main channel upstream of the sub-channel by adjusting the flow rate of the sample gas flowing through the sub-channel.
The aforementioned flow rate adjustment mechanism is A flow control valve is provided in the aforementioned subflow channel, The gas analysis system according to claim 1, further comprising a suction pump provided downstream of the flow control valve in the subflow channel.
The gas analysis system according to claim 2, wherein a dust collection filter is provided between the flow control valve and the suction pump in the sub-flow channel.
The main flow path has a sampling unit that samples internal gas from the process apparatus. The gas analysis system according to any one of claims 1 to 3, wherein the sampling unit is made of ceramic.
The gas analysis system according to claim 4, wherein the sampling unit is inserted into the furnace wall of the processing furnace of the process apparatus.
The system further comprises a flow control unit that controls the flow rate adjustment mechanism, The gas analysis system according to any one of claims 1 to 5, wherein the flow control unit controls the flow adjustment mechanism to gradually increase the flow rate of the main flow path upstream of the sub-flow path.
The gas analysis system according to claim 6, further comprising a flow rate determination unit that determines the set flow rate of the flow rate adjustment mechanism based on the concentration measurement value of the analyzer when the flow rate of the main flow path is gradually increased by the flow rate adjustment mechanism.
In the main flow path, a span gas supply path is connected to the upstream side of the analyzer and supplies span gas to the analyzer, The gas analysis system according to any one of claims 1 to 7, further comprising: an abnormality determination unit that determines an abnormality in the analyzer based on the concentration measurement value of the analyzer when the span gas is passed through the analyzer.
The gas analysis system according to any one of claims 1 to 8, wherein the analytical device measures the concentration of acetylene in the sample gas.
A gas analysis method for measuring the concentration of hydrocarbons or hydrogen in a sample gas sampled from a process apparatus using a chemical reaction, The sample gas is introduced into the analyzer through the main channel, and the concentration of hydrocarbons or hydrogen in the sample gas is measured by the analyzer. A gas analysis method comprising providing a flow rate adjustment mechanism in a sub-channel branched from the upstream side of the analyzer in the main channel, thereby adjusting the flow rate of the sample gas flowing through the sub-channel, and thereby adjusting the flow rate of the sample gas in the main channel upstream of the sub-channel.
Using the flow rate adjustment mechanism, the flow rate of the main channel upstream of the sub-channel is gradually increased. The gas analysis method according to claim 10, wherein the set flow rate of the flow rate adjustment mechanism is determined based on the concentration measurement value of the analyzer when the flow rate of the main flow path is gradually increased by the flow rate adjustment mechanism.
In the main flow path, span gas is supplied to the analyzer from a span gas supply path connected to the upstream side of the analyzer. A gas analysis method according to claim 10 or 11, wherein an abnormality in the analyzer is determined based on the concentration measurement value of the analyzer when the span gas is passed through the analyzer.
A gas analysis program used in a gas analysis system for measuring the concentration of hydrocarbons or hydrogen in a sample gas sampled from a process apparatus using chemical reactions, The gas analysis system comprises a main channel through which the sample gas flows, an analyzer for measuring the concentration of hydrocarbons or hydrogen in the sample gas flowing through the main channel, a sub-channel branching off from the upstream side of the analyzer in the main channel, and a flow rate adjustment mechanism provided in the sub-channel. The gas analysis program provides a computer with the function of a flow control unit that adjusts the flow rate of the sample gas in the main channel upstream of the subchannel by controlling the flow rate adjustment mechanism to adjust the flow rate of the sample gas flowing through the subchannel.
A material gas supply system that supplies material gases involved in a chemical reaction to a process apparatus that uses a chemical reaction, A flow controller for controlling the flow rate of the material gas, A gas analysis system according to any one of claims 1 to 7, which measures the concentration of hydrocarbons or hydrogen in a sample gas sampled from the process apparatus, A material gas supply system comprising a control device that inputs a flow rate set value to a flow rate controller based on the concentration measurement value of the analytical device.

Description

Gas analysis system, gas analysis method, gas analysis program, and material gas supply system This invention relates to a gas analysis system, a gas analysis method, a gas analysis program, and a material gas supply system. For example, in industrial processes such as petrochemical processes, denitrification processes, or carburizing processes, highly reactive material gases such as acetylene or ethylene are used. In these industrial processes, the flow rate of the material gas used in the process is controlled based on the concentration of a sample gas sampled from the furnace to satisfy desired process conditions (e.g., maintaining the gas concentration within the furnace within a desired range). For example, as shown in Patent Document 1, a feedback control system is being considered in which, in a vacuum carburizing process, the amount of carburizing gas supplied per unit time by the gas supply device is adjusted so that the gas composition inside the furnace is optimized, based on the gas composition determined by irradiating the gas inside the furnace with laser light. However, with highly reactive material gases, the sampled gas may decompose, disappear, or change before reaching the analyzer, making it difficult to properly control the flow rate of the material gas used in the process. While increasing the flow rate of the sample gas to the analyzer might be considered to ensure it reaches the analyzer before decomposition, this can introduce the flow rate of the analyzer itself into the measurement results. This is a schematic diagram of the overall material gas supply system according to one embodiment of the present invention.This is a schematic diagram showing the configuration of the gas analysis system according to the same embodiment.This graph shows the method for determining the set flow rate of the flow rate adjustment mechanism in the same embodiment.This is a schematic cross-sectional view showing the configuration of the sampling section of the gas analysis system according to the same embodiment.This is a schematic diagram showing the configuration of a modified gas analysis system.This is a schematic cross-sectional view showing the configuration of the sampling unit in the modified embodiment.This diagram schematically shows a configuration having a wavelength calibration cell in a modified embodiment.This is a cross-sectional view showing the mounting structure of the sampling channel tube in a modified embodiment.This is a schematic diagram showing the configuration of a modified gas analysis system. <One embodiment of the present invention> Below, an embodiment of a material gas supply system incorporating the gas analysis system according to the present invention will be described with reference to the drawings. Note that, for the sake of clarity, all the following figures are schematic representations, with some parts omitted or exaggerated as appropriate. The same components are denoted by the same reference numerals, and their descriptions are omitted as appropriate. <Configuration of the material gas supply system 100> As shown in Figure 1, the material gas supply system 100 of this embodiment supplies material gases involved in chemical reactions to various devices 200 (hereinafter referred to as process devices 200) that perform process processing using chemical reactions in industrial processes. Here, the process apparatus 200 is used in industrial processes such as petrochemical processes, denitrification processes, or carburizing processes. The process apparatus 200 in this embodiment is used in an acetylene carburizing process, and the processing furnace 201 of the process apparatus 200 is, for example , a gas carburizing furnace, and the material gas is a highly reactive gas such as acetylene ( C₂H₂ ) gas. Specifically, the material gas supply system 100 includes a flow controller (mass flow controller) 2 that controls the flow rate of acetylene ( C2H2 ) gas supplied to the process apparatus 200, a gas analysis system 3 that measures the concentration of acetylene ( C2H2 ), which is the target component , in the sample gas sampled from the process apparatus 200, and a control device 4 that inputs a flow rate setting value to the flow controller 2 based on the acetylene ( C2H2 ) concentration measurement value obtained by the gas analysis system 3. The flow controller 2 is a so-called mass flow controller, and is a package of a fluid control valve (not shown), a flow sensor, and a control board, for example, as a single unit. The flow controller 2 provides feedback control of the opening degree of the fluid control valve based on the deviation between the flow rate set by the control device 4 (described later) and the flow rate of the material gas measured by the flow sensor. Note that the flow controller does not necessarily have to be a mass flow controller that controls mass flow rate; it may also control volumetric flow rate. This gas analysis system 3 measures the